公开(公告)号：US11881374B2

公开(公告)日：2024-01-23

申请号：US17430307

申请日：2020-02-04

Applicant: ASML Netherlands B.V.

Inventor： Shakeeb Bin Hasan ,  Yan Ren ,  Maikel Robert Goosen ,  Albertus Victor Gerardus Mangnus ,  Erwin Paul Smakman

IPC: H01J37/04 ,  H01J37/28

CPC classification number: H01J37/04 ,  H01J37/28 ,  H01J2237/028

Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer and a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate.

公开(公告)号：US11029610B2

公开(公告)日：2021-06-08

申请号：US16650520

申请日：2018-09-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Edo Maria Hulsebos ,  Henricus Johannes Lambertus Megens ,  Ahmet Koray Erdamar ,  Loek Johannes Petrus Verhees ,  Willem Seine Christian Roelofs ,  Wendy Johanna Martina Van De Ven ,  Hadi Yagubizade ,  Hakki Ergün Cekli ,  Ralph Brinkhof ,  Tran Thanh Thuy Vu ,  Maikel Robert Goosen ,  Maaike Van T Westeinde ,  Weitian Kou ,  Manouk Rijpstra ,  Matthijs Cox ,  Franciscus Godefridus Casper Bijnen

IPC: G03F7/20 ,  G03F9/00

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.

公开(公告)号：US10942460B2

公开(公告)日：2021-03-09

申请号：US16085000

申请日：2017-02-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Gijsbert Josephus Mathijssen ,  Maikel Robert Goosen

IPC: G03F9/00 ,  G01B11/27

Abstract: A method of determining positions of marks, the marks comprising periodic structures, at least some of the structures comprising periodic sub-structures, the sub-structures having a smaller period than the structures, the marks formed with positional offsets between the sub-structures and structures, the positional offsets caused by a combination of both known and unknown components, the method comprising illuminating a plurality of the marks with radiation having different characteristics, detecting radiation diffracted by the marks using one or more detectors which produce output signals, discriminating between constituent parts of the signals, the discriminating based on a variation of the signals as a function of spatial positions of the marks on a substrate, selecting at least one of the constituent parts of the signals, and using the at least one selected constituent part, and information relating to differences between the known components, to calculate a corrected position of at least one mark.