METROLOGY METHOD, TARGET AND SUBSTRATE
    13.
    发明申请
    METROLOGY METHOD, TARGET AND SUBSTRATE 审中-公开
    计量方法,目标和底物

    公开(公告)号:US20160061589A1

    公开(公告)日:2016-03-03

    申请号:US14835504

    申请日:2015-08-25

    CPC classification number: G01B11/14 G03F7/70633 G03F7/70683

    Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

    Abstract translation: 具有至少第一子目标和至少第二子目标的衍射测量目标,并且其中(1)所述第一和第二子目标各自包括一对周期性结构,并且所述第一子目标具有不同的 设计比第二子目标,不同的设计包括具有与第二子目标周期结构不同的间距,特征宽度,空间宽度和/或分割的第一子目标周期性结构,或(2)第一和第二子目标周期结构 子目标分别包括第一层中的第一和第二周期性结构,并且第三周期性结构至少部分地位于第一层下面的第二层中的第一周期性结构下方,并且在第二层周期结构之下不存在周期性结构 并且第四周期性结构至少部分地位于第二层下面的第三层中的第二周期性结构下方。

    Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method

    公开(公告)号:US10831109B2

    公开(公告)日:2020-11-10

    申请号:US15839285

    申请日:2017-12-12

    Abstract: An overlay metrology target (T) is formed by a lithographic process. A first image (740(0)) of the target structure is obtained using with illuminating radiation having a first angular distribution, the first image being formed using radiation diffracted in a first direction (X) and radiation diffracted in a second direction (Y). A second image (740(R)) of the target structure using illuminating radiation having a second angular illumination distribution which the same as the first angular distribution, but rotated 90 degrees. The first image and the second image can be used together so as to discriminate between radiation diffracted in the first direction and radiation diffracted in the second direction by the same part of the target structure. This discrimination allows overlay and other asymmetry-related properties to be measured independently in X and Y, even in the presence of two-dimensional structures within the same part of the target structure.

    Radiation source with cleaning apparatus
    20.
    发明授权
    Radiation source with cleaning apparatus 失效
    带清洁装置的辐射源

    公开(公告)号:US08742381B2

    公开(公告)日:2014-06-03

    申请号:US13774612

    申请日:2013-02-22

    CPC classification number: G03F7/70925

    Abstract: A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H2, D2 and HD and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the radiation source, to produce hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas, and to supply the hydrogen and/or deuterium radicals and radicals of the one or more additional compounds to the uncapped Mo/Si multilayer mirror to remove at least part of the deposition.

    Abstract translation: 辐射源包括未加盖的Mo / Si多层反射镜,以及被配置为去除未开盖的Mo / Si多层反射镜上的包含Sn的沉积物的清洁装置。 清洁装置被配置为在至少部分辐射源中提供包含H2,D2和HD中的一种或多种的气体和一种或多种选自烃化合物和/或硅烷化合物的其它化合物,以产生氢和/或氘 来自气体的一种或多种另外的化合物的自由基和基团,并且将一种或多种另外的化合物的氢和/或氘自由基和自由基供应到未开孔的Mo / Si多层反射镜,以去除至少一部分沉积物 。

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