公开(公告)号：US11687007B2

公开(公告)日：2023-06-27

申请号：US17423325

申请日：2020-01-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Arnaud Hubaux ,  Johan Franciscus Maria Beckers ,  Dylan John David Davies ,  Johan Gertrudis Cornelis Kunnen ,  Willem Richard Pongers ,  Ajinkya Ravindra Daware ,  Chung-Hsun Li ,  Georgios Tsirogiannis ,  Hendrik Cornelis Anton Borger ,  Frederik Eduard De Jong ,  Juan Manuel Gonzalez Huesca ,  Andriy Hlod ,  Maxim Pisarenco

IPC: G03F1/70 ,  G03F7/30 ,  G03F7/00 ,  G06F30/392

CPC classification number: G03F7/70508 ,  G03F1/70 ,  G03F7/70616 ,  G06F30/392 ,  G05B2219/45028 ,  G05B2219/45031

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

公开(公告)号：US11536654B2

公开(公告)日：2022-12-27

申请号：US17092397

申请日：2020-11-09

Applicant: ASML Netherlands B.V.

Inventor： Maxim Pisarenco ,  Nitesh Pandey ,  Alessandro Polo

IPC: G01N21/95 ,  G01N29/06 ,  G03F7/20 ,  G01N21/956 ,  G01N21/47 ,  G01N29/44

Abstract: An acoustic scatterometer has an acoustic source operable to project acoustic radiation onto a periodic structure and formed on a substrate. An acoustic detector is operable to detect the −1st acoustic diffraction order diffracted by the periodic structure and while discriminating from specular reflection (0th order). Another acoustic detector is operable to detect the +1st acoustic diffraction order diffracted by the periodic structure, again while discriminating from the specular reflection (0th order). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation and location of the detectors and are arranged with respect to the periodic structure and such that the detection of the −1st and +1st acoustic diffraction orders and discriminates from the 0th order specular reflection.

公开(公告)号：US11429763B2

公开(公告)日：2022-08-30

申请号：US16806266

申请日：2020-03-02

Applicant: ASML Netherlands B.V.

Inventor： Remco Dirks ,  Markus Gerardus Martinus Maria Van Kraaij ,  Maxim Pisarenco

IPC: G06F30/20 ,  H01L21/66 ,  H01L21/3065 ,  H01L21/308 ,  G03F7/20

Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904′, 906′) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.

公开(公告)号：US11347151B2

公开(公告)日：2022-05-31

申请号：US16394738

申请日：2019-04-25

Applicant: ASML Netherlands B.V.

Inventor： Markus Gerardus Martinus Maria Van Kraaij ,  Maxim Pisarenco ,  Richard Quintanilha

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00

Abstract: A method of calculating electromagnetic scattering properties of a structure represented as a nominal structure and a structural perturbation, has the steps: 1008 numerically solving a volume integral equation comprising a nominal linear system 1004 to determine a nominal vector field being independent with respect to the structural perturbation; 1010 using a perturbed linear system 1006 to determine an approximation of a vector field perturbation arising from the structural perturbation, by solving a volume integral equation or an adjoint linear system. Matrix-vector multiplication of a nominal linear system matrix convolution operator may be restricted to sub-matrices; and 1012 calculating electromagnetic scattering properties of the structure using the determined nominal vector field and the determined approximation of the vector field perturbation.

公开(公告)号：US20210003927A1

公开(公告)日：2021-01-07

申请号：US17023474

申请日：2020-09-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Davit Harutyunyan ,  Fei Jia ,  Frank Staals ,  Fuming Wang ,  Hugo Thomas Looijestijn ,  Cornelis Johannes Rijnierse ,  Maxim Pisarenco ,  Roy Werkman ,  Thomas Theeuwes ,  Tom Van Hemert ,  Vahid Bastani ,  Jochem Sebastiaan Wildenberg ,  Everhardus Cornelis Mos ,  Erik Johannes Maria Wallerbos

IPC: G03F7/20 ,  G05B13/04

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

公开(公告)号：US20170017738A1

公开(公告)日：2017-01-19

申请号：US15209290

申请日：2016-07-13

Applicant: ASML Netherlands B.V.

Inventor： Remco DIRKS ,  Markus Gerardus Martinus Maria Van Kraaij ,  Maxim Pisarenco

IPC: G06F17/50 ,  G03F7/20 ,  H01L21/308 ,  H01L21/66 ,  H01L21/3065

Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904′, 906′) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.

Abstract translation: 通过从观测的衍射辐射重建来测量结构（900）的参数。 该方法包括以下步骤：（a）定义结构模型以表示二维或三维模型空间中的结构; （b）使用结构模型来模拟辐射与结构的相互作用; 和（c）重复步骤（b），同时改变结构模型的参数。 结构模型沿模型空间的至少第一维度（Z）分为一系列切片（a-f）。 通过划分成切片，至少一个子结构的倾斜面（904,906）通过沿着模型空间（X）的至少第二维度的一系列步骤（904'，906'）近似。 切片的数量可能随参数变化而动态变化。 接近所述倾斜面的步骤数保持恒定。 引入附加切割（1302,1304），而不引入相应的步骤。

公开(公告)号：US12204252B2

公开(公告)日：2025-01-21

申请号：US18212334

申请日：2023-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Arnaud Hubaux ,  Johan Franciscus Maria Beckers ,  Dylan John David Davies ,  Johan Gertrudis Cornelis Kunnen ,  Willem Richard Pongers ,  Ajinkya Ravindra Daware ,  Chung-Hsun Li ,  Georgios Tsirogiannis ,  Hendrik Cornelis Anton Borger ,  Frederik Eduard De Jong ,  Juan Manuel Gonzalez Huesca ,  Andriy Hlod ,  Maxim Pisarenco

IPC: G03F1/70 ,  G03F7/00 ,  G06F30/392

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

公开(公告)号：US20230333482A1

公开(公告)日：2023-10-19

申请号：US18212334

申请日：2023-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Arnaud HUBAUX ,  Johan Franciscus Maria Beckers ,  Dylan John David Davies ,  Johan Gertrudis Cornelis Kunnen ,  Willem Richard Pongers ,  Ajinkya Ravindra Daware ,  Chung-Hsun Li ,  Georgios Tsirogiannis ,  Hendrik Cornelis Anton Borger ,  Frederik Eduard De Jong ,  Juan Manuel Gonzalez Huesca ,  Andriy Hlod ,  Maxim Pisarenco

IPC: G03F7/20 ,  G06F30/392 ,  G03F1/70

CPC classification number: G03F7/70508 ,  G06F30/392 ,  G03F1/70 ,  G03F7/70616 ,  G05B2219/45028 ,  G05B2219/45031

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

公开(公告)号：US20220342319A1

公开(公告)日：2022-10-27

申请号：US17855995

申请日：2022-07-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Davit Harutyunyan ,  Fei Jia ,  Frank Staals ,  Fuming Wang ,  Hugo Thomas Looijestijn ,  Cornelis Johannes Rijnierse ,  Maxim Pisarenco ,  Roy Werkman ,  Thomas Theeuwes ,  Tom Van Hemert ,  Vahid Bastani ,  Jochem Wildenberg ,  Everhardus Cornelis Mos ,  Erik Johannes Maria Wallerbos

IPC: G03F7/20 ,  G05B13/04

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

公开(公告)号：US11041816B2

公开(公告)日：2021-06-22

申请号：US15839299

申请日：2017-12-12

Applicant: ASML Netherlands B.V.

Inventor： Maxim Pisarenco ,  Frank Stefan Schneider ,  Markus Gerardus Martinus Maria Van Kraaij ,  Martijn Constant Van Beurden

IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

Abstract: Disclosed is a method for reconstructing a parameter of a lithographic process. The method comprises the step of designing a preconditioner suitable for an input system comprising the difference of a first matrix and a second matrix, the first matrix being arranged to have a multi-level structure of at least three levels whereby at least two of said levels comprise a Toeplitz structure. One such preconditioner is a block-diagonal matrix comprising a BTTB structure generated from a matrix-valued inverse generating function. A second such preconditioner is determined from an approximate decomposition of said first matrix into one or more Kronecker products.