公开(公告)号：WO2019158328A1

公开(公告)日：2019-08-22

申请号：PCT/EP2019/051618

申请日：2019-01-23

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  ZHOU, Zili ,  VAN DER ZOUW, Gerbrand ,  DEN BOEF, Arie ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  KOOLEN, Armand, Eugene, Albert ,  CRAMER, Hugo, Augustinus, Joseph ,  HINNEN, Paul, Christiaan ,  VAN WEERT, Martinus, Hubertus, Maria ,  TSIATMAS, Anagnostis ,  WANG, Shu-jin ,  FAGGINGER AUER, Bastiaan, Onne ,  VERMA, Alok

IPC: G03F7/20

Abstract: A inspection apparatus, method, and system associated therewith are described herein. In a non-limiting embodiment, a inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, and the illumination beam being polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization; generate image data representing an image of each of the feature(s) based on the intensity data; and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

公开(公告)号：WO2018219639A1

公开(公告)日：2018-12-06

申请号：PCT/EP2018/062547

申请日：2018-05-15

Applicant: ASML NETHERLANDS B.V.

Inventor： RAVENSBERGEN, Janneke ,  PANDEY, Nitesh ,  ZHOU, Zili ,  KOOLEN, Armand, Eugene, Albert ,  GOORDEN, Sebastianus, Adrianus ,  FAGGINGER AUER, Bastiaan, Onne ,  MATHIJSSEN, Simon, Gijsbert, Josephus

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/95 ,  G01B11/02

Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.

公开(公告)号：EP3809190A1

公开(公告)日：2021-04-21

申请号：EP19202907.2

申请日：2019-10-14

Applicant: ASML Netherlands B.V.

Inventor： ZHOU, Zili ,  RAVENSBERGEN, Janneke

IPC: G02B27/48 ,  G02B27/09

Abstract: Disclosed is a pupil shaping arrangement for obtaining a defined pupil intensity profile for a metrology illumination beam configured for use in a metrology application. The pupil shaping arrangement comprises an engineered diffuser (ED) having a defined far-field profile configured to impose said defined pupil intensity profile on said metrology illumination beam. The pupil shaping arrangement may further comprise a multimode fiber (MMF) and be configured to reduce spatial coherence of coherent radiation.

公开(公告)号：EP4300193A1

公开(公告)日：2024-01-03

申请号：EP22181325.6

申请日：2022-06-27

Applicant: ASML Netherlands B.V.

Inventor： ZHOU, Zili ,  DEN BOEF, Arie, Jeffrey

IPC: G03F9/00 ,  G03F7/20 ,  G01N21/47 ,  G01N21/956 ,  G02B7/34

Abstract: Disclosed is a wedge arrangement comprising a plurality of wedge elements, arranged around an optical axis, the plurality of wedge elements comprising at least a first wedge element, a second wedge element and a third wedge element; wherein: said first wedge element comprises a first optical surface and second optical surface, wherein the first optical surface is planar and non-perpendicular to the optical axis and the second optical surface is non-planar such that said first wedge element has a non-linear thickness change; said second wedge element comprises a third optical surface and fourth optical surface which are each planar and are non-parallel; and said third wedge element comprises a fifth optical surface and sixth optical surface wherein the fifth optical surface is planar and non-perpendicular to the optical axis. Also disclosed is a metrology device which uses such a wedge arrangement in determining focus of measurement radiation during a measurement.

公开(公告)号：EP4187321A1

公开(公告)日：2023-05-31

申请号：EP21210123.2

申请日：2021-11-24

Applicant: ASML Netherlands B.V.

Inventor： ZHOU, Zili ,  SWINKELS, Daan ,  LIAN, Jin

IPC: G03F7/20

Abstract: Disclosed is a method of measuring an overlay or focus parameter from a target and associated metrology apparatus. The method comprises configuring measurement radiation to obtain a configured measurement spectrum of said measurement radiation by: imposing an intensity weighting on individual wavelength bands of said measurement radiation such that said individual wavelength bands have an intensity according to said intensity weighting, the intensity weighting being such that a measured value for the overlay or focus parameter is at least partially corrected for the effect of target imperfections; and/or imposing a modulation on a measurement spectrum of said measurement radiation. The configured measurement radiation is used to measure the target. A value for the overlay or focus parameter is determined from scattered radiation resultant from measurement of the target.

公开(公告)号：EP4361703A1

公开(公告)日：2024-05-01

申请号：EP22204014.9

申请日：2022-10-27

Applicant: ASML Netherlands B.V.

Inventor： BUIJS, Robin, Daniel ,  ZHOU, Zili ,  ARABUL, Mustafa, Ümit ,  BRULS, Dominique, Maria

IPC: G02B27/00 ,  G02B27/28

CPC classification number: G02B27/283 ,  G02B27/0043 ,  G03F7/706847 ,  G03F7/706849 ,  G03F9/7065 ,  G02B5/1828 ,  G02B26/0808 ,  G02B27/1006

Abstract: Disclosed is an illumination configuration module comprising: a polarizing and wavelength separation arrangement operable to separate input broadband illumination into at least first dispersed illumination comprising a first polarization state and second dispersed illumination comprising a second polarization state; a single spatial light modulation device operable to individually modulate each of the first dispersed illumination and second dispersed illumination to obtain first spectrally configured illumination and second spectrally configured illumination; and output optics operable to combine said first spectrally configured illumination and second spectrally configured illumination into an output illumination beam.

公开(公告)号：EP3477391A1

公开(公告)日：2019-05-01

申请号：EP17198461.0

申请日：2017-10-26

Applicant: ASML Netherlands B.V.

Inventor： VAN DER ZOUW, Gerbrand ,  VAN WEERT, Martinus Hubertus Maria ,  ZHOU, Zili ,  PANDEY, Nitesh ,  VAN KRAAIJ, Markus Gerardus Martinus Maria ,  TSIATMAS, Anagnostis

IPC: G03F7/20 ,  G03F1/24

Abstract: The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.

公开(公告)号：EP3410212A1

公开(公告)日：2018-12-05

申请号：EP17174269.5

申请日：2017-06-02

Applicant: ASML Netherlands B.V.

Inventor： RAVENSBERGEN, Janneke ,  PANDEY, Nitesh ,  ZHOU, Zili ,  KOOLEN, Armand Eugene Albert ,  GOORDEN, Sebastianus Adrianus ,  FAGGINGER AUER, Bastiaan Onne ,  MATHIJSSEN, Simon Gijsbert Josephus

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/95 ,  G01B11/02

CPC classification number: G03F7/70633 ,  G01B11/02 ,  G01N21/9501 ,  G03F7/70625

Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.

公开(公告)号：EP3333631A1

公开(公告)日：2018-06-13

申请号：EP16202508.4

申请日：2016-12-06

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  ZHOU, Zili

IPC: G03F7/20

CPC classification number: G03F7/70591 ,  G03F7/70633

Abstract: Methods of measuring a target formed by a lithographic process, a metrology apparatus and a polarizer assembly are disclosed. The target comprises a layered structure having a first periodic structure in a first layer and a second periodic structure in a second layer. The target is illuminated with polarized measurement radiation. Zeroth order scattered radiation from the target is detected. An asymmetry in the first periodic structure is derived using the detected zeroth order scattered radiation from the target. A separation between the first layer and the second layer is such that the detected zeroth order scattered radiation is independent of overlay error between the first periodic structure and the second periodic structure. The derived asymmetry in the first periodic structure is used to derive the correct overlay value between the first periodic structure and the second periodic structure.

公开(公告)号：EP4357853A1

公开(公告)日：2024-04-24

申请号：EP22201858.2

申请日：2022-10-17

Applicant: ASML Netherlands B.V.

Inventor： ZHOU, Zili ,  ARABUL, Mustafa, Ümit ,  BRULS, Dominique, Maria

IPC: G03F7/20 ,  G03F9/00 ,  G02B26/08 ,  G02B27/10

CPC classification number: G03F9/7065 ,  G03F7/70616 ,  G02B27/1006 ,  G02B26/0808 ,  G03F7/706847 ,  G03F7/706849 ,  G02B5/1828

Abstract: A source selection module comprising an adjustable diffraction element comprising multiple pixels. The source selection module further comprises a light dispersive element configured for receiving a first and a second light. The light dispersive element distributes the first light over a first pixel to generate a zeroth and a non-zeroth diffraction order. The light dispersive element further spatially distributes the second light over a second pixel to generate a zeroth and a non-zeroth diffraction order. The source selection module comprises a continuous variable filter comprising a first and a second area. The zeroth order of the first light received by the first area and the zeroth order of the second light received by the second area are transmitted or reflected. The non-zeroth order of the first light is blocked outside of the first area, and the non-zeroth order of the second light is blocked outside of the second area.