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    Lithographic method and assembly
    12.
    发明专利
    Lithographic method and assembly 有权
    光刻方法和装配

    公开(公告)号：JP2012222350A

    公开(公告)日：2012-11-12

    申请号：JP2012079444

    申请日：2012-03-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ZHANG SHAOXIAN ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  JASPER JOHANNES CHRISTIAAN MARIA

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/706 ,  G03F7/70616 ,  G03F7/70625

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic method and/or an assembly where aberration sensitivity can be determined.SOLUTION: There is provided a lithographic method of determining sensitivity of a property of a pattern feature to changes in optical aberrations of a lithographic apparatus used for providing a pattern feature. The method includes the steps of: controlling a configuration of the lithographic apparatus so as to establish a first aberration state; forming a first image of the pattern feature with the lithographic apparatus when the lithographic apparatus is in the first aberration state; measuring a property of the image; controlling a configuration of the lithographic apparatus so as to establish a second different aberration state; forming an image of the same pattern feature with the lithographic apparatus when the lithographic apparatus is in the second aberration state; measuring the same property of the image; and determining the sensitivity of the property of the pattern feature to the changes in the aberration state using the measurement value.

    Abstract translation: 要解决的问题：提供可以确定像差灵敏度的光刻方法和/或组件。 解决方案：提供了一种确定图案特征的性质对用于提供图案特征的光刻设备的光学像差的变化的灵敏度的光刻方法。 该方法包括以下步骤：控制光刻设备的配置以建立第一像差状态; 当光刻设备处于第一像差状态时，用光刻设备形成图案特征的第一图像; 测量图像的属性; 控制光刻设备的配置以便建立第二不同的像差状态; 当光刻设备处于第二像差状态时，与光刻设备形成相同图案特征的图像; 测量图像的相同属性; 以及使用所述测量值来确定所述图案特征的特性对所述像差状态的变化的灵敏度。 版权所有（C）2013，JPO＆INPIT

    Lithography apparatus and method
    15.
    发明专利
    Lithography apparatus and method 审中-公开
    平面设备和方法

    公开(公告)号：JP2011187930A

    公开(公告)日：2011-09-22

    申请号：JP2010278879

    申请日：2010-12-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  FAHRNI FRANCIS ,  JOSEPH KEIJSERS GERARDUS J ,  MULDER HEINE MELLE ,  PONGERS WILLEM RICHARD ,  HAGEMAN JOOST CYRILLUS LAMBERT ,  VAN BRUGGEN MATTHEUS JOHANNES ,  ROOSEKRANS JOHANNES FRANCISCUS ,  BUTLER DAVID JAMES ,  THOMASSEN PATRICK MARCEL MARIA ,  PAEVA GABRIELA VESSELINOVA

    IPC: H01L21/027

    CPC classification number: G03B27/54

    Abstract: PROBLEM TO BE SOLVED: To solve such a problem in a prior art that, after each scanning operation, the direction of mask scanning operation and the direction of substrate scanning operation are reversed and a substrate is moved even across the scanning direction, thus consuming a time. SOLUTION: A lithography apparatus includes an illumination system. The illumination system is arranged to provide a first radiation beam forming a first mask illumination zone and at the same time, and to provide a second radiation beam forming a second mask illumination zone. The first and second mask illumination zones are arranged to illuminate the same mask at the same time. The lithography apparatus also includes a light projection system. The projection system projects the first radiation beam so as to form a first substrate illumination zone and at the same time, and projects the second radiation beam so as to form a second substrate illumination zone. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 解决的问题为了解决现有技术中的这样一个问题，即在每次扫描操作之后，掩模扫描操作的方向和基板扫描操作的方向相反，并且基板在扫描方向上移动， 从而消耗时间。 解决方案：光刻设备包括照明系统。 照明系统被布置成提供形成第一掩模照明区域并同时提供形成第二掩模照射区域的第二辐射束的第一辐射束。 第一和第二掩模照明区域被布置成同时照射相同的掩模。 光刻设备还包括光投射系统。 投影系统投射第一辐射束，以形成第一衬底照明区，同时投射第二辐射束，以形成第二衬底照明区。 版权所有（C）2011，JPO＆INPIT

    Lithographic apparatus and method
    16.
    发明专利
    Lithographic apparatus and method 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号：JP2011109128A

    公开(公告)日：2011-06-02

    申请号：JP2011014525

    申请日：2011-01-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MULDER HEINE MELLE ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  ENGELEN ADRIANUS FRANCISCUS PETRUS ,  EURLINGS MARKUS FRANCISCUS ANTONIUS ,  VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE ,  TINNEMANS PATRICIUS ALOYSIUS JACOBUS ,  VAN DER VEEN PAUL ,  ENDENDIJK WILFRED EDWARD

    IPC: H01L21/027 ,  G02B19/00

    CPC classification number: G03F7/70291 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70516

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which applies a desired angular intensity distribution to a radiation beam by using an array of mirrors, this radiation beam overcoming or alleviating one or more shortcomings of a lithographic apparatus used for projecting a pattern onto a target part of a substrate. SOLUTION: A lithographic apparatus conditions a radiation beam using an illumination system. In the conditioning step, an array of individually controllable elements and associated optical components of the illumination system are controlled so that the radiation beam is converted into a desired illumination mode. This controlling step allocates different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme selected for providing a desired modification of one or more properties of the illumination mode, the radiation beam or both. Furthermore, the lithographic apparatus patterns the radiation beam to have a pattern in its cross-section, and projects the patterned radiation beam onto a target part of a substrate. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供通过使用反射镜阵列将期望的角度强度分布施加到辐射束的光刻设备，该辐射束克服或减轻用于投影图案的光刻设备的一个或多个缺点 到基板的目标部分上。 解决方案：光刻设备使用照明系统调节辐射束。 在调节步骤中，控制照明系统的独立可控元件和相关联的光学部件的阵列，使得辐射束被转换成期望的照明模式。 该控制步骤根据选择用于提供照明模式，辐射束或两者的一个或多个属性的期望修改的分配方案，将不同的可单独控制的元件分配到照明模式的不同部分。 此外，光刻设备将辐射束图案化成具有其横截面的图案，并将图案化的辐射束投射到基板的目标部分上。 版权所有（C）2011，JPO＆INPIT

    RADIATION SYSTEM
    19.
    发明申请
    RADIATION SYSTEM 审中-公开
    辐射系统

    公开(公告)号：WO2016139055A3

    公开(公告)日：2016-10-27

    申请号：PCT/EP2016053216

    申请日：2016-02-16

    Applicant: ASML NETHERLANDS BV

    Inventor： NIENHUYS HAN-KWANG ,  BOGAART ERIK WILLEM ,  DONKER RILPHO LUDOVICUS ,  KRUIZINGA BORGERT ,  LOOPSTRA ERIK ROELOF ,  BOTMA HAKO ,  DE VRIES GOSSE CHARLES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  BASELMANS JOHANNES JACOBUS MATHEUS

    IPC: G03F7/20 ,  G02B5/02

    CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

    Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Abstract translation: 一种辐射系统，包括分束装置，其被配置为接收主辐射束并将主辐射束分裂成多个分支辐射束，以及布置成接收输入辐射束并输出修改的辐射束的辐射改变装置，其中辐射 改变装置被配置为提供与所接收的输入辐射束相比具有增加的光密度的输出修改的辐射束，其中所述辐射改变装置被布置成使得由所述辐射改变装置接收的输入辐射束是主 辐射束和辐射改变装置被配置为向分束装置提供修改的主辐射束，或者其中辐射改变装置被布置成使得由辐射改变装置接收的输入辐射束是分支辐射束输出 从分束装置。

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