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    METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    用于测量显微结构的不对称性的方法和设备，位置测量方法，位置测量设备，光刻设备和设备制造方法

    公开(公告)号：WO2014026819A3

    公开(公告)日：2014-04-10

    申请号：PCT/EP2013065069

    申请日：2013-07-17

    Applicant: ASML NETHERLANDS BV

    Inventor： MATHIJSSEN SIMON GIJSBERT JOSEPHUS ,  BOGAART ERIK WILLEM ,  TINNEMANS PATRICIUS ALOYSIUS JACOBUS ,  DEN BOEF ARIE JEFFREY

    IPC: G03F9/00 ,  G03F7/20

    CPC classification number: G01B11/14 ,  G01B9/02 ,  G01B11/27 ,  G03F7/70058 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7069 ,  G03F9/7088

    Abstract: A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.

    Abstract translation: 一种光刻设备包括对准传感器，该对准传感器包括用于读取包括周期性结构的对准目标的位置的自参考干涉仪。 一种照明光学系统，用于将辐射聚焦到所述结构上的一个点上。 不对称检测光学系统接收由周期性结构衍射的正辐射和负辐射阶数的份额，并分别在第一和第二检测器上形成所述光斑的第一和第二图像，其中所述负阶辐射用于形成第一图像，以及 所述正序照射被用于形成第二图像。 处理器，用于一起处理来自所述第一和第二检测器的代表所述正和负阶的强度的信号，以产生周期性结构中的不对称性的测量结果。 不对称测量可用于提高对准传感器读取位置的准确度。

    RADIATION SYSTEM
    2.
    发明申请
    RADIATION SYSTEM 审中-公开
    辐射系统

    公开(公告)号：WO2016139055A3

    公开(公告)日：2016-10-27

    申请号：PCT/EP2016053216

    申请日：2016-02-16

    Applicant: ASML NETHERLANDS BV

    Inventor： NIENHUYS HAN-KWANG ,  BOGAART ERIK WILLEM ,  DONKER RILPHO LUDOVICUS ,  KRUIZINGA BORGERT ,  LOOPSTRA ERIK ROELOF ,  BOTMA HAKO ,  DE VRIES GOSSE CHARLES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  BASELMANS JOHANNES JACOBUS MATHEUS

    IPC: G03F7/20 ,  G02B5/02

    CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

    Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Abstract translation: 一种辐射系统，包括分束装置，其被配置为接收主辐射束并将主辐射束分裂成多个分支辐射束，以及布置成接收输入辐射束并输出修改的辐射束的辐射改变装置，其中辐射 改变装置被配置为提供与所接收的输入辐射束相比具有增加的光密度的输出修改的辐射束，其中所述辐射改变装置被布置成使得由所述辐射改变装置接收的输入辐射束是主 辐射束和辐射改变装置被配置为向分束装置提供修改的主辐射束，或者其中辐射改变装置被布置成使得由辐射改变装置接收的输入辐射束是分支辐射束输出 从分束装置。

    LITHOGRAPHIC APPARATUS.
    4.
    发明专利
    LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2008272A

    公开(公告)日：2012-09-11

    申请号：NL2008272

    申请日：2012-02-10

    Applicant: ASML NETHERLANDS BV

    Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  OTTENS JOOST JEROEN ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  DRENT WILLIAM ,  BOGAART ERIK WILLEM

    IPC: G03F7/20 ,  H01L21/68

    Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

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