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    Radiating system, lithographic device, device manufacturing method and device manufactured thereby
    1.
    发明专利
    Radiating system, lithographic device, device manufacturing method and device manufactured thereby 有权
    放射系统，光刻设备，器件制造方法及其制造的器件

    公开(公告)号：JP2005354062A

    公开(公告)日：2005-12-22

    申请号：JP2005166720

    申请日：2005-06-07

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： DIERICHS MARCEL MATHIJS THEODO ,  MARKUS FRANCISCUS ANTONIUS EUR ,  VOORMA HARM-JAN ,  FRIJNS OLAV WALDEMAR VLADIMIR

    IPC: G01B11/00 ,  G01B11/26 ,  G02B5/08 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70141

    Abstract: PROBLEM TO BE SOLVED: To provide a radiating system including a radiation generator and an illuminating system capable of measuring a relative position of the radiation generator to the illuminating system with the loss of energy suppressed to a minimum level. SOLUTION: The radiating system includes the radiation generator for generating a radiation beam, a radiation source and the illuminating system so as to receive the radiation beam and provide a projected beam of the radiation. The illuminating system includes a beam measuring system for measuring at least any one of the position and gradient of the radiation beam and a projector for re-directing a part of the section of the radiation beam to the beam measuring system. The beam measuring system may include several position sensors, thereby enabling the system to judge the position adjustment of the radiation source to the illuminating system. A diaphragm is connected to a collector of the radiation generator to enable the compensation of Rx, Ry and Rz besides the compensation of X, Y and Z. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种包括辐射发生器和照明系统的辐射系统，其能够以能量损失被抑制到最小水平来测量辐射发生器与照明系统的相对位置。 解决方案：辐射系统包括用于产生辐射束的辐射发生器，辐射源和照明系统，以便接收辐射束并提供投影的辐射束。 照明系统包括用于测量辐射束的位置和梯度中的至少任何一个的光束测量系统和用于将辐射束的该部分的一部分重新引导到光束测量系统的投影仪。 光束测量系统可以包括多个位置传感器，从而使系统能够判断辐射源对照明系统的位置调整。 除了X，Y和Z的补偿之外，隔膜连接到辐射发生器的收集器以使得能够补偿Rx，Ry和Rz。（C）2006，JPO和NCIPI

    RADIATION SYSTEM
    5.
    发明申请
    RADIATION SYSTEM 审中-公开
    辐射系统

    公开(公告)号：WO2016139055A3

    公开(公告)日：2016-10-27

    申请号：PCT/EP2016053216

    申请日：2016-02-16

    Applicant: ASML NETHERLANDS BV

    Inventor： NIENHUYS HAN-KWANG ,  BOGAART ERIK WILLEM ,  DONKER RILPHO LUDOVICUS ,  KRUIZINGA BORGERT ,  LOOPSTRA ERIK ROELOF ,  BOTMA HAKO ,  DE VRIES GOSSE CHARLES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  BASELMANS JOHANNES JACOBUS MATHEUS

    IPC: G03F7/20 ,  G02B5/02

    CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

    Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Abstract translation: 一种辐射系统，包括分束装置，其被配置为接收主辐射束并将主辐射束分裂成多个分支辐射束，以及布置成接收输入辐射束并输出修改的辐射束的辐射改变装置，其中辐射 改变装置被配置为提供与所接收的输入辐射束相比具有增加的光密度的输出修改的辐射束，其中所述辐射改变装置被布置成使得由所述辐射改变装置接收的输入辐射束是主 辐射束和辐射改变装置被配置为向分束装置提供修改的主辐射束，或者其中辐射改变装置被布置成使得由辐射改变装置接收的输入辐射束是分支辐射束输出 从分束装置。

    CORRECTION OF SPATIAL INSTABILITY OF AN EUV SOURCE BY LASER BEAM STEERING
    7.
    发明申请
    CORRECTION OF SPATIAL INSTABILITY OF AN EUV SOURCE BY LASER BEAM STEERING 审中-公开
    通过激光束转向校正EUV源的空间不稳定性

    公开(公告)号：WO2008010710A3

    公开(公告)日：2008-04-03

    申请号：PCT/NL2007050328

    申请日：2007-07-04

    Applicant: ASML NETHERLANDS BV ,  FRIJNS OLAV WALDEMAR VLADIMIR

    Inventor： FRIJNS OLAV WALDEMAR VLADIMIR

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70091 ,  G03F7/70133 ,  G03F7/70191 ,  H05G2/003 ,  H05G2/008

    Abstract: A method to align a discharge axis of a discharge radiation source with respect to optics of the lithographic apparatus includes creating a discharge in a substance in a discharge space between an anode and a cathode to form a plasma so as to generate electromagnetic radiation. The discharge is triggered by irradiating an area on a surface proximate the discharge space with an energetic beam. The position of the area is controlled in response to a property of the radiation in the lithographic apparatus and/or the temperature of a collector of the lithographic apparatus. Controlling the position of the area which is irradiated improves alignment of the discharge axis with the different lithographic modules, such as the contamination barrier, the illumination system, the substrate table and/or the projection system.

    Abstract translation: 将放电辐射源的放电轴相对于光刻设备的光学器件对准的方法包括在阳极和阴极之间的放电空间中的物质中产生放电以形成等离子体以产生电磁辐射。 通过用能量束照射放电空间附近的表面上的区域来触发放电。 响应于光刻设备中的辐射的性质和/或光刻设备的收集器的温度来控制该区域的位置。 控制被照射区域的位置可改善放电轴与不同的光刻模块（例如污染屏障，照明系统，衬底台和/或投影系统）的对准。

    A THERMAL CONDITIONING SYSTEM FOR THERMAL CONDITIONING A PART OF A LITHOGRAPHIC APPARATUS AND A THERMAL CONDITIONING METHOD
    10.
    发明专利
    A THERMAL CONDITIONING SYSTEM FOR THERMAL CONDITIONING A PART OF A LITHOGRAPHIC APPARATUS AND A THERMAL CONDITIONING METHOD 未知

    公开(公告)号：SG185191A1

    公开(公告)日：2012-11-29

    申请号：SG2012020897

    申请日：2012-03-22

    Applicant: ASML NETHERLANDS BV

    Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  VERHAGEN MARTINUS CORNELIS MARIA ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  VAN DONK GERRIT ,  VAN GERNER HENK JAN

    Abstract: A two-phase thermal conditioning system for thermal conditioning a part of a lithographic apparatus, includes an evaporator to be positioned in thermal contact with the part of the lithographic apparatus for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser to be positioned at a distance from the part of the lithographic apparatus for removing heat from the fluid inside the condenser by condensation of the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a circuit in which fluid is able to flow; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator configured to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor configured to provide a measurement signal representative of the temperature of the fluid; and a controller configured to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger from or to fluid inside the accumulator based on the measurement signal.(Figure 2)

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