公开(公告)号：WO2008072962A3

公开(公告)日：2008-10-16

申请号：PCT/NL2007050645

申请日：2007-12-13

Applicant: ASML NETHERLANDS BV ,  VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  KLUNDER DERK JAN WILFRED

Inventor： VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  KLUNDER DERK JAN WILFRED

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes (5) constructed and arranged to generate plasma of a first substance and a pinch (10) in the plasma. The radiation system also includes a plasma recombination surface (13) that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.

Abstract translation: 本发明涉及一种用于产生电磁辐射的辐射系统。 辐射系统包括一对电极（5），其构造和布置成在等离子体中产生第一物质和夹点（10）的等离子体。 辐射系统还包括等离子体复合表面（13），该等离子体复合表面（13）被布置成靠近夹点，并且被配置为中和多个等离子体颗粒。

公开(公告)号：WO2009116867A3

公开(公告)日：2009-11-12

申请号：PCT/NL2009050132

申请日：2009-03-20

Applicant: ASML NETHERLANDS BV ,  KRIVTSUN VLADIMIR MIHAILOVITC ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  MOORS JOHANNES HUBERTUS JOSEPH ,  CHURILOV SERGEY ,  GLUSHKOV DENIS

Inventor： KRIVTSUN VLADIMIR MIHAILOVITC ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  CHURILOV SERGEY ,  GLUSHKOV DENIS

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in a 6.8 nm range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd, or Tb, or a Tb-based composition configured to reduce a melting temperature of Tb.

Abstract translation: 目标材料被配置为用于构造和布置成产生具有6.8nm范围波长的辐射束的源。 目标材料包括配置成改变Gd或Tb的熔融温度的Gd基组合物或构造成降低Tb的熔融温度的Tb基组合物。

公开(公告)号：WO2008072966A3

公开(公告)日：2008-10-02

申请号：PCT/NL2007050652

申请日：2007-12-14

Applicant: ASML NETHERLANDS BV ,  IVANOV VLADIMIR VITALEVITCH ,  BANINE VADIM YEVGENYEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVIT

Inventor： IVANOV VLADIMIR VITALEVITCH ,  BANINE VADIM YEVGENYEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVIT

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005

Abstract: A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help forming the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limiting the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.

Abstract translation: 将图案化的辐射束投影到基底上。 反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。 在等离子体源中，在等离子体区域中产生等离子体电流。 为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。 该轴向磁场有助于限制等离子体的Z夹点区域的崩溃。 通过限制塌陷，可以减少发射的快速离子的数量。

公开(公告)号：WO2008075952A2

公开(公告)日：2008-06-26

申请号：PCT/NL2007050670

申请日：2007-12-19

Applicant: ASML NETHERLANDS BV ,  IVANOV VLADIMIR VITALEVITCH ,  BANINE VADIM YEVGENYEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVIT

Inventor： IVANOV VLADIMIR VITALEVITCH ,  BANINE VADIM YEVGENYEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVIT

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

Abstract: Reducing Fast Ions in a Plasma Radiation Source A radiation source with an anode and a cathode to create a discharge in a discharge space between the anode and the cathode is disclosed. A plasma is formed in the radiation source which generates electromagnetic radiation, such as EUV radiation. The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near the discharge space to create a main plasma channel which triggers the discharge. The radiation source also has a second activation source to direct a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcutting of the main plasma current is realized which in turn may reduce the amount of fast ions produced.

Abstract translation: 降低等离子体辐射源中的快速离子体公开了一种具有阳极和阴极以在阳极和阴极之间的放电空间中产生放电的辐射源。 在辐射源中形成等离子体，其产生诸如EUV辐射的电磁辐射。 辐射源包括第一激活源，用于将第一能量脉冲引导到放电空间附近的辐射源中的第一点上，以产生触发放电的主等离子体通道。 辐射源还具有第二激活源，以将第二能量脉冲引导到放电空间附近的辐射源中的第二点上，以产生附加的等离子体通道。 通过在相同的放电期间引导第二能量脉冲，实现了主等离子体电流的快捷方式，这又可以减少产生的快速离子的量。

公开(公告)号：WO2005064401A3

公开(公告)日：2005-09-29

申请号：PCT/NL2004000928

申请日：2004-12-31

Applicant: ASML NETHERLANDS BV ,  BANINE VADIM YEVGENYEVICH ,  BAKKER LEVINUS PIETER ,  MOORS JOHANNES HUBERTUS JOSEPH ,  IVANOV VLADIMIR VITALEVITCH ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  VEEFKIND ABRAHAM

Inventor： BANINE VADIM YEVGENYEVICH ,  BAKKER LEVINUS PIETER ,  MOORS JOHANNES HUBERTUS JOSEPH ,  IVANOV VLADIMIR VITALEVITCH ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  VEEFKIND ABRAHAM

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70983

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

Abstract translation: 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，以及减轻碎片颗粒的碎片减轻系统，该碎片减小系统在使用期间形成的碎屑颗粒的至少一部分 光刻设备 碎片减轻系统被布置成施加磁场，使得至少带电的碎屑颗粒被减轻。

公开(公告)号：AT547924T

公开(公告)日：2012-03-15

申请号：AT07747411

申请日：2007-04-27

Applicant: ASML NETHERLANDS BV

Inventor： IVANOV VLADIMIR VITALEVITCH ,  BANINE VADIM YEVGENYEVICH ,  KRIVTSUN VLADIMIR MIHAILOVITCH

IPC: H05G2/00

Abstract: An apparatus for producing radiation by an electrically operated discharge has a first electrode, a second electrode. and a capacitor bank. The electrodes are configured at a distance from each other which allows plasma ignition. The capacitor bank is electrically connected at a first terminal to the first electrode and at a second terminal to the second electrode, and configured to store a discharge energy. The electrodes and the capacitor bank form an electric circuit. At least the first electrode is formed by an electrically conducting fluid supplied via a first feeding line. The apparatus further has a charger and a first high inductance unit. The charger is connected to at least one of the terminals. The first high inductance unit is provided upstream the first terminal in the first feeding line for electrically decoupling the electric circuit.

公开(公告)号：DE602006021680D1

公开(公告)日：2011-06-16

申请号：DE602006021680

申请日：2006-09-14

Applicant: ASML NETHERLANDS BV

Inventor： RAKHIMOVA TATYANA VICTOROVNA ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  KOVALEV ALEKSANDER SERGEEVICH ,  LOPAEV DMITRIY VICTOROVICH

IPC: G03F7/20

公开(公告)号：SG112047A1

公开(公告)日：2005-06-29

申请号：SG200406593

申请日：2004-11-10

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS PIETER ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  KRIVTSUN VLADIMIR MIHAILOVITCH

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

公开(公告)号：DE602005023696D1

公开(公告)日：2010-11-04

申请号：DE602005023696

申请日：2005-07-14

Applicant: ASML NETHERLANDS BV

Inventor： KOSHELEV KONSTANTIN NIKOLAEVITCH ,  IVANOV VLADIMIR VITALEVITCH ,  KOROB EVGENII DMITREEVITCH ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  GAYAZOV ROBERT RAFILEVITCH ,  KRIVTSUN VLADIMIR MIHAILOVITCH

IPC: H05G2/00

公开(公告)号：SG127702A1

公开(公告)日：2006-12-29

申请号：SG200305749

申请日：2003-09-30

Applicant: ASML NETHERLANDS BV

Inventor： ZUKAVISHVILI GIVI GEORGIEVITCH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  KOROB EVGENII DMITREEVITCH ,  BANINE VADIM YEVGENYEVICH ,  ANTSIFEROV PAVEL STANISLAVOVIC

IPC: G21K5/00 ,  F28D15/00 ,  F28D15/02 ,  G03F7/00 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/24

Abstract: A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.