公开(公告)号：JP2011082551A

公开(公告)日：2011-04-21

申请号：JP2010270657

申请日：2010-12-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RAKHIMOVA TATYANA V ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  KOVALEV ALEKSANDER S ,  LOPAEV DMITRIY VICTOROVICH

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/70933 ,  G21K2201/06

Abstract: PROBLEM TO BE SOLVED: To provide a method for cleaning elements of a lithographic device, for example, optical elements such as a collector mirror. SOLUTION: The method for cleaning the elements includes the steps of: providing a gas 155 containing nitrogen; generating nitrogen radicals from at least a part of the gas, thereby forming a radical containing gas 165; and providing at least a part of the radical containing gas to the one or more elements 100 of the apparatus. The lithographic apparatus includes a source and an optical element 100, and an electrical discharge generator 200 arranged so as to generate a radio frequency discharge. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洁光刻设备元件的方法，例如诸如集光镜的光学元件。 解决方案：用于清洁元件的方法包括以下步骤：提供含氮的气体155; 从气体的至少一部分产生氮自由基，从而形成含有基团的气体165; 以及向装置的一个或多个元件100提供至少一部分含自由基的气体。 光刻设备包括源和光学元件100以及布置成产生射频放电的放电发生器200。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2007096297A

公开(公告)日：2007-04-12

申请号：JP2006249166

申请日：2006-09-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RAKHIMOVA TATYANA V ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN N ,  MOORS JOHANNES HUBERTUS JOSEPH ,  KOVALEV ALEKSANDER S ,  LOPAEV DMITRIY VICTOROVICH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70933 ,  G21K2201/06

Abstract: PROBLEM TO BE SOLVED: To provide a method for cleaning elements of a lithographic device, especially a method for cleaning one or more optical elements of the lithographic device. SOLUTION: This method for cleaning elements of the lithographic device, for example, optical elements such as a collector mirror, includes a step for supplying gas containing nitrogen, a step for forming a radical-containing gas by generating nitrogen radicals from at least a part of the gas containing nitrogen, and a step for supplying at least a part of the radical-containing gas to one or more elements of the lithographic device. The lithographic device comprises a source, an optical element and an electrical discharge generator arranged to generate a radio frequency discharge. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于清洁光刻设备的元件的方法，特别是用于清洁光刻设备的一个或多个光学元件的方法。 解决方案：用于清洁光刻设备的元件的方法，例如诸如集光镜的光学元件，包括供应含氮气体的步骤，通过从中产生氮自由基来形成含自由基的气体的步骤 含有氮气的至少一部分气体，以及用于将至少一部分含自由基的气体供应到光刻设备的一个或多个元件的步骤。 光刻设备包括源，光学元件和布置成产生射频放电的放电发生器。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：NL1035743A1

公开(公告)日：2009-02-10

申请号：NL1035743

申请日：2008-07-23

Applicant: ASML NETHERLANDS BV

Inventor： IVANOV VLADIMIR VITALEVICH ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  KOSHELEV KONSTANTIN NIKOLAEVICH ,  ANTSIFEROV PAVEL STANISLAVOVICH ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  LOPAEV DMITRIY VICTOROVICH

IPC: H01L21/027 ,  G03F7/20

公开(公告)号：DE602006021680D1

公开(公告)日：2011-06-16

申请号：DE602006021680

申请日：2006-09-14

Applicant: ASML NETHERLANDS BV

Inventor： RAKHIMOVA TATYANA VICTOROVNA ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  KOVALEV ALEKSANDER SERGEEVICH ,  LOPAEV DMITRIY VICTOROVICH

IPC: G03F7/20

公开(公告)号：SG131060A1

公开(公告)日：2007-04-26

申请号：SG2006063077

申请日：2006-09-12

Applicant: ASML NETHERLANDS BV

Inventor： RAKHIMOVA TATYANA VICTOROVNA ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  MOORS JOHANNES HUBERTUS JOSEPH ,  KOVALEV ALEKSANDER SERGEEVICH ,  LOPAEV DMITRIY VICTOROVICH

Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.