公开(公告)号：DE602006021680D1

公开(公告)日：2011-06-16

申请号：DE602006021680

申请日：2006-09-14

Applicant: ASML NETHERLANDS BV

Inventor： RAKHIMOVA TATYANA VICTOROVNA ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  KOVALEV ALEKSANDER SERGEEVICH ,  LOPAEV DMITRIY VICTOROVICH

IPC: G03F7/20

公开(公告)号：SG131060A1

公开(公告)日：2007-04-26

申请号：SG2006063077

申请日：2006-09-12

Applicant: ASML NETHERLANDS BV

Inventor： RAKHIMOVA TATYANA VICTOROVNA ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  MOORS JOHANNES HUBERTUS JOSEPH ,  KOVALEV ALEKSANDER SERGEEVICH ,  LOPAEV DMITRIY VICTOROVICH

Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.