公开(公告)号：JP2005277414A

公开(公告)日：2005-10-06

申请号：JP2005079763

申请日：2005-03-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VOORMA HARM-JAN ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  MICKAN UWE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide a variable attenuator of a lithographic device capable of maintaining a high wafer throughput.
SOLUTION: The lithographic device is provided with the variable attenuator A that varies the strength thereof without changing the position of a projected beam so as to be able to control the dose of radiation in a wafer portion, thereby optimizing the throughput of the wafer. The variable attenuator consists of two parallel mirrors 21, 22 in which an input radiation beam is incident on a first mirror, thereby, the input radiation beam incident on the first mirror being reflected towards a second mirror to permit the radiation to be reflected, and which are thus positioned so as to generate an output radiation beam having a strength required to be input into an illuminating system, and of a tilting mechanism which maintains the mirrors in parallel with each other and tilts the mirrors so as to allow the angles of the beams incident on the mirrors to be changed and thereby the strength of the output beams to be changed.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供能够保持高晶圆生产能力的光刻设备的可变衰减器。 解决方案：光刻设备设置有可变衰减器A，其可改变其强度而不改变投影光束的位置，以便能够控制晶片部分中的辐射剂量，从而优化 晶圆。 可变衰减器由两个平行的反射镜21,22组成，其中输入辐射束入射在第一反射镜上，从而入射在第一反射镜上的输入辐射束被反射朝向第二反射镜以允许辐射被反射，以及 它们被定位成产生具有需要输入到照明系统中的强度的输出辐射束，以及将反射镜保持彼此平行并倾斜反射镜的倾斜机构，从而允许 入射到要​​改变的反射镜上的光束，从而改变输出光束的强度。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005217398A

公开(公告)日：2005-08-11

申请号：JP2005007226

申请日：2005-01-14

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  LEONARDUS FRANKEN JOHANNES CHR ,  MICKAN UWE ,  VOORMA HARM-JAN

IPC: G02B17/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus, a device manufacturing method for manufacturing a device with high precision, and a device manufactured by the same. SOLUTION: The lithography apparatus comprises: an illumination system IL for providing a projection beam of radiation PB; and a support structure MT for supporting a patterning means MA. The lithographic apparatus further comprises: a substrate table WT for holding a substrate W; a projection system PL for projecting the patterned beam onto a target portion of the substrate W; and a condenser which is structured to transmit a radiation R, received from a first radiation source SO, to the illumination system IL. The condenser K comprises at least one heater for heating the condenser when a condensing component receives substantially no radiation from the radiation source SO. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，用于制造高精度器件的器件制造方法及其制造方法。 光刻设备包括：照明系统IL，用于提供辐射PB的投影光束; 以及用于支撑图案形成装置MA的支撑结构MT。 光刻设备还包括：用于保持衬底W的衬底台WT; 用于将图案化的光束投影到基板W的目标部分上的投影系统PL; 以及构造成将从第一辐射源SO接收的辐射R传送到照明系统IL的冷凝器。 冷凝器K包括至少一个用于加热冷凝器的加热器，当冷凝部件基本上不接收来自辐射源SO的辐射时。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2012151513A

公开(公告)日：2012-08-09

申请号：JP2012111485

申请日：2012-05-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK ROELOF ,  DIERICHS MARCLE MATHIJS T M ,  JASPER JOHANNES CHRISTIAN MARIA ,  MEIJER HENDRICUS JOHANNE MARIA ,  MICKAN UWE ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  LIPSON MATTHEW ,  UITTERDIJK TAMMO ,  BASELMANS JOHANNES JACOBUS MATHEUS

IPC: H01L21/027 ,  G02B21/00 ,  G02B21/26 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method of manufacturing a device.SOLUTION: A lithographic projection apparatus for using with immersion liquid placed between a final element of a projection system and a substrate W is disclosed. A plurality of methods for protecting the projection system, a substrate table, and components of a liquid constraint system are disclosed. These methods include: a step of applying a protective coating on the final element 20 of the projection system; and a step of providing sacrificial bodies to an upstream side of the components. A two-component final optical element of CaFis also disclosed.

Abstract translation: 解决的问题：提供一种光刻设备及其制造方法。 公开了一种用于使用放置在投影系统的最终元件和基板W之间的浸没液体的光刻投影装置。 公开了用于保护投影系统，衬底台和液体约束系统的组件的多种方法。 这些方法包括：将保护涂层施加在投影系统的最终元件20上的步骤; 以及向组件的上游侧提供牺牲体的步骤。 还公开了CaF 2 的双组分最终光学元件。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2007013149A

公开(公告)日：2007-01-18

申请号：JP2006176008

申请日：2006-06-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MEIJER HENDRICUS JOHANNES MARI ,  MICKAN UWE ,  KLUSE MARCO LE

IPC: H01L21/027 ,  G03F1/16

CPC classification number: G03F7/70941 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/38 ,  G03F1/40 ,  G03F7/707 ,  G03F7/70708 ,  G21K2201/06

Abstract: PROBLEM TO BE SOLVED: To provide an earthing system and a mask avoiding such a problem that particles may be generated due to damage to a conductive coating by a conducting pin used for grounding a mask surface, in order to avoid errors caused by electrostatic charging during making a reflective mask for a lithographic apparatus using extreme ultraviolet radiation (EUV) and using the mask for an EUV lithographic apparatus.
SOLUTION: This system comprises a conductor CN connected to the earth and formed in such a manner as to make electric contact with a conductive coating 50 covering at least a part of a mask MA. This conductive coating comprises a layer comprising a metal-based compound. The conductive coating of the metal-based compound has sufficiently high conductivity, shows high hardness and high chemical stability, and possesses wear resistance. Accordingly, there are few possibilities of generating particles due to the damage to the coating by pressure applied on the conductor CN.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供接地系统和掩模，避免了由于用于使掩模表面接地的导电针导致的导电性涂层的损坏而可能产生颗粒的问题，以避免由于 在制造用于使用极紫外辐射（EUV）的光刻设备的反射掩模和使用用于EUV光刻设备的掩模时的静电充电。 解决方案：该系统包括连接到地球并且以与覆盖掩模MA的至少一部分的导电涂层50进行电接触的方式形成的导体CN。 该导电涂层包括包含金属基化合物的层。 金属类化合物的导电性涂层具有足够高的导电性，显示出高的硬度和高的化学稳定性，并且具有耐磨性。 因此，由于施加在导体CN上的压力对涂层的损伤，几乎没有产生颗粒的可能性。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006210895A

公开(公告)日：2006-08-10

申请号：JP2005372890

申请日：2005-12-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MARTINUS HENDRIKUS ANTONIUS LE ,  DEN BOEF ARIE J ,  BURGHOORN JACOBUS ,  MICKAN UWE ,  VANNER ROELAND NICOLAAS MARIA ,  HAUSCHILD JAN

IPC: H01L21/027 ,  G01B11/00 ,  G01C3/06

CPC classification number: G02B27/0075 ,  G03F7/70641 ,  G03F9/7026

Abstract: PROBLEM TO BE SOLVED: To provide a method of performing a tilted focus testing and an exposure apparatus, capable of easily giving a tilt to the projection beam with a pattern using a tilting device, and capable of easily performing tilted defocus testing, and to provide a device manufactured in accordance with it. SOLUTION: In order to tilt the at least one reflective device to the second orientation, a device for tilting is used. A step for supplying the second projection beam with a tilt to the above first projection beam, and a step for producing a second projected radiation beam onto the target object, are provided along with a step for determining a lateral shift of the first and second projected radiation beams on the target object and, determining from the lateral shift a defocus of the target object with respect to the projected radiation beam. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种执行倾斜聚焦测试和曝光设备的方法，其能够使用倾斜装置以容易地使用倾斜装置的图案倾斜到投影光束，并且能够容易地进行倾斜散焦测试， 并提供根据其制造的装置。 解决方案：为了将至少一个反射装置倾斜到第二取向，使用倾斜装置。 提供将第二投影光束向上述第一投影光束提供倾斜的步骤，以及用于产生第二投影辐射束到目标物体上的步骤，以及用于确定第一和第二投影光束的横向偏移的步骤 在目标物体上的辐射束，并且从横向偏移确定目标物体相对于投射的辐射束的散焦。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006186368A

公开(公告)日：2006-07-13

申请号：JP2005371980

申请日：2005-12-26

Applicant: ASML NETHERLANDS BV

Inventor： HAUSCHILD JAN ,  DEN BOEF ARIE J ,  ANTONIUS LEENDERS MARTINUS H ,  MICKAN UWE ,  MARIA VANNEER ROELAND N

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an exposure device, tilt equipment, a method for conducting a tilt convergence test, and a device manufactured by the same. SOLUTION: The exposure device is equipped with a lighting system for providing a projection radiation beam, a support structure which is equipped with a pattern and supports equipment functioning to impart a pattern to a section of the projection beam, a table for holding a target object, a projection system for projecting a patterned beam on the target object, and the tilt equipment for providing a tilted projection beam. The tilt equipment is provided substantially on a pupil plane of the projection system. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2006135325A

公开(公告)日：2006-05-25

申请号：JP2005319029

申请日：2005-11-02

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER LAAN HANS ,  MARKUS FRANCISCUS ANTONIUS EUR ,  MICKAN UWE ,  VAN SCHOOT JAN BERNARD PLECHLE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70941 ,  G03F7/70558 ,  G03F7/70666

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, and to provide a method of manufacturing device. SOLUTION: A lithographic apparatus comprises an illumination system for providing a projection radiation beam, a support structure for supporting a patterned device that functions to give a pattern on the sectional face of the projection beam, a substrate table for holding a substrate, and a projector for projecting a patterned beam on the target of the substrate. A sensor is provided for measuring spatial intensity distribution of the projection beam in the substrate. The spatial distribution of the transmittance or the reflectance of the patterned device can be determined from a measured intensity distribution with the distribution of the projection beam incident on the patterned device. By comparing the transmittance or reflectance of a region having completely the same pattern, integrated (microscopic) distribution of the transmittance or the reflectance of the patterned device can be determined. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，并提供一种制造装置的方法。 解决方案：光刻设备包括用于提供投影辐射束的照明系统，用于支撑用于在投影束的截面上赋予图案的图案化装置的支撑结构，用于保持基板的基板台， 以及用于将图案化的光束投影到基板的靶上的投影仪。 提供了用于测量基板中的投影光束的空间强度分布的传感器。 图案化器件的透射率或反射率的空间分布可以根据入射在图案化器件上的投影光束的分布的测量强度分布来确定。 通过比较具有完全相同图案的区域的透射率或反射率，可以确定图案化器件的透射率或反射率的一体化（微观）分布。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：WO2005071486A3

公开(公告)日：2005-09-09

申请号：PCT/NL2005000042

申请日：2005-01-21

Applicant: ASML NETHERLANDS BV ,  MOORS JOHANNES HUBERTUS JOSEPH ,  MICKAN UWE

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  MICKAN UWE

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

Abstract: In a lithographic apparatus a beam of radiation passes along a beam path to a substrate, for applying patterned illumination to the substrate. An exhangeable aperture screen (22A) is inserted in the beam path to partially block out the beam from a remainder of the path onto the substrate. A test surface (28) is provided on the aperture screen, so that the test surface receives a part of the beam that is not passed along the remainder of the beam path. The test surface is made of a material that is sensitive, under influence of radiation from the beam, to chemical alterations that also affect the optical element (24) under influence of radiation from the beam. The test surface is later analyzed for chemical alterations after exposure to the beam.

Abstract translation: 在光刻设备中，辐射束沿着光束路径传递到衬底，用于将图案化照明施加到衬底。 一个可变的孔径屏幕（22A）插入到光束路径中，以将波束从路径的剩余部分中部分地阻挡到基板上。 测试表面（28）设置在孔眼屏幕上，使得测试表面接收不沿着光束路径的其余部分通过的光束的一部分。 测试表面由在光束辐射的影响下是敏感的材料制成，在来自光束的辐射的影响下也影响光学元件（24）的化学变化。 随后分析测试表面暴露于梁后的化学变化。

公开(公告)号：WO2007110777A3

公开(公告)日：2009-09-11

申请号：PCT/IB2007001244

申请日：2007-03-19

Applicant: ASML NETHERLANDS BV ,  MICKAN UWE ,  VAN DIJSSELDONK ANTONIUS JOHAN

Inventor： MICKAN UWE ,  VAN DIJSSELDONK ANTONIUS JOHAN

IPC: G03F7/20 ,  G03F1/14

CPC classification number: G03B27/6242 ,  G03B27/42 ,  G03F1/70 ,  G03F7/70433 ,  G03F7/70941

Abstract: A mask for a lithographic apparatus is disclosed, the mask having a patterned region bearing a pattern to be transferred onto a substrate and a border surrounding the patterned region, wherein at least part of the border has a plurality of elements, the dimensions of the elements being such that, during use, they would not be resolved at the substrate. Also, a lithographic apparatus is disclosed, the apparatus having a projection system, a substrate table arranged to hold a substrate, and a patterning device having a patterned region which bears a pattern to be transferred using a radiation beam via the projection system onto the substrate, at least part of a border surrounding the patterned region comprising a plurality of elements arranged to direct radiation onto the substrate, the dimensions of the elements such that, during use, they are not resolved at the substrate.

Abstract translation: 公开了一种用于光刻设备的掩模，该掩模具有带有要转印到基底上的图案的图案化区域和围绕图案化区域的边界，其中边界的至少一部分具有多个元件，元件的尺寸 使其在使用过程中不会在底物上被解决。 此外，公开了一种光刻设备，该设备具有投影系统，布置成保持基板的基板台，以及具有图案化区域的图案形成装置，该图案化区域具有通过投影系统使用辐射束将被转印的图案到基板上 围绕所述图案化区域的边界的至少一部分包括被布置成将辐射引导到所述基板上的多个元件，所述元件的尺寸使得在使用期间它们在所述基板处未分辨。

公开(公告)号：NL2005771A

公开(公告)日：2011-06-30

申请号：NL2005771

申请日：2010-11-29

Applicant: ASML NETHERLANDS BV

Inventor： BOEIJ WILHELMUS ,  LOOPSTRA ERIK ,  MICKAN UWE ,  SCHOOT JAN ,  VRIES GOSSE

IPC: G03F7/20

Abstract: An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.