公开(公告)号：NL2010771A

公开(公告)日：2013-12-10

申请号：NL2010771

申请日：2013-05-08

Applicant: ASML NETHERLANDS BV

Inventor： MULDER HEINE ,  SCHUURMANS FRANK ,  ZWET ERWIN

IPC: G03F7/20

公开(公告)号：NL2007918A

公开(公告)日：2012-06-21

申请号：NL2007918

申请日：2011-12-02

Applicant: ASML NETHERLANDS BV

Inventor： MULCKHUYSE WOUTER ,  ZWET ERWIN ,  JAGER PIETER

IPC: G03F7/20

公开(公告)号：NL2007789A

公开(公告)日：2012-06-11

申请号：NL2007789

申请日：2011-11-15

Applicant: ASML NETHERLANDS BV

Inventor： ZWET ERWIN ,  JAGER PIETER ,  ONVLEE JOHANNES ,  MAN HENDRIK

IPC: G03F7/20

Abstract: A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.

公开(公告)号：NL2006260A

公开(公告)日：2011-08-24

申请号：NL2006260

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ONVLEE JOHANNES ,  JAGER PIETER ,  ZWET ERWIN

IPC: G03F7/20

Abstract: A lithographic apparatus includes two or more optical columns configured to project a beam on a target portion of a substrate, each of the two or more optical columns including one or more radiation sources (906) to provide the beam, and a projection system (920, 924, 930) to project the beam onto the target portion; a scanning movement actuator configured to move the substrate with a scanning speed in a scanning direction with respect to the two or more optical columns; and two or more position measurement devices (944) configured to determine a position of the respective two or more optical columns with respect to a reference object (940).

公开(公告)号：NL2006257A

公开(公告)日：2011-08-24

申请号：NL2006257

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ZWET ERWIN ,  JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK ,  DEKKER ALBERT ,  SPIERDIJK JOHANNUS PETRUS FRANSISCUS ,  MAN HENDRIK

IPC: G03F7/20