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    DRY RESIST FILM AND PROCESS FOR PRODUCING RESIST PATTERNS
    12.
    发明专利
    DRY RESIST FILM AND PROCESS FOR PRODUCING RESIST PATTERNS 未知

    公开(公告)号：DE3561771D1

    公开(公告)日：1988-04-07

    申请号：DE3561771

    申请日：1985-12-16

    Applicant: BASF AG

    Inventor： ELZER ALBERT DR ,  SCHORNICK GUNNAR DR ,  SANNER AXEL DR

    IPC: G03C1/00 ,  G03F7/004 ,  G03F7/027 ,  G03C1/68

    Abstract: In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of (a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or methacryloyl groups and are soluble or dispersible in aqueous alkaline solutions, (b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, (c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, (d) from 0.001 to 10% by weight of one or more photoinitiators and (e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.

    Embossing matrices prodn. from liq. photopolymerisable compsn. - using mould formed by matrix and frame, for simplicity and speed
    15.
    发明专利
    Embossing matrices prodn. from liq. photopolymerisable compsn. - using mould formed by matrix and frame, for simplicity and speed 未知

    公开(公告)号：DE2458523A1

    公开(公告)日：1976-06-16

    申请号：DE2458523

    申请日：1974-12-11

    Applicant: BASF AG

    Inventor： WERTHER HEINZ-ULRICH DR ,  GEIGER KURT ,  ZUERGER MANFRED ,  ELZER ALBERT DR

    IPC: B41C3/06 ,  B41M1/24 ,  B41N1/12 ,  G03F7/00 ,  G03F7/20 ,  G03F7/10

    Abstract: In the prodn. of matrices for embossing by placing a curable compsn. in the patric mould formed with the matrix and curing the compsn., a liquid photopolymerisable material (I) is poured into a mould formed from a matrix and edge suited to the wall thickness of the patrix, (I) hardening to a material with a hardness of 50 Shore A to 80 Shore D, pref. 70 Shore A to 50 Shore D on photopolymsn. with full-tone exposure, with shrinkage of is not >5, pref. 2% (w.r.t. a 10 cm x 10 cm sample ; and (I) is photopolymesd. slowly by full-tone exposure with actinic light and then released from the mould. The patrix pref. is tempered in the mould at 40-100 degrees C, opt. under pressure, after photopolyms. The matrices can be produced away from the printing machine, e.g. in the repro division of the printing works. Installation in the machine, together with the matrices, can be carried out quickly (in a few min.) and without problems. In addn., the properties of the material ensure good embossing quality and high editions at low wastage. The matrices ae re-usable.

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