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    RELIEF PRINTING PLATES AND LAMINATES FOR THEIR MANUFACTURE
    12.
    发明专利
    RELIEF PRINTING PLATES AND LAMINATES FOR THEIR MANUFACTURE 未知

    公开(公告)号：CA1039100A

    公开(公告)日：1978-09-26

    申请号：CA212086

    申请日：1974-10-23

    Applicant: BASF AG

    Inventor： ZUERGER MANFRED ,  ELZER ALBERT ,  RICHTER PETER ,  WIGGER AUGUST ,  WERTHER HEINZ-ULRICH

    IPC: G03F7/00 ,  G03F7/09 ,  G03F7/095 ,  G03F7/11 ,  G03C1/76

    Abstract: The invention relates to relief plates for flexographic printing comprising a relatively soft elastomeric base (U) having a modulus of elasticity of from 10 to 200 kg/cm2 and a thickness of from 0,5 to 6 mm and, firmly bonded thereto, a thin, relatively hard, difficultly soluble intermediate layer Z having a modulus of elasticity of from 1 x 103 to 2.1 x 106 kg/cm2 and a thickness of from 5 to 500.mu. and, firmly bonded to said intermediate layer Z, a relief layer P' consisting of a photo-crosslinked elastomeric mixture having a modulus of elasticity of from 30 to 2,000 kg/cm and a thickness of from 200 to 300.mu., the modulus of elasticity of the photo-crosslinked relief layer P' being the same as or higher than that of the base U and the neutral surface of the relief plate lying in or near the intermediate layer Z. The invention also relates to photosensitive laminates for the production of such plates.

    13.
    发明专利
    未知

    公开(公告)号：DE59303078D1

    公开(公告)日：1996-08-01

    申请号：DE59303078

    申请日：1993-01-08

    Applicant: BASF AG ,  RICHTER GISELA ,  RICHTER WOLFGANG ,  RICHTER GEORG

    Inventor： KUEHNEL GERT ,  SCHNITZER GEORG ,  RICHTER PETER

    IPC: D06B23/20 ,  D06P1/22

    Abstract: PCT No. PCT/EP93/00021 Sec. 371 Date Jul. 13, 1994 Sec. 102(e) Date Jul. 13, 1994 PCT Filed Jan. 8, 1993 PCT Pub. No. WO93/14257 PCT Pub. Date Jul. 22, 1993.A continuous process for dyeing yarns with vattable dyes comprises, in continuous yarn dyeing ranges, metering an aqueous dye dispersion into the circulating chemical liquor.

    14.
    发明专利
    未知

    公开(公告)号：DE4201052A1

    公开(公告)日：1993-07-22

    申请号：DE4201052

    申请日：1992-01-17

    Applicant: BASF AG

    Inventor： KUEHNEL GERT DR ,  RICHTER PETER ,  SCHNITZER GEORG

    IPC: D06B23/20 ,  D06P1/22

    Abstract: The invention concerns a continuous process for dyeing yarn with vat dyes, the process being characterized in that the yarn-dyeing equipment operates continuously and an aqueous dispersion of the dye is added to the recycled dye-bath liquor.

    17.
    发明专利
    未知

    公开(公告)号：NO141506B

    公开(公告)日：1979-12-17

    申请号：NO743605

    申请日：1974-10-04

    Applicant: BASF AG

    Inventor： ELZER ALBERT ,  RICHTER PETER ,  WIGGER AUGUST ,  WERTHER HEINZ-ULRICH ,  ZUERGER MANFRED

    IPC: G03F7/09 ,  G03F7/095 ,  G03F7/00 ,  G03F7/11 ,  B41N1/06 ,  G03F7/02

    Abstract: The invention relates to relief plates for flexographic printing comprising a relatively soft elastomeric base (U) having a modulus of elasticity of from 10 to 200 kg/cm2 and a thickness of from 0.5 to 6 mm and, firmly bonded thereto, a thin, relatively hard, difficultly soluble intermediate layer Z having a modulus of elasticity of from 1 x 103 to 2.1 x 106 kg/cm2 and a thickness of from 5 to 500 mu and, firmly bonded to said intermediate layer Z, a relief layer P' consisting of a photocrosslinked elastomeric mixture having a modulus of elasticity of from 30 to 2000 kg/cm2 and a thickness of from 200 to 300 mu , the modulus of elasticity of the photocrosslinked relief layer P' being the same as or higher than that of the base U and the neutral surface of the relief plate lying in or near the intermediate layer Z. The invention also relates to photosensitive laminates for the production of such plates.

    MANUFACTURE OF THIN LAYERS OF POLYURETHANE ELASTOMERS
    19.
    发明专利
    MANUFACTURE OF THIN LAYERS OF POLYURETHANE ELASTOMERS 未知

    公开(公告)号：CA1007595A

    公开(公告)日：1977-03-29

    申请号：CA187265

    申请日：1973-12-03

    Applicant: BASF AG

    Inventor： VOLKERT OTTO ,  WIGGER AUGUST ,  ZUERGER MANFRED ,  RICHTER PETER

    IPC: C08F299/00 ,  B05D3/06 ,  C08F283/00 ,  C08F290/00 ,  C08G18/00 ,  C08G18/63 ,  C08J5/18

    Abstract: 1450906 Polyurethane layers; photopolymerizing unsaturated monomers BASF AG 3 Dec 1973 [4 Dec 1972] 55919/73 Headings C3R and C3P Polyurethane layers are prepared by adding a compatible monomer having at least two photocross-linkable C-C multiple bonds or a compatible monomer mixture comprising at least 50% by weight of one of such monomers and not more than 50% by weight of a photopolymerizable monoethylenically unsaturated monomer, and optionally also a photopolymerization initiator, to a liquid polyurethane elastomer forming reaction mixture comprising (A) (i) a polyether, polyester, hydroxypolyether urethane or hydroxypolyester urethane or a mixture thereof with a polyalcohol and/or a diamino and (ii) a diisocyanate or (B) (i) a prepolymer of a hydroxyl compound as defined in (A) and a diisocyanate and (ii) a polyester, polyether, hydroxypolyester urethane, hydroxypolyetherurethane, polyhydric alcohol, or diamine or a mixture of two or more thereof, the resulting mixture containing a major amount of the polyurethane elastomer-forming reaction mixture, applying the resulting mixture to a substrate to form a layer, irradiating the layer with electromagnetic radiation of wavelength less than 0À7 Ám to effect photocrosslinking of the monomer(s) and gelling of the layer and thermally curing the so-treated layer. The layer is suitably formed on a continuously moving substrate and has a thickness of from 0À2 to 5 mm. Conventional polyurethane elastomer-forming reactants are used. The monomer having at least two C-C multiple bonds is preferably an olefinically poly-unsaturated carboxylate, for example a diester of a C 2-6 aliphatic diol and acrylic or methacrylic acid, a triester of a C 3-10 aliphatic triol and acrylic or methacrylic acid, a divinyl ester of a C 2-8 dicarboxylic acid, a diallyl ester of a C 2-8 dicarboxylic acid and a vinyl ester or allyl ester of a C 3-5 olefinically unsaturated monocarboxylic acid. The unsaturated monomers are preferably used in amounts not exceeding 10% weight of the reaction mixture.

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