11.
    发明专利
    未知

    公开(公告)号:DE19533665C2

    公开(公告)日:1997-09-18

    申请号:DE19533665

    申请日:1995-09-12

    Applicant: BASF AG

    Abstract: The prodn. of an alkylphenol of formula (I) comprises reacting corresp. alkyl-cyclohex-2- en-1-one of formula (II) at 200-400 degrees C and 0.01-50 bar in presence of a supported Pd/ alpha -alumina catalyst (III) with a specific surface (BET) of 1-10 m /g, a pore dia. of 5 nm to 300 microns and a pore vol. of 0.1-0.5 cm /g, in which 80-100% of the pores have a dia. of 40-400 nm. R1-R5 = H or 1-8C alkyl. Also claimed are catalysts (III) as such.

    12.
    发明专利
    未知

    公开(公告)号:DE19533665A1

    公开(公告)日:1997-03-13

    申请号:DE19533665

    申请日:1995-09-12

    Applicant: BASF AG

    Abstract: The prodn. of an alkylphenol of formula (I) comprises reacting corresp. alkyl-cyclohex-2- en-1-one of formula (II) at 200-400 degrees C and 0.01-50 bar in presence of a supported Pd/ alpha -alumina catalyst (III) with a specific surface (BET) of 1-10 m /g, a pore dia. of 5 nm to 300 microns and a pore vol. of 0.1-0.5 cm /g, in which 80-100% of the pores have a dia. of 40-400 nm. R1-R5 = H or 1-8C alkyl. Also claimed are catalysts (III) as such.

    15.
    发明专利
    未知

    公开(公告)号:DE58900569D1

    公开(公告)日:1992-01-30

    申请号:DE58900569

    申请日:1989-01-28

    Applicant: BASF AG

    Abstract: Agent for reducing the transpiration of plants and/or for avoiding the plants being affected by heat stress and drought stress, characterised in that it contains at least one acetylene compound of the general formula I in which the substituents have the following meanings: R represents CH2OH, COOH, CH2OR , COOR or CHXY, X represents OR and Y represents OR , or X and Y together represent C2-C5-alkylenedioxy which is optionally mono-, di- or trisubstituted by C1-C4-alkyl, or represent a divalent oxygen atom, where R and R represent C1-C8-alkyl and R represents C1-C8-alkyl, C2-C8-alkoxyalkyl, C2-C4-haloalkyl, phenyl or C7-C16-phenylalkyl, and at least one phenylbenzylurea of the general formula II in which the substituents have the following meanings: R represents hydrogen, C1-C4-alkyl, C1-C4-alkoxy, C1-C4-haloalkyl, C1-C4-haloalkoxy, phenyl or C7-C16-phenylalkyl and R - R radicals independently of one another represent hydrogen, C1-C4-alkyl, C1-C4-alkoxy, halogen, C1-C4-haloalkyl, C1-C4-haloalkoxy, phenyl, phenoxy, nitro, cyano, hydroxyl, OR , CHO or COOR .

    16.
    发明专利
    未知

    公开(公告)号:DE3934205A1

    公开(公告)日:1991-04-18

    申请号:DE3934205

    申请日:1989-10-13

    Applicant: BASF AG

    Abstract: Preparation of cyclohexanetrionecarboxylic acid thiol esters of the formula I in which R and R represent optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, benzyl or phenyl, and R additionally denotes hydrogen, by reacting a cyclohexanetrione compound II with hydroxylamine or hydroxylamine O-sulphonic acid in an inert solvent at temperatures from 0 to 150 DEG C to give cyclohexanetrione compounds III subsequently reacting the compounds III with a mercaptan IV R -SH IV in the presence of an anhydrous acid HX to give cyclohexanetrione imidothioester salts V where X represents the acid radical, and hydrolysing the compounds V to give the cyclohexanetrione carboxylic acid thiol esters I.

    19.
    发明专利
    未知

    公开(公告)号:ES2062245T3

    公开(公告)日:1994-12-16

    申请号:ES90118944

    申请日:1990-10-04

    Applicant: BASF AG

    Abstract: Preparation of cyclohexanetrionecarboxylic acid thiol esters of the formula I in which R and R represent optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, benzyl or phenyl, and R additionally denotes hydrogen, by reacting a cyclohexanetrione compound II with hydroxylamine or hydroxylamine O-sulphonic acid in an inert solvent at temperatures from 0 to 150 DEG C to give cyclohexanetrione compounds III subsequently reacting the compounds III with a mercaptan IV R -SH IV in the presence of an anhydrous acid HX to give cyclohexanetrione imidothioester salts V where X represents the acid radical, and hydrolysing the compounds V to give the cyclohexanetrione carboxylic acid thiol esters I.

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