11.
    发明专利
    未知

    公开(公告)号:DE58907082D1

    公开(公告)日:1994-04-07

    申请号:DE58907082

    申请日:1989-09-23

    Applicant: BASF AG

    Abstract: The invention relates to radiation-reactive mixtures of certain precursors and carbonyl compounds which contain aromatic radicals and, in the UV-excited state, are capable of hydrogen abstraction, which mixtures experience a solubility differentiation on irradiation with actinic light and are suitable for the preparation of polyimides, polyisoindoloquinazolinediones, polyoxazinediones, polyquinazolinediones or polyquinazolones. … They are suitable for the production of insulating layers and printed circuit boards.

    12.
    发明专利
    未知

    公开(公告)号:DE3918016A1

    公开(公告)日:1990-12-06

    申请号:DE3918016

    申请日:1989-06-02

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP90/00866 Sec. 371 Date Nov. 12, 1991 Sec. 102(e) Date Nov. 12, 1991 PCT Filed May 30, 1990 PCT Pub. No. WO90/15087 PCT Pub. Date Dec. 13, 1990.Novel (meth)acrylate copolymers which contain, as polymerized units, A) one or more (meth)acrylates and/or (meth)acrylamides having second order nonlinear optical properties and of the general formula I (I) where R is hydrogen or methyl, X is a flexible spacer, which may or may not be present, Y is a divalent group having electron donor activity and Z is a noncentrosymmetric radical containing an easily polarizable conjugated pi -electron system and one or more electron acceptor groups, and B) one or more (meth)acrylates of alkanols where the alkyl radical is of 10 to 30 carbon atoms in a molar ratio of (A) to (B) of from 1:0.5 to 1:5 are very suitable as nonlinear optical materials for nonlinear optical arrangements and for the production of Langmuir-Blodgett films. The novel (meth)acrylate copolymers which contain terminal nitro, trifluoromethyl, cyano or fulven-6-yl groups as electron acceptors and have molar ratios A to B differing from those mentioned above are also suitable for intended uses outside nonlinear optics.

    17.
    发明专利
    未知

    公开(公告)号:ES2061862T3

    公开(公告)日:1994-12-16

    申请号:ES89117621

    申请日:1989-09-23

    Applicant: BASF AG

    Abstract: The invention relates to radiation-reactive mixtures of certain precursors and carbonyl compounds which contain aromatic radicals and, in the UV-excited state, are capable of hydrogen abstraction, which mixtures experience a solubility differentiation on irradiation with actinic light and are suitable for the preparation of polyimides, polyisoindoloquinazolinediones, polyoxazinediones, polyquinazolinediones or polyquinazolones. … They are suitable for the production of insulating layers and printed circuit boards.

    18.
    发明专利
    未知

    公开(公告)号:DE59002973D1

    公开(公告)日:1993-11-11

    申请号:DE59002973

    申请日:1990-05-18

    Applicant: BASF AG

    Abstract: The present invention relates to hot-melt adhesive coating solutions which contain… A) from 5 to 80% by weight of a copolyamide built up from units derived from… A1) organic dicarboxylic acids … … where R is an aliphatic radical having from 1 to 20 carbon atoms or an aromatic radical having from 5 to 25 carbon atoms,… and… A2) a mixture of diisocyanates comprising… a21) from 20 to 95 mol% of a diisocyanate of the formula… OCN-R -NCO… where R is an aromatic radical having 5 to 25 carbon atoms,… a22) from 5 to 70 mol% of a diisocyanate of the formula… OCN-R -NCO… where R is … … or a linear aliphatic radical having 3 to 30 carbon atoms which is substituted by 1 to 3 C1-C4-alkyl groups, and R and R , independently of one another, are each a C1-C4-alkyl group or a hydrogen atom,… a23) from 0 to 20 mol% of a diisocyanate of the formula… OCN-(CH2)y-NCO… where y is an integer in the range from 1 to 20,… and… B) from

    19.
    发明专利
    未知

    公开(公告)号:DE58904478D1

    公开(公告)日:1993-07-01

    申请号:DE58904478

    申请日:1989-09-23

    Applicant: BASF AG

    Abstract: The invention relates to radiation-sensitive mixtures of certain precursors and carbonyl compounds which contain aromatic radicals and, in the UV-excited state, are capable of hydrogen abstraction, which mixtures experience a solubility differentiation on irradiation with actinic light and are suitable for the preparation of polyimides, polyisoindoloquinazolinediones, polyoxazinediones, polyquinazolinediones or polyquinazolones. They are suitable for the production of insulating layers and printed circuit boards.

    20.
    发明专利
    未知

    公开(公告)号:DE3871553D1

    公开(公告)日:1992-07-09

    申请号:DE3871553

    申请日:1988-02-20

    Applicant: BASF AG

    Abstract: Light-sensitive copying material for producing printing plates or resist patterns has a photopolymerisable copying layer on a dimensionally stable substrate, which can be developed with aq. alkali or organic solvent. This contains a polymeric binder, which is soluble or dispersible in aq. alkaline medium or organic solvent, low mol. ethylenically unsatd. photopolymerisable organic cpd(s), photopolymerisation initiator(s), and opt. other additives. The novelty is that the binder consists of film-forming copolymer(s) (I) with multiphase morphology, in which at least one phase has a Tg below room temp. and at least one other phase of Tg above room temp. (I) is produced by free radical copolymerisation of macromer(s) (II) with other olefinically unsatd. copolymerisable organic cpd(s) (III).

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