公开(公告)号：MY160150A

公开(公告)日：2017-02-28

申请号：MYPI2012000018

申请日：2010-07-19

Applicant: BASF SE

Inventor： RÖGER-GÖPFERT CORNELIA ,  RAETHER ROMAN BENEDIKT ,  MAYER DIETER ,  HAAG ALEXANDRA ,  EMNET CHARLOTTE

IPC: C25D3/38 ,  H01L21/288 ,  H01L21/768

Abstract: A COMPOSITION COMPRISING AT LEAST ONE SOURCE OF METAL IONS AND AT LEAST ONE ADDITIVE OBTAINABLE BY REACTING A POLYHYDRIC ALCOHOL COMPRISING AT LEAST 5 HYDROXYL FUNCTIONAL GROUPS WITH AT LEAST A FIRST ALKYLENE OXIDE AND A SECOND ALKYLENE OXIDE FROM A MIXTURE OF THE FIRST ALKYLENE OXIDE AND THE SECOND ALKYLENE OXIDE OR A THIRD ALKYLENE OXIDE, A SECOND ALKYLENE OXIDE, AND A FIRST ALKYLENE OXIDE IN AFORESAID SEQUENCE, THE THIRD ALKYLENE OXIDE HAVING A LONGER ALKYL CHAIN THAN THE SECOND ALKYLENE OXIDE AND THE SECOND ALKYLENE OXIDE HAVING A LONGER ALKYL CHAIN THAN THE FIRST ALKYLENE OXIDE.

公开(公告)号：SG11201503617VA

公开(公告)日：2015-06-29

申请号：SG11201503617V

申请日：2013-10-30

Applicant: BASF SE

Inventor： KIENLE MARCEL PATRIK ,  MAYER DIETER ,  RÖGER-GÖPFERT CORNELIA ,  HAAG ALEXANDRA ,  EMNET CHARLOTTE ,  FLÜGEL ALEXANDER ,  ARNOLD MARCO

IPC: C08G73/14 ,  C25D3/38

Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant, wherein D6 is, for each repeating unit 1 to s independently, a divalent group selected from a saturated or unsaturated C1-C20 organic radical, D7 is, for each repeating unit 1 to s independently, a divalent group selected from straight chain or branched C2-C20 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, R1 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R2, may form a divalent group D8, and R2 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R1, may form a divalent group D8, and D8 is selected from straight chain or branched C1-C18 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, s is an integer from 1 to 250, R10 is selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl.

公开(公告)号：SG10201404301WA

公开(公告)日：2014-09-26

申请号：SG10201404301W

申请日：2010-07-19

Applicant: BASF SE

Inventor： RÖGER-GÖPFERT CORNELIA ,  RAETHER ROMAN BENEDIKT ,  MAYER DIETER ,  HAAG ALEXANDRA ,  EMNET CHARLOTTE

公开(公告)号：SG177418A1

公开(公告)日：2012-02-28

申请号：SG2011097185

申请日：2010-07-19

Applicant: BASF SE

Inventor： ROEGER-GOEPFERT CORNELIA ,  RAETHER ROMAN BENEDIKT ,  MAYER DIETER ,  HAAG ALEXANDRA ,  EMNET CHARLOTTE

Abstract: A composition comprising at least one source of metal ions and at least one additive obtainable by reacting a polyhydric alcohol comprising at least 5 hydroxyl functional groups with at least a first alkylene oxide and a second alkylene oxide from a mixture of the first alkylene oxide and the second alkylene oxide or a third alkylene oxide, a second alkylene oxide, and a first alkylene oxide in aforesaid sequence, the third alkylene oxide having a longer alkyl chain than the second alkylene oxide and the second alkylene oxide having a longer alkyl chain than the first alkylene oxide.

公开(公告)号：SG185736A1

公开(公告)日：2012-12-28

申请号：SG2012086377

申请日：2011-05-31

Applicant: BASF SE

Inventor： SIEMER MICHAEL ,  ROEGER-GOEPFERT CORNELIA ,  MEIER NICOLE ,  RAETHER ROMAN BENEDIKT ,  ARNOLD MARCO ,  EMNET CHARLOTTE ,  MAYER DIETER ,  FLUEGEL ALEXANDER

Abstract: A composition comprising a source of metal ions and at least one leveling agent comprising a linear or branched, polymeric imidazolium compound comprising the structural unit of formula L1 (L1) wherein R1, R2, R3 are each independently selected from an H atom and an organic radical having from 1 to 20 carbon atoms, R4 is a divalent, trivalent or mutlivalent organic radical which does not comprise a hydroxyl group in the a or &bgr; position relative to the nitrogen atom of the imidazole rings. is an integer.

公开(公告)号：SG183821A1

公开(公告)日：2012-10-30

申请号：SG2012063996

申请日：2011-03-17

Applicant: BASF SE

Inventor： ROEGER-GOEPFERT CORNELIA ,  RAETHER ROMAN BENEDIKT ,  ARNOLD MARCO ,  EMNET CHARLOTTE ,  MAYER DIETER

Abstract: A composition comprising a source of metal ions and at least one additive comprising a polyalkyleneimine backbone, said polyalkyleneimine backbone having a molecular weight Mw of from 300 g/mol to 1000000 g/mol, wherein the N hydrogen atoms in the backbone are substituted by a polyoxyalkylene radical and wherein the average number of oxyalkylene units in said polyoxyalkylene radical is from 1.5 to 10 per N-H unit.

公开(公告)号：MY172822A

公开(公告)日：2019-12-12

申请号：MYPI2015001181

申请日：2013-10-30

Applicant: BASF SE

Inventor： HAAG ALEXANDRA ,  ARNOLD MARCO ,  FLUGEL ALEXANDER ,  ROGER-GOPFERT CORNELIA ,  KIENLE MARCEL PATRIK ,  MAYER DIETER ,  EMNET CHARLOTTE

Abstract: Disclosed is a composition comprising a source of metal ions and at least one additive comprising one polyaminoamide represented by formula I. Further disclosed is the use of said composition in a bath for depositing metal containing layers which have reduced overplating, particularly reduced mounding.

公开(公告)号：MY161218A

公开(公告)日：2017-04-14

申请号：MYPI2013002423

申请日：2012-01-17

Applicant: BASF SE

Inventor： KLIPP ANDREAS ,  MAYER DIETER

IPC: C09K13/08

Abstract: THE USE OF SURFACTANTS A, THE 1 % BY WEIGHT AQUEOUS SOLUTIONS OF WHICH EXHIBIT A STATIC SURFACE TENSION 3; AND A PHOTOLITHOGRAPHIC PROCESS MAKING USE OF THE SURFACTANTS A IN IMMERSION PHOTORESIST LAYERS, PHOTORESIST LAYERS EXPOSED TO ACTINIC RADIATION, DEVELOPER SOLUTIONS FOR THE EXPOSED PHOTORESIST LAYERS AND/OR IN CHEMICAL RINSE SOLUTIONS FOR DEVELOPED PATTERNED PHOTORESISTS COMPRISING PATTERNS HAVING LINE-SPACE DIMENSIONS BELOW 50 NM AND ASPECT RATIOS >3. BY WAY OF THE SURFACTANTS A, PATTERN COLLAPSE IS PREVENTED, LINE EDGE ROUGHNESS IS REDUCED, WATERMARK DEFECTS ARE PREVENTED AND REMOVED AND DEFECTS ARE REDUCED BY REMOVING PARTICLES.

公开(公告)号：MY158203A

公开(公告)日：2016-09-15

申请号：MYPI2011004272

申请日：2010-03-25

Applicant: BASF SE

Inventor： ROGER-GOPFERT CORNELIA ,  RAETHER ROMAN BENEDIKT ,  EMNET CHARLOTTE ,  HAAG ALEXANDRA ,  MAYER DIETER

IPC: C23C18/31 ,  C25D3/38 ,  C23C18/32 ,  C25D3/58 ,  C25D7/12 ,  H01L21/288 ,  H01L21/768 ,  H05K3/18 ,  H05K3/24 ,  H05K3/42

Abstract: A COMPOSITION FOR FILLING SUBMICROMETER SIZED FEATURES HAVING AN APERTURE SIZE OF 30 NANOMETERS OR LESS COMPRISING A SOURCE OF COPPER IONS, AND AT LEAST ONE SUPPRESSING AGENT SELECTED FROM COMPOUNDS OF FORMULA I WHEREIN - THE R¹ RADICALS ARE EACH INDEPENDENTLY SELECTED FROM A COPOLYMER OF ETHYLENE OXIDE AND AT LEAST ONE FURTHER C3 TO C4 ALKYLENE OXIDE, SAID COPOLYMER BEING A RANDOM COPOLYMER. - THE R² RADICALS ARE EACH INDEPENDENTLY SELECTED FROM R¹ OR ALKYL. - X AND Y ARE SPACER GROUPS INDEPENDENTLY, AND X FOR EACH REPEATING UNIT INDEPENDENTLY, SELECTED FROM C1 TO C6 ALKYLEN AND Z-(O-Z)m WHEREIN THE Z RADICALS ARE EACH INDEPENDENTLY SELECTED FROM C2 TO C6 ALKYLEN, - N IS AN INTEGER EQUAL TO OR GREATER THAN 0. – M IS AN INTEGER EQUAL TO OR GREATER THAN 1

公开(公告)号：SG10201604395TA

公开(公告)日：2016-07-28

申请号：SG10201604395T

申请日：2012-05-31

Applicant: BASF SE

Inventor： RÖGER-GÖPFERT CORNELIA ,  ARNOLD MARCO ,  FLÜGEL ALEXANDER ,  EMNET CHARLOTTE ,  RAETHER ROMAN BENEDIKT ,  MAYER DIETER

Abstract: A composition comprising a source of metal ions and at least one polyaminoamide, said polyaminoamide comprising amide and amine functional groups in the polymeric backbone and aromatic moieties attached to or located within said polymeric backbone.