公开(公告)号：WO2009035866A3

公开(公告)日：2009-05-14

申请号：PCT/US2008074773

申请日：2008-08-29

Applicant: BREWER SCIENCE INC ,  XU GU ,  YESS KIMBERLY A ,  FLAIM TONY D

Inventor： XU GU ,  YESS KIMBERLY A ,  FLAIM TONY D

IPC: C08L25/04 ,  C09D125/04

CPC classification number: H01L21/0271 ,  B81C1/00801 ,  C08L63/04 ,  C09D125/12 ,  Y10T428/31511 ,  Y10T428/31663 ,  C08L2666/14

Abstract: New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer which may or may not be crosslinked upon heating.

Abstract translation: 提供了用于半导体和MEMS器件生产期间的湿法蚀刻工艺的新的保护涂层。 这些层包括底漆层，第一保护层和任选的第二保护层。 底漆层优选在溶剂体系中包含有机硅烷化合物。 第一保护层包括由苯乙烯，丙烯腈和相容性化合物如单体，低聚物和包含环氧基团的聚合物制备的热塑性共聚物; 聚（苯乙烯 - 共 - 烯丙醇）; 和它们的混合物。 第二保护层包含高度卤化的聚合物，例如氯化聚合物，其可以在加热时交联或不交联。

公开(公告)号：WO2004040369A3

公开(公告)日：2004-07-08

申请号：PCT/US0315164

申请日：2003-05-13

Applicant: BREWER SCIENCE INC

Inventor： XU GU ,  MEADOR JIMMY D ,  BHAVE MANDAR R ,  DESHPANDE SHREERAM V ,  NOWAK KELLY A

IPC: C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768 ,  C08F12/02 ,  C08F16/36 ,  C08F20/10 ,  C08F212/00

CPC classification number: H01L21/76808 ,  G02B1/111 ,  G03F7/091 ,  Y10S430/136 ,  Y10S430/151

Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

Abstract translation: 提供了具有改进流动性能的新型抗反射或填充组合物。 除了苯乙烯 - 烯丙醇聚合物之外，组合物还包含苯乙烯 - 烯丙醇聚合物，优选至少一种其他聚合物（例如纤维素聚合物）。 本发明的组合物可以用于在双镶嵌工艺的后续蚀刻期间保护接触或通孔免于降解。 本发明的组合物也可以用于基底（例如硅晶片）以形成具有高蚀刻速率的抗反射涂层，该蚀刻速率最小化或防止后续光致抗蚀剂曝光和显影期间的反射。

公开(公告)号：EP2188335A4

公开(公告)日：2010-10-13

申请号：EP08798953

申请日：2008-08-29

Applicant: BREWER SCIENCE INC

Inventor： XU GU ,  YESS KIMBERLY A ,  FLAIM TONY D

IPC: C09D125/12 ,  B81C1/00 ,  C08L25/12 ,  C09D163/04 ,  H01L21/027

CPC classification number: H01L21/0271 ,  B81C1/00801 ,  C08L63/04 ,  C09D125/12 ,  Y10T428/31511 ,  Y10T428/31663 ,  C08L2666/14

公开(公告)号：EP2419926A4

公开(公告)日：2013-06-05

申请号：EP10810300

申请日：2010-03-19

Applicant: BREWER SCIENCE INC

Inventor： TANG TINGJI ,  XU GU ,  ZHONG XING-FU ,  HONG WENBIN ,  FLAIM TONY D ,  YESS KIMBERLY ,  TRICHUR RAMACHANDRAN K

IPC: H01L21/312 ,  B81C1/00 ,  C08G61/08 ,  G03F7/039

CPC classification number: B81C1/00801 ,  B81C2201/053 ,  C08G61/08 ,  C08G2261/3324 ,  C08G2261/418 ,  G03F7/033 ,  G03F7/094 ,  H01L21/0274 ,  H01L21/3081 ,  Y10T428/31645 ,  Y10T428/31667 ,  Y10T428/31692 ,  Y10T428/31855 ,  Y10T428/31909

公开(公告)号：EP3092658A4

公开(公告)日：2017-07-05

申请号：EP15735186

申请日：2015-01-06

Applicant: BREWER SCIENCE INC

Inventor： BAI DONGSHUN ,  XU GU ,  BLUMENSHINE DEBBIE

IPC: H01L21/58 ,  B32B7/06 ,  B32B7/12 ,  B32B27/08 ,  B32B27/28 ,  B32B27/32 ,  H01L21/683

CPC classification number: H01L21/6835 ,  B32B7/06 ,  B32B7/12 ,  B32B27/08 ,  B32B27/283 ,  B32B27/325 ,  B32B2255/10 ,  B32B2255/205 ,  B32B2457/14 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381

公开(公告)号：EP1311563A4

公开(公告)日：2006-09-06

申请号：EP01920482

申请日：2001-03-15

Applicant: BREWER SCIENCE INC

Inventor： XU GU ,  BREWER DAN W ,  LIMMER TIMOTHY ,  STRODER MIKE ,  FOWLER SHELLY ,  MAYO JONATHON

IPC: C08F2/46 ,  C08F8/00 ,  C08F8/32 ,  G03F7/00 ,  G03F7/033 ,  C08F212/08 ,  G03C1/72 ,  G03F9/00

CPC classification number: G03F7/033 ,  C08F8/00 ,  C08F8/32 ,  G03F7/0007 ,  Y10S522/904 ,  Y10S522/905 ,  Y10T428/10 ,  Y10T428/1036 ,  Y10T428/1086 ,  C08F212/08 ,  C08F222/06

Abstract: New polymers, compositions comprising these polymers, and methods of using these compositions are provided. The polymers comprise styrene and maleic anhydride monomers with at least some of the maleic anhydride monomers having certain functional groups bonded thereto. Preferred functional groups include those derived from adhesion promoters (e.g., 2-aminophenol), photoinitiators (e.g., 4-aminoacetophenone), and solubilizers (e.g., 4-aminobenzoic acid). The polymers can be incorporated according to conventional processes into compositions which are then used to form a color filter to be used in a liquid crystal display. The final color filter has a high resolution, is highly resistant to solvents typically used in the color filter manufacturing process, is strongly adhered to the color filter substrate, has superior optical clarity, is highly soluble in a wide range of alkali developers, and has excellent heat and UV light stability.

公开(公告)号：EP1554322A4

公开(公告)日：2005-10-05

申请号：EP03809914

申请日：2003-05-13

Applicant: BREWER SCIENCE INC

Inventor： XU GU ,  MEADOR JIMMY D ,  BHAVE MANDER R ,  DESHPANDE SHREERAM V ,  NOWAK KELLY A

IPC: C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768 ,  C08F212/08

CPC classification number: H01L21/76808 ,  G02B1/111 ,  G03F7/091 ,  Y10S430/136 ,  Y10S430/151

Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

Abstract translation: 提供了具有改进流动性能的新型抗反射或填充组合物。 除了苯乙烯 - 烯丙醇聚合物之外，组合物还包含苯乙烯 - 烯丙醇聚合物，优选至少一种其他聚合物（例如纤维素聚合物）。 本发明的组合物可以用于在双镶嵌工艺的后续蚀刻期间保护接触或通孔免于降解。 本发明的组合物也可以用于基底（例如硅晶片）以形成具有高蚀刻速率的抗反射涂层，该蚀刻速率最小化或防止后续光致抗蚀剂曝光和显影期间的反射。