公开(公告)号：JPH027227A

公开(公告)日：1990-01-11

申请号：JP32956688

申请日：1988-12-28

Applicant: BASF AG

Inventor： NORUBERUTO SHIYUNAIDAA ,  NORUBERUTO KURAIMESU ,  GIYUNTAA BETEINGAA ,  UDO BEEMU ,  RUUTOBUIHI KURAITONAA ,  AUGUSUTO REENAA ,  BUERUNAA RENTSU ,  GEERUHARUTO NERUSHIYUBATSUHA ,  BUERUNAA NIIDERUBERUGAA ,  RAINHARUTO SHIYUTORANSUKII ,  BUERUNAA GURAU

IPC: B24B7/13 ,  B24B21/00 ,  B24B21/04 ,  G11B5/84

Abstract: PURPOSE: To improve the surface treatment by moving a polishing means in the feeding direction or the reverse direction of a continuously forwarded recording medium at a specific relative speed to the speed of this recording medium. CONSTITUTION: The recording medium 1 is moved from the feeding position 2 to the take-up position 3 at a speed of 40-60m/min, and a polishing tape 4 is moved from a storage reel 5 to a take-up reel 6 for treating the surface of layer. A supporting element 7 is arranged between two reels, and on this supporting element 7, the recording medium 1 is brought into contact with the polishing tape 4 having the particle dimension of 1-20μm by the jet stream of gas from a slot nozzle 8. At this time, the satisfied effect is obtained when the polishing tape 4 is moved relatively against the recording medium 1 at a speed faster than twice the speed of this medium 1, preferrably 10-200 times.

公开(公告)号：JPS63168836A

公开(公告)日：1988-07-12

申请号：JP32420987

申请日：1987-12-23

Applicant: BASF AG

Inventor： MIHIYAERU HITSUFUERUTO ,  UBUE NOBUATSUKU ,  BUERUNAA GURAU ,  FUORUKAA KOTSUHO ,  ROORANTO KEENITSUHI

IPC: G11B5/72 ,  C10M105/02 ,  C10N40/18 ,  G11B5/71 ,  G11B5/725 ,  G11B5/82 ,  G11B5/84

公开(公告)号：JPS63168831A

公开(公告)日：1988-07-12

申请号：JP32421087

申请日：1987-12-23

Applicant: BASF AG

Inventor： MIHIYAERU HITSUFUERUTO ,  BUERUNAA GURAU ,  YOOAHIMU HATSUKU

IPC: G11B5/72 ,  G11B5/64 ,  G11B5/71 ,  G11B5/725 ,  G11B5/82 ,  G11B5/84

公开(公告)号：JPS60160024A

公开(公告)日：1985-08-21

申请号：JP27354884

申请日：1984-12-26

Applicant: BASF AG

Inventor： AUGUSUTO REENAA ,  ARUBERUTO KOORU ,  BUERUNAA BARUTSU ,  FURIIDORIHI ZOMAAMAN ,  MIRAN FUERIKU ,  BUERUNAA GURAU ,  RAINHORUTO BAURU

IPC: C09D5/23 ,  C09D7/12 ,  C10M105/24 ,  C10N10/04 ,  C10N40/18 ,  G11B5/71

公开(公告)号：JPS60138721A

公开(公告)日：1985-07-23

申请号：JP24982684

申请日：1984-11-28

Applicant: BASF AG

Inventor： KURISUTEIINE GIYUTONAA ,  PEETAA HAIRUMAN ,  UDO KURUMAN ,  DEIITAA MAIYAA ,  BUERUNAA GURAU

IPC: G11B5/66 ,  G11B5/64 ,  G11B5/72

公开(公告)号：JPS60127522A

公开(公告)日：1985-07-08

申请号：JP24092184

申请日：1984-11-16

Applicant: BASF AG

Inventor： AUGUSUTO REENAA ,  HERUMUUTO KOPUKE ,  HERUMAN RORAA ,  BUERUNAA BARUTSU ,  BUERUNAA GURAU ,  EEBAAHARUTO KESUTAA ,  FURIIDORIHI ZOMAAMAN

IPC: C09D5/23 ,  C09D127/04 ,  C09D127/06 ,  C09D175/00 ,  C09D175/02 ,  C09D175/04 ,  G11B5/702 ,  H01F10/10

公开(公告)号：JPS60124022A

公开(公告)日：1985-07-02

申请号：JP24092084

申请日：1984-11-16

Applicant: BASF AG

Inventor： AUGUSUTO REENAA ,  BUERUNAA BARUTSU ,  MIRAN FUERIKU ,  HERUMUUTO KOPUKE ,  BUERUNAA GURAU ,  RAINHORUTO BAURU

IPC: C09D5/23 ,  C09D127/04 ,  C09D127/06 ,  C09D175/00 ,  C09D175/04 ,  C09D175/06 ,  G11B5/702 ,  H01F10/10

公开(公告)号：JPS6087427A

公开(公告)日：1985-05-17

申请号：JP18083584

申请日：1984-08-31

Applicant: BASF AG

Inventor： GIYUNTAA HAIRU ,  BUERUNAA RENTSU ,  IEENE KOFUAKUSU ,  BUERUNAA GURAU ,  BUERUNAA BARUTSU

IPC: C08F2/54 ,  C08G18/67 ,  C09D5/23 ,  C09D163/00 ,  C09D175/04 ,  C09D175/14 ,  G11B5/702

公开(公告)号：JPS5868230A

公开(公告)日：1983-04-23

申请号：JP15973182

申请日：1982-09-16

Applicant: BASF AG

Inventor： RUDORUFU BAHAMAN ,  BUERUNAA BARUTSU ,  BUERUNAA GURAU ,  BUINFURIITO GUTAAMAN ,  IENEE KOFUAKUSU ,  KAARU KURUTSUKAA ,  PEETAA RUDORUFU ,  DEIITAA SHIEEFUAA ,  YOAHIMU HATSUKU

IPC: C09D5/23 ,  C09D137/00 ,  G11B5/70 ,  G11B5/702