公开(公告)号：DE69128655T2

公开(公告)日：1998-05-07

申请号：DE69128655

申请日：1991-02-28

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKAO ,  SUDA SHIGEYUKI ,  UZAWA SHUNICHI ,  HASEGAWA TAKAYUKI

IPC: G03F7/20 ,  G03F9/00 ,  G03B27/53

Abstract: An exposure apparatus for transferring a pattern of an original (1) onto a workpiece (2) by using first light, includes a blocking member (4) for defining a rectangular exposure region on the workpiece. The blocking member (4) has a function for blocking the first light, wherein, through the exposure region defined by the blocking member (4), exposure for the pattern transfer can be effected. A detecting device (6) detects a positional deviation between the original (1) and the workpiece (2), by using second light different from the first light, wherein the blocking member (4) has a portion for transmitting the second light such that the detecting device (6) can detect the positional deviation with the second light passed through that portion of the blocking member.

公开(公告)号：DE69401689T2

公开(公告)日：1997-06-19

申请号：DE69401689

申请日：1994-07-20

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  TANAKA YUTAKA ,  FUJIOKA HIDEHIKO

IPC: C23C14/56 ,  B65G49/07 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/205 ,  H01L21/67

公开(公告)号：JP2002015989A

公开(公告)日：2002-01-18

申请号：JP2001112742

申请日：2001-04-11

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  HASEGAWA TAKAYUKI ,  TANAKA YUTAKA

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To suppress degradation of atmosphere within a chamber and also to suppress changes in position and attitude of a processing device which is built in the chamber. SOLUTION: The processing system comprises a processing device, a chamber which incorporates the processing device and keeps airtightness within it, a support means for supporting the chamber, a frame on which the processing device is placed, an air mount which is provided outside the chamber and supports the frame separately from the chamber, and an elastic airtightness keeping means which connects the frame to the chamber in airtightnessly. The air mount is provided outside the chamber to suppress degradation of atmosphere in the chamber, while the elastic airtightness keeping means is inserted to reduce the effects of deformation of the chamber on position and attitude of the processing device.

公开(公告)号：JP2001015432A

公开(公告)日：2001-01-19

申请号：JP2000185819

申请日：2000-06-21

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  HASEGAWA TAKAYUKI ,  TANAKA YUTAKA

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a treatment system which is provided with a plurality of chambers and capable of performing various kinds of treatments, such as high-accuracy exposure, thin-film formation, etc. SOLUTION: A treatment system is provided with a first chamber which incorporates a treatment device and can be maintained in an airtight state, a second chamber which is provided with a loading chamber 102a and an unloading chamber 102b, and a supplying/discharging system, which independently manages the atmospheres in the first and second chambers. The system is also provided with a transport robot which transports samples between the first and second chambers, an openable/closable gate valve provided between the first and second chambers, and a controller which introduces the next sample to the loading chamber and sets the sample in a waiting state, while a sample is treated by means of the treatment device incorporated in the first chamber by controlling the actions of the supplying/discharging system, transport robot, and gate valve.

公开(公告)号：JPH11233436A

公开(公告)日：1999-08-27

申请号：JP31900298

申请日：1998-11-10

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  WATANABE YUTAKA

IPC: G21K1/06 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H05H13/04

Abstract: PROBLEM TO BE SOLVED: To remarkably reduce deviation of incident X-ray to an X-ray mirror, by controlling the position of a luminous point on the basis of a measured position of the luminous point, and controlling the position or attitude of the X-ray mirror on the basis of the measured position of X-ray in the vicinity of the X-ray mirror. SOLUTION: First SR beam monitors 8 measure the position of X-ray beam just after cast from a luminous point of an SR ring 1 and are arranged at positions just behind X-ray lead-out ports on the respective four beam lines. A first control means 9 controls steering magnets 2 adjusting the position of an electron orbit in the SR ring 1, on the basis of outputs of the four respective first SR beam monitors 8. A second SR beam monitor 10 measures the position of an incident X ray at a position in the vicinity of a first X-ray mirror 4. A second control means 11 controls a first X-ray mirror driving means and a second X-ray mirror driving means, on the basis of an output of the second beam monitor.

公开(公告)号：JPH113858A

公开(公告)日：1999-01-06

申请号：JP11776598

申请日：1998-04-13

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  WATANABE YUTAKA

IPC: G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To correct a relative positional deviation of X-ray with respect to a magnifying mirror or a focusing mirror. SOLUTION: Sheet beam-like X-rays generated from a light source 1 are focused in x-axis direction by a focusing mirror 2b, and magnified in y-axis direction by a magnifying mirror 2a. Uniform X-ray intensity distribution is maintained by detecting a relative positional deviation of the X-ray using optical axis sensors 11a and 11b, and position sensors 12a and 12b, and correcting a position and attitude of individual mirrors 2a and 2b by actuators 4a and 4b.

公开(公告)号：JPH1056052A

公开(公告)日：1998-02-24

申请号：JP22754396

申请日：1996-08-09

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  MARUMO KOJI

IPC: B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To provide a substrate transfer device used in a semiconductor exposure system or the like, where a substrate can be kept free from dust when the substrate is transferred to a substrate holding means from a loading hand. SOLUTION: When a substrate 1 fixed to a loading hand 2 by suction is delivered to a substrate holding means 3 located on a stage 4, the substrate 1 is fixed to both the loading hand 2 and the substrate holding means 3 by suction, the attraction of the substrate holding means 3 is so controlled by a pressure controller 7 linked to a pressure gauge 6 as to be set smaller than that of the loading hand 2 and to make a stress induced in the rear of the substrate 1 smaller than the yield stress of the substrate, the substrate holding means 3 and the substrate 1 are relatively moved, dust attached to the rear surface of the substrate 1 and the substrate holding means 3 is removed by scraping it off, then the substrate holding means 3 is enhanced in attraction, and the loading hand 3 is reduced to zero in suction, whereby the substrate 1 is delivered to the substrate holding means 3 from the loading hand 32. Thus, the substrate holding means 3 is capable of holding the substrate 1 by suction without interposing dust.

公开(公告)号：JPH06242084A

公开(公告)日：1994-09-02

申请号：JP15362393

申请日：1993-06-24

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  FUJIOKA HIDEHIKO

IPC: G01N29/00 ,  G01N29/024 ,  G01N29/32 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G01N29/18

Abstract: PURPOSE:To provide a method for measuring gas purity information easily and accurately even for a gas which can not be measured directly, e.g. helium gas. CONSTITUTION:Sound velocity and temperature in a chamber 4 are measured by means of an ultrasonic oscillation element 1, an ultrasonic detecting element 2, and a temperature measuring element 5. A purity calculating circuit 7 determines gas purity in the chamber based on the measurements of sound velocity and temperature.

公开(公告)号：JPH05100096A

公开(公告)日：1993-04-23

申请号：JP28928391

申请日：1991-10-08

Applicant: CANON KK

Inventor： HARUMI KAZUYUKI ,  EBINUMA RYUICHI ,  HASEGAWA TAKAYUKI

IPC: G21K1/06 ,  G03F7/20 ,  H05H13/04

Abstract: PURPOSE:To facilitate the exchange of the mirror of an SR-X-ray mirror unit and simplify the readjustment after an exchange. CONSTITUTION:A mirror 1 is supported by the plate spring of a mirror holder 2 while the reflecting surface is faced downward. The mirror holder 2 has a butt member 17 couplable with the preset portion of a support plate arranged in the vacuum chamber of a mirror unit and a coolant passage 13 cooling the mirror 1. The mirror holder 2 holding the mirror 1 is carried into the vacuum chamber and positioned by the butt member 17, and it is fixed to a support plate with bolts coupled with holes 18. The damaged mirror 1 is removed from the support plate together with the mirror holder 2 by extracting the bolts from the holes 18, and it is carried out to the outside of the vacuum chamber.

公开(公告)号：JPH1184098A

公开(公告)日：1999-03-26

申请号：JP18827498

申请日：1998-06-18

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI

IPC: G21K5/02 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  H05H13/04

Abstract: PROBLEM TO BE SOLVED: To provide an x-ray-lighting device that detects the relative deviation of the optical axes of an X-ray mirror and an SR (synchrotron radiation light) beam, controls the position and attitude of the X-ray mirror, and can supply X-rays with a uniform intensity distribution to a projection aligner by a high intensity. SOLUTION: Based on the detection results of sensors 5 and 6 for detecting an SR beam 2 that enters a first X-ray mirror 3, the drive of the first X-ray mirror 3 is controlled so that specific position and attitude are continuously maintained for the optical axis of the SR beam 2 that fluctuates. Then, based on the output of a means 10 for measuring position and attitude to the reference surface of the first X-ray mirror 3, the driving amount of a second X-ray mirror 8 is calculated by a second control means 11, and the position and attitude of the second X-ray mirror 8 are controlled via a second driving means 9 according to the displacement of the first X-ray mirror 3, thus accurately positioning all X-ray mirrors to the SR beam 2 and supplying X-rays with a uniform high intensity distribution to the entire surface of an exposure surface angle.