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    Organic solvent development or multiple development pattern-forming method using electron beams or euv rays
    16.
    发明专利
    Organic solvent development or multiple development pattern-forming method using electron beams or euv rays 有权
    有机溶剂开发或使用电子束或EUV的多种开发方法

    公开(公告)号：JP2014078043A

    公开(公告)日：2014-05-01

    申请号：JP2014008046

    申请日：2014-01-20

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： TSUBAKI HIDEAKI ,  SHIRAKAWA KOJI ,  DOBASHI TORU

    IPC: G03F7/32 ,  C08F212/14 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039

    CPC classification number: G03F7/325 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/322

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern-forming method that can satisfy high sensitivity, high resolution, a good pattern shape, and a good residual film rate in a super fine region.SOLUTION: Provided is a pattern-forming method including, in the following order: (1) a step of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a step of exposing the film with an electron beam or an EUV ray; and (4) a step of developing the film with a developer containing an organic solvent after the exposure.

    Abstract translation: 要解决的问题：提供能够在超细区域中满足高灵敏度，高分辨率，良好的图案形状和良好的残留膜速率的图案形成方法。解决方案：提供一种图案形成方法，包括： 按照以下顺序：（1）通过光化学射线敏感或辐射敏感性树脂组合物形成膜的步骤，所述树脂组合物包含含有酸可分解重复单元的树脂，并且能够通过该作用降低在有机溶剂中的溶解度 的酸 （2）用电子束或EUV射线曝光胶片的步骤; 和（4）曝光后用含有机溶剂的显影剂显影该膜的步骤。

    Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition
    17.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition 有权
    化学敏感性或辐射敏感性树脂组合物和使用组合物的图案形成方法

    公开(公告)号：JP2013257582A

    公开(公告)日：2013-12-26

    申请号：JP2013157116

    申请日：2013-07-29

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： TAKAHASHI HIDETOMO ,  TSUCHIMURA TOMOTAKA ,  DOBASHI TORU ,  YAMASHITA KATSUHIRO ,  NISHIKAWA NAOYUKI ,  TSUBAKI HIDEAKI

    IPC: G03F7/004 ,  C08F212/14 ,  G03F7/039 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a positive resist composition that simultaneously satisfies demands for high sensitivity, high resolution, a good pattern profile, good line edge roughness and outgas reduction in an ultrafine region, particularly in electron beam, X-ray or EUV photolithography, and to provide a pattern forming method using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition is an actinic ray-sensitive or radiation-sensitive resin composition for EUV exposure and contains: a resin (P) having a repeating unit (A) that is decomposed by irradiation with actinic rays or radiation to generate an acid and a repeating unit (B) that is decomposed by an action of an acid to increase the solubility with an alkali aqueous solution; and a compound (U) that is unevenly present on a film surface after film formation to form a protective film. The content percentage of the compound (U) is 0.01 to 30 mass% on a basis of the whole solid content in the composition.

    Abstract translation: 要解决的问题：提供一种正极性抗蚀剂组合物，其特别是在电子束，X射线或EUV光刻中，同时满足高灵敏度，高分辨率，良好的图案轮廓，良好的线边缘粗糙度和超细区域的脱气降低的要求 并提供使用该组合物的图案形成方法。解决方案：光化射线敏感或辐射敏感性树脂组合物是用于EUV暴露的光化射线敏感或辐射敏感性树脂组合物，并且包含：具有 通过用光化射线或辐射照射而分解以产生酸的重复单元（A）和通过酸的作用而分解的增加与碱性水溶液的溶解度的重复单元（B）; 以及成膜后不均匀地存在于膜表面上形成保护膜的化合物（U）。 化合物（U）的含量百分比基于组合物中的固体成分的总量为0.01〜30质量％。

    Actinic ray-sensitive or radiation-sensitive resin composition, as well as actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same
    18.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition, as well as actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same 审中-公开
    丙烯酸类敏感性或辐射敏感性树脂组合物，如丙烯酸类敏感性或辐射敏感性膜和使用其的图案形成方法

    公开(公告)号：JP2012093737A

    公开(公告)日：2012-05-17

    申请号：JP2011213454

    申请日：2011-09-28

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： HIRANO SHUJI ,  TAKAHASHI HIDETOMO ,  TSUBAKI HIDEAKI

    IPC: G03F7/039 ,  C08F212/14 ,  C08F220/28 ,  G03F7/004 ,  H01L21/027

    CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0397

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in sensitivity, roughness property, and resolution of isolated space patterns, and allows formation of a pattern having a good profile, as well as an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin, which comprises a repeating unit (A) having a structural part (S1) decomposed by an action of an acid to generate an alkali soluble group, and a structural part (S2) decomposed by an action of an alkali developer to increase its dissolution rate in the alkali developer, and a repeating unit (B) generating an acid by irradiation with actinic rays or radiation.

    Abstract translation: 要解决的问题：提供灵敏度，粗糙性和分离空间图案的分辨率优异的光化射线敏感性或辐射敏感性树脂组合物，并且还可以形成具有良好外形的图案 作为光化射线敏感或辐射敏感膜，以及使用光化射线敏感或辐射敏感性树脂组合物的图案形成方法。 光敏射线敏感性或辐射敏感性树脂组合物含有树脂，其包含具有通过酸作用而分解以产生碱溶性基团的结构部分（S1）的重复单元（A），以及 通过碱显影剂的作用分解以提高其在碱性显影剂中的溶解速率的结构部分（S2）和通过用光化射线或辐射照射产生酸的重复单元（B）。 版权所有（C）2012，JPO＆INPIT

    Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern formation method using the same
    19.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern formation method using the same 有权
    化学敏感性或辐射敏感性树脂组合物和耐蚀膜和使用其的图案形成方法

    公开(公告)号：JP2012027453A

    公开(公告)日：2012-02-09

    申请号：JP2011131381

    申请日：2011-06-13

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： KAWABATA KENJI ,  TAKAHASHI HIDETOMO ,  TSUCHIMURA TOMOTAKA ,  HIRANO SHUJI ,  TSUBAKI HIDEAKI

    IPC: G03F7/004 ,  C08F212/14 ,  G03F7/039 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which satisfies high sensitivity, high solution, good pattern shape and good line edge roughness at high level in particular for an electron ray, X-ray or EUV light lithography and has adequate out gas performance at light exposure and adequate stability in course of time, and to provide a resist film and a pattern formation method using the composition.SOLUTION: In an actinic ray-sensitive or radiation-sensitive resin composition including a resin (P) having repeating units (A) with ionic structural sites generating acid anions at a side chain of a resin by decomposition through the irradiation of actinic ray or radiation ray, a cation of the ionic structural sites is a diaryl iodonium cation. A resist film and a pattern formation method using the composition are also provided.

    Abstract translation: 要解决的问题：为了提供特别是电子射线的高灵敏度，高溶液，良好的图案形状和良好的线边缘粗糙度的光化射线敏感或辐射敏感性树脂组合物，X射线 或EUV光刻法，并且在曝光时具有足够的气体性能并且在时间上具有足够的稳定性，并且提供使用该组合物的抗蚀剂膜和图案形成方法。 解决方案：在具有重复单元（A）的树脂（P）的光化射线敏感或辐射敏感性树脂组合物中，其离子结构位置在树脂的侧链上通过光化分解而分解产生酸性阴离子 射线或辐射线，离子结构位点的阳离子是二芳基碘鎓阳离子。 还提供了使用该组合物的抗蚀剂膜和图案形成方法。 版权所有（C）2012，JPO＆INPIT

    Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and method of forming pattern using the composition
    20.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and method of forming pattern using the composition 有权
    丙烯酸类敏感性或辐射敏感性树脂组合物，耐腐蚀薄膜和使用组合物形成图案的方法

    公开(公告)号：JP2012013811A

    公开(公告)日：2012-01-19

    申请号：JP2010148386

    申请日：2010-06-29

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： TSUCHIMURA TOMOTAKA ,  TSUBAKI HIDEAKI ,  TAKAHASHI TOSHIYA

    IPC: G03F7/004 ,  C08F20/10 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

    CPC classification number: G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/111

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern of a good shape by having an excellent resolution, sensitivity and LER, and an excellent scum suppressing property by containing a specific guanidine compound while suppressing a PEB temperature dependence, and provide a resist film formed using the composition and a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a guanidine compound (A) with a logP value of 1.2 or greater and a compound (B) which generates an acid by being irradiated with active rays or radiation.

    Abstract translation: 要解决的问题：提供通过具有优异的分辨率，灵敏度和LER形成能够形成良好形状的图案的光化射线敏感或辐射敏感性树脂组合物，以及通过含有特定的 胍化合物，同时抑制PEB温度依赖性，并提供使用该组合物形成的抗蚀剂膜和使用该组合物的图案形成方法。 光敏射线敏感或辐射敏感性树脂组合物含有logP值为1.2以上的胍化合物（A）和通过用活性射线或辐射照射产生酸的化合物（B）。 版权所有（C）2012，JPO＆INPIT

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