MATERIAL DE GRABADO, SENSIBLE A LA RADIACION, PARA LA PRODUCCION DE PLACAS DE IMPRESION PLANOGRAFICA.

    公开(公告)号:MX9605443A

    公开(公告)日:1997-10-31

    申请号:MX9605443

    申请日:1996-11-07

    Applicant: HOECHST AG

    Abstract: Se describe un material de grabado sensible a la radiacion, que trabaja en positivo, para la produccion de placas de grabado planográfico, que comprende un soporte de aluminio y una capa sensible a la radiacion aplicada sobre él; en donde: el soporte de aluminio ha sido graneado en ácido nítrico, luego desgrasado en ácido sulfurico, anodizado en ácido sulfurico y, subsecuentemente, hidrofilizado con un compuesto que comprende por lo menos una unidad con un ácido fosfonico o un grupo fosfonato; y la capa sensible a la radiacion comprende: a) un éster sensible a la radiacion, de ácido 1,2-naftoquinona-2-diazida-4 o 5-sulfonico y un policondensado que tiene grupos hidroxi fenolicos; obteniéndose dicho policondensado haciendo reaccionar un compuesto fenolico con un aldehído o una cetona; b) una resina novolac o un producto de policondensacion obtenido haciendo reaccionar un polifenol con un aldehído o una cetona, como una resina soluble en álcali; c) un polímero del tipo vinílico, que comprende por lo menos una unidad que tiene un grupo hidroxifenilo lateral; d) un compuesto formador de clatrato; e) un compuesto de bajo peso molecular, que comprende por lo menos un átomo de hidrogeno ácido, y f) partículas de gel de sílice que tienen un diámetro máximo de 15 æm.

    13.
    发明专利
    未知

    公开(公告)号:BR9100436A

    公开(公告)日:1991-10-22

    申请号:BR9100436

    申请日:1991-02-01

    Applicant: HOECHST AG

    Abstract: The invention relates to a radiation-sensitive composition, a radiation-sensitive recording material produced therewith and a process for the production of heat- and chemical-resistant relief records using the recording material. In the normally positive-working radiation-sensitive composition containing, as essential constituents, a) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and b) a 1,2-quinone diazide and/or a combination of 1. A compound which forms strong acid when exposed to actinic radiation and 2. A compound containing at least one acid-cleavable C-O-C bond a polymer is present as polymeric binder which has a molecular weight of between 5000 and 100,000, which has a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10 mmol/g of polymer and a content of -CH3-nXn units of not less than 0.1, preferably about 0.5 to 2 mmol/g of polymer, where X stands for halogen such as chlorine, bromine or iodine and n for 1, 2 or 3. This makes available lithographic printing plates which can be thermally postcured, ensure a high print run and have good chemical resistance. It can also be used to produce photoresists with high thermal stability.

    14.
    发明专利
    未知

    公开(公告)号:BR8902919A

    公开(公告)日:1990-02-06

    申请号:BR8902919

    申请日:1989-06-16

    Applicant: HOECHST AG

    Abstract: The invention relates to a positive-working radiation-sensitive mixture and a copying material produced therefrom on a layer support. The mixture contains as essential constituents a 1,2-quinone diazide or a combination of: 1) a compound forming strong acid when exposed to actinic radiation and 2) a compound containing at least one acid-cleavable C-O-C bond, and a binder with repeating units of the general formula I I wherein R1 denotes a hydrogen or halogen atom, or a cyanide or an alkyl group, R2, R3, R4 are identical or different and denote hydrogen, or alkyl or aryl groups, R5, R6 and optionally R7 are identical or different and denote hydrogen or halogen atoms, or alkyl, aryl or alkoxy groups, and X denotes the atoms necessary to complete a mononuclear or polynuclear carbocyclic aromatic ring system, and n is 1, 2 or 3. The mixture according to the invention yields lithographic printing plates with a high print run which can be thermally post-cured and have good resistance to chemicals, also photoresists with high heat resistance.

    16.
    发明专利
    未知

    公开(公告)号:BR9500283A

    公开(公告)日:1995-10-17

    申请号:BR9500283

    申请日:1995-01-23

    Applicant: HOECHST AG

    Abstract: Positive copying material has an Al base and a matted radiation-sensitive layer contg. a 1,2-naphthoquinone-2-diazide as radiation-sensitive cpd. and a water-insol. binder which dissolved or swells in aq. alkali. The novel features are that: (a) the diazide is an ester (I) of 1,2-naphthoquinone-2-diazide 4- or 5-sulphonic acid and a phenolic cpd. with at least 2 phenolic OH gps., which contains at least 0.5 mmole/g of phenolic OH gps. and at least 1.5 mmole/g of diazo units; (b) the binder is a phenol/formaldehyde-novolak (II), which contains at least 5 mmole/g of phenolic OH gps. and at least 30 mole % m-cresol and at least 10 mole % xylenol as phenol component and has a Mw of 2000-12000; and (c) the layer also contains phenolic additive(s) (III) having a Mw of max. 600 and contg. 2-4 uncondensed phenyl rings and at least 6 mmole/g of phenolic OH gps.

    RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL AND A PROCESS FOR THE PRODUCTION OF RELIEF RECORDINGS

    公开(公告)号:CA2035722A1

    公开(公告)日:1991-08-16

    申请号:CA2035722

    申请日:1991-02-05

    Applicant: HOECHST AG

    Abstract: The invention relates to a usually positiveworking radiation-sensitive mixture which contains as essential components a binder which is insoluble in water and soluble in aqueous-alkaline solutions, a 1,2-quinone diazide and a compound which diminishes the developer solubility of the exposed regions by heat treatment, in which the compound which diminishes the developer solubility which is present is at least one urethane of the formula I: I in which R1 is hydrogen or methyl, R2 is hydrogen, alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted arylaminocarbonyl, R3 is substituted or unsubstituted arylene or arylenealkylene, Q is hydrogen, -CH4-p, or -CR5R6 in which R5 and R6 can be identical or different and are selected from the group consisting of hydrogen, alkyl and aryl, carbonyl, oxygen, sulfur or sulfonyl, m is 1, 2 or 3, n is at least 1 and not more than 50, and p is 1, 2 or 3. The mixture is suitable for producing a radiation-sensitive recording material which has a long shell life in combination with high radiation sensitivity and has a broad image reversal range in a process for producing relief images.

    PROCESS FOR PRODUCING NEGATIVE COPIES

    公开(公告)号:CA2031847A1

    公开(公告)日:1991-06-13

    申请号:CA2031847

    申请日:1990-12-10

    Applicant: HOECHST AG

    Abstract: A process for producing negative copies is disclosed in which a light-sensitive or radiationsensitive recording material comprising a layer support and a normally positive-working lightsensitive or radiation-sensitive layer applied thereto is irradiated imagewise, thermally treated, irradiated overall and then developed with an alkaline developer. Thermal treatment is carried out with water or with an aqueous solution, at temperatures in the range from about 50 to 100.degree.C, preferably from 60 to 90.degree.C, within a period of time varying between about 1 second and 5 minutes, preferably between 5 seconds and 1 minute, overall irradiation is performed on the optionally still hot recording material and development is thereafter carried out within a period of time varying between about 10 seconds and 2 minutes, preferably between 15 seconds and 1 minute. The process can be carried out according to the customary procedure known in the practice of positive processing, and results in perfect printing stencils.

    RADIATION-SENSITIVE MIXTURE AND RADIATION-SENSITIVE COPYING MATERIAL PREPARED THEREFROM

    公开(公告)号:CA2000052A1

    公开(公告)日:1990-04-08

    申请号:CA2000052

    申请日:1989-10-02

    Applicant: HOECHST AG

    Abstract: The invention relates to a radiation- or photosensitive mixture and to a radiation-sensitive copying material produced from said mixture, comprising: A) a 1,2-quinonediazide and/or a combination of 1. a compound forming a strong acid under the action of actinic radiation and 2. a compound having at least one acid-cleavable C-O-C bond; B) a binder which is insoluble in water and soluble in aqueous-alkaline solutions; and C) a spiro-indolino-benzopyran of the general formula I in which R denotes hydrogen or an alkyl radical having 1 to 6 carbon atoms, R1, R2, R3, R4 are identical to or different from one another and denote hydrogen or halogen, alkyl groups or alkoxy groups having 1 to 4 carbon atoms or hydroxy groups or nitro groups; and R5, R6, R7, and R8 are identical to or different from one another and denote hydrogen or halogen, nitro groups or amino groups, alkyl groups, alkoxy groups or hydroxyalkyl groups having 1 to 5 carbon atoms or aryl groups having 6 to 10 carbon atoms. Upon exposure, the mixture results in a very pronounced color contrast which is maintained even at elevated temperatures.

Patent Agency Ranking