公开(公告)号：GB2521417A

公开(公告)日：2015-06-24

申请号：GB201322497

申请日：2013-12-19

Applicant: SWISSLITHO AG ,  IBM

Inventor： DUERIG URS T ,  FRINGES STEFAN ,  KNOLL ARMIN W ,  HOLZNER FELIX

IPC: G03F7/20

Abstract: For large area standard precision patterning a thermo optical lithographic system 3 is used. For small area higher precision nanoscale patterning a thermal scanning probe lithographic system 7 comprising a heated raster scanning probe tip 34 is used. In this manner a thermally sensitive photoresist can be efficiently patterned with composite large area low resolution and small area high resolution patterns.

公开(公告)号：SG11201402453YA

公开(公告)日：2014-06-27

申请号：SG11201402453Y

申请日：2013-04-25

Applicant: IBM

Inventor： DUERIG URS T ,  HOLZNER FELIX ,  KNOLL ARMIN W ,  RIESS WALTER HEINRICH

IPC: H01L21/768

Abstract: A method for positioning nano-objects on a surface and an apparatus for implementing the method. The method includes: providing a first surface and a second surface in a position facing each other, where one or more of the surfaces exhibits one or more position structures having dimensions on the nanoscale; providing an ionic liquid suspension of the nano-objects between the two surfaces, where the suspension comprises two electrical double layers each formed at an interface with a respective one of the two surfaces, and the surfaces have electrical charges of the same sign; enabling the nano-objects in the suspension to position according to a potential energy resulting from the electrical charge of the two surfaces; and depositing one or more of the nano-objects on the first surface according to the positioning structures by shifting the minima of the potential energy towards the first surface.

公开(公告)号：CA2868577A1

公开(公告)日：2013-11-07

申请号：CA2868577

申请日：2013-04-25

Applicant: IBM

Inventor： DUERIG URS T ,  HOLZNER FELIX ,  KNOLL ARMIN W ,  RIESS WALTER HEINRICH

IPC: H01L21/768

Abstract: The present invention is notably directed to apparatuses and methods for positioning nano- objects (20) on a surface. The method comprises: providing (S10 S50) two surfaces (15, 17) including a first surface (15) and a second surface (17) in vis-à-vis, wherein at least one of the two surfaces exhibits one or more positioning structures (16, 16a) having dimensions on the nanoscale; and a ionic liquid suspension (30) of the nano-objects between the two surfaces, wherein each of the surfaces forms an electrical double layer with the ionic liquid suspension, each of the two surfaces having a same electrical charge sign; and letting (S60) nano-objects in the suspension position according to a potential energy (31) resulting from the electrical charge of the two surfaces and depositing (S70) one or more of the nano-objects on the first surface according to the positioning structures, by shifting minima (32) of the potential energy towards the first surface.

公开(公告)号：DE102012214181A1

公开(公告)日：2013-02-14

申请号：DE102012214181

申请日：2012-08-09

Applicant: IBM

Inventor： HOFRICHTER JENS ,  PAUL PHILIP ,  HOLZNER FELIX ,  HORST FOLKERT

IPC: G01Q20/04 ,  G01Q60/24

Abstract: Die Erfindung betrifft vor allem einen Rastersondenmikroskop-Hebelarm (10), der einen Schaft (15) und einen elektromagnetischen Sensor (20) mit einer detektierbaren elektromagnetischen Eigenschaft umfasst, die sich bei Deformation des Schafts ändert. Ferner betrifft die Erfindung ein Rastersondenmikroskop, eine Detektionsvorrichtung und ein Detektionsverfahren, das einen solchen Hebelarm verwendet.