公开(公告)号：DE19929619C2

公开(公告)日：2001-06-28

申请号：DE19929619

申请日：1999-06-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： WAWER PETER ,  HEITZSCH OLAF ,  ROEHRICH MAYK ,  SPRINGMANN OLIVER ,  HUCKELS KAI ,  STEIN VON KAMIENSKI ELARD ,  WOLF KONRAD ,  RENNEKAMP REINHOLD ,  KUTTER CHRISTOPH ,  LUDWIG CHRISTOPH

IPC: H01L27/115 ,  G11C16/06

公开(公告)号：DE19840984B4

公开(公告)日：2005-05-19

申请号：DE19840984

申请日：1998-09-08

Applicant: INFINEON TECHNOLOGIES AG

Inventor： LUDWIG CHRISTOPH ,  KUTTER CHRISTOPH ,  WOLF KONRAD ,  HEITZSCH OLAF ,  HUCKELS KAI ,  RENNEKAMP REINHOLD ,  ROEHRICH MAYK ,  STEIN VON KAMIENSKI ELARD ,  WAWER PETER ,  SPRINGMANN OLIVER

IPC: H01L21/8247 ,  H01L27/115 ,  H01L27/11517 ,  H01L27/11521 ,  H01L29/423 ,  H01L29/78 ,  H01L21/336

公开(公告)号：DE59806748D1

公开(公告)日：2003-01-30

申请号：DE59806748

申请日：1998-07-21

Applicant: INFINEON TECHNOLOGIES AG

Inventor： BRADL STEPHAN ,  HEITZSCH OLAF

IPC: B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: The polishing agent of the invention has polishing grains suspended in a solution. The polishing grains consist essentially of a first substance with a glass transition temperature TG, and the polishing grains contain a dopant. The concentration of the dopant is set so that the glass transition temperature TG' of the doped substance is lower than the glass transition temperature TG of the undoped first substance. The polishing agent is advantageously used for the microscratch-free planarization of a semiconductor substrate or of layers applied on it.

公开(公告)号：DE50000500D1

公开(公告)日：2002-10-17

申请号：DE50000500

申请日：2000-03-24

Applicant: INFINEON TECHNOLOGIES AG

Inventor： BRADL STEPHAN ,  HEITZSCH OLAF

IPC: G01V1/00 ,  B23Q17/00 ,  B23Q17/22 ,  B24B37/00 ,  B25J9/16 ,  G05B19/00 ,  H01L21/304 ,  H01L21/67

Abstract: A method and an apparatus for detecting the presence of a work piece in an automatic processing apparatus are described. Previously known detection devices cannot make a clear distinction between the presence and absence of the work piece under all conditions. An apparatus is therefore provided which contains an ultrasound transmitter, an ultrasound receiver and a detection device (controller). The detection as to whether a work piece is held in a holder in the processing apparatus is carried out by irradiating the holder with ultrasound waves, receiving the reflected ultrasound waves and detecting on the basis of the reflected ultrasound waves. The method can be used advantageously in particular in polishing machines for wafers, where the polishing cloth is distinguished considerably, in terms of its acoustic reflection capacity, from the wafer to be polished.

公开(公告)号：DE19929675A1

公开(公告)日：2001-04-12

申请号：DE19929675

申请日：1999-06-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： WAWER PETER ,  HEITZSCH OLAF ,  ROEHRICH MAYK ,  SPRINGMANN OLIVER ,  HUCKELS KAI ,  STEIN VON KAMIENSKI ELARD ,  WOLF KONRAD ,  RENNEKAMP REINHOLD ,  KUTTER CHRISTOPH ,  LUDWIG CHRISTOPH

IPC: H01L21/8246

公开(公告)号：DE19929619A1

公开(公告)日：2001-03-15

申请号：DE19929619

申请日：1999-06-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： WAWER PETER ,  HEITZSCH OLAF ,  ROEHRICH MAYK ,  SPRINGMANN OLIVER ,  HUCKELS KAI ,  STEIN VON KAMIENSKI ELARD

IPC: H01L27/115 ,  G11C16/06

公开(公告)号：DE102004014676B4

公开(公告)日：2009-05-14

申请号：DE102004014676

申请日：2004-03-25

Applicant: INFINEON TECHNOLOGIES AG

Inventor： HEITZSCH OLAF ,  GOLLER KLAUS ,  NICHTERWITZ MARION

IPC: H01L23/544 ,  G03F9/00

公开(公告)号：DE19930586B4

公开(公告)日：2007-12-27

申请号：DE19930586

申请日：1999-07-02

Applicant: INFINEON TECHNOLOGIES AG

Inventor： WAWER PETER ,  SPRINGMANN OLIVER ,  WOLF KONRAD ,  HEITZSCH OLAF ,  HUCKELS KAI ,  RENNEKAMP REINHOLD ,  ROEHRICH MAYK ,  STEIN VON KAMIENSKI ELARD ,  KUTTER CHRISTOPH ,  LUDWIG CHRISTOPH

IPC: H01L27/115 ,  G11C16/02 ,  H01L21/8247 ,  H01L27/11519 ,  H01L27/11521 ,  H01L29/788

公开(公告)号：AT347750T

公开(公告)日：2006-12-15

申请号：AT99120073

申请日：1999-10-20

Applicant: INFINEON TECHNOLOGIES AG

Inventor： LUDWIG CHRISTOPH DR ,  KUTTER CHRISTOPH DR ,  WOLF KONRAD DR ,  HEITZSCH OLAF ,  HUCKELS KAI ,  RENNEKAMP REINHOLD ,  ROEHRICH MAYK ,  STEIN VON KAMIENSKI ELARD DR ,  WAWER PETER DR ,  SPRINGMANN OLIVER

IPC: H01L21/8247 ,  G11C16/04 ,  H01L21/82 ,  H01L27/115 ,  H01L29/06 ,  H01L29/788 ,  H01L29/792 ,  H03K19/173

公开(公告)号：DE19929618B4

公开(公告)日：2006-07-13

申请号：DE19929618

申请日：1999-06-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： WAWER PETER ,  HEITZSCH OLAF ,  ROEHRICH MAYK ,  SPRINGMANN OLIVER ,  HUCKELS KAI ,  STEIN VON KAMIENSKI ELARD ,  WOLF KONRAD ,  RENNEKAMP REINHOLD ,  KUTTER CHRISTOPH ,  LUDWIG CHRISTOPH

IPC: H01L21/8247 ,  H01L21/336 ,  H01L27/115 ,  H01L29/788 ,  H01L29/792

Abstract: A method for producing a non-volatile semiconductor memory cell with a separate tunnel window cell includes the step of forming a tunnel zone in a late implantation step by performing a tunnel implantation with the aid of a tunnel window cell as a mask. The resulting memory cell has a small area requirement and a high number of program/clear cycles.