公开(公告)号：AU2002233644B2

公开(公告)日：2006-09-28

申请号：AU2002233644

申请日：2002-02-18

Applicant: JSR CORP

Inventor： YAMADA KENJI ,  NISHIMURA ISAO ,  KUMANO ATSUSHI ,  BESSHO NOBUO

IPC: C08L101/00 ,  G02B3/00 ,  G02B5/02 ,  G02B5/18 ,  G02B6/00 ,  G02B6/12 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.

公开(公告)号：DE69531268T2

公开(公告)日：2004-06-03

申请号：DE69531268

申请日：1995-05-17

Applicant: JSR CORP ,  SHARP KK

Inventor： MIZUSHIMA SHIGEAKI ,  WATANABE NORIKO ,  IWAGOE HIROKO ,  MAKINO SEIJI ,  KAWAMURA SIGEO ,  TSUDA YUSUKE ,  BESSHO NOBUO

IPC: G02F1/1337 ,  C08G73/10

Abstract: A liquid crystal aligning agent comprising a polyamic acid containing an aliphatic and/or alicyclic hydrocarbon group and a polyimide containing an aliphatic and/or alicyclic hydrocarbon group; and a liquid crystal display device using the liquid crystal aligning agent. This liquid crystal aligning agent gives a liquid crystal aligning film which has good liquid crystal aligning property and in which pretilt angle can be changed by radiation with a small energy and which is suitable for domain-divided alignment type liquid crystal display having a wide view angle.

公开(公告)号：DE69819445D1

公开(公告)日：2003-12-11

申请号：DE69819445

申请日：1998-11-11

Applicant: JSR CORP

Inventor： MASUKO HIDEAKI ,  UDAGAWA TADAHIKO ,  NEMOTO HIROAKI ,  BESSHO NOBUO

IPC: H01J9/02 ,  G03F7/00 ,  H01J11/22 ,  H01J11/38 ,  H01J11/40 ,  H01L21/311 ,  H05K1/09 ,  H05K3/02 ,  H05K3/06 ,  H05K3/20 ,  H01J9/22

公开(公告)号：CA2387716A1

公开(公告)日：2002-03-07

申请号：CA2387716

申请日：2001-08-24

Applicant: JSR CORP

Inventor： BESSHO NOBUO ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI ,  KUMANO ATSUSHI ,  NISHIMURA ISAO

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G02B3/00 ,  C08L101/00 ,  G03H1/02 ,  G02B6/12 ,  G03F7/36

Abstract: A composition having a refractive index sensitively changeable by a radiatio n which comprises (A) a decomposable compound, (B) a non-decomposable compound having a refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent, and (D) a stabilizer. The irradiation of the composition with a radiation ray via a mask decomposes th e above (C) and (A) components in a irradiated portion, resulting in the occurrence of the difference in refractive index between an irradiated porti on and a non-irradiated portion, which leads to the formation of a pattern havi ng regions of different refractive indexes.

公开(公告)号：DE69327189T2

公开(公告)日：2000-06-21

申请号：DE69327189

申请日：1993-03-25

Applicant: JSR CORP

Inventor： TAJIMA YUSUKE ,  BESSHO NOBUO ,  TAKINISHI FUMITAKA ,  YOKOYAMA YASUAKI ,  MASUKO HIDEAKI

IPC: G02B5/20 ,  G02B5/22 ,  G03F7/00 ,  G03F7/012 ,  G03F7/029 ,  G03F7/038 ,  G03C7/12 ,  G03F7/004

Abstract: The present invention provides a pigment-dispersed color-filter composition containing a binder polymer such as an alkali-soluble block copolymer; a radiation-sensitive compound; and a pigment. The pigment-dispersed color-filter composition which further contains an organic medium, or an organic medium and a carboxylic acid is also provided.

公开(公告)号：EP1413924A4

公开(公告)日：2006-08-02

申请号：EP02755662

申请日：2002-07-25

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  YAMADA KENJI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  H01L21/312 ,  H01L23/12 ,  H05K1/00 ,  H05K1/16 ,  C08L101/00 ,  G03F7/36

CPC classification number: H05K1/162 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/0047 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0757 ,  G03F7/26 ,  G03F7/38 ,  H01L21/02126 ,  H01L21/02186 ,  H01L21/02282 ,  H01L21/02343 ,  H01L21/02348 ,  H01L21/312 ,  H05K1/0286 ,  H05K2201/0116 ,  H05K2201/0187 ,  H05K2203/107 ,  H05K2203/1163 ,  Y10S430/106

Abstract: A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer.

公开(公告)号：AU2003302411A1

公开(公告)日：2004-06-18

申请号：AU2003302411

申请日：2003-11-13

Applicant: JSR CORP

Inventor： YASUDA KYOUYU ,  YOKOYAMA YASUAKI ,  BESSHO NOBUO

IPC: G03F7/038 ,  C08L1/00 ,  A61L29/08 ,  A61L31/10 ,  C08K3/04

Abstract: It is an object of the present invention to provide a novel photo-curing composition which can be cured by light of a wide wavelength region including ultraviolet light or visible light, has such high sensitivity that it can be sufficiently cured by exposure to a small amount of light, can favorably form a fine pattern when used as a resist and provides a cured product having excellent heat resistance and insulating properties, and a negative photoresist composition using the photo-curing composition. It is another object of the present invention to provide a process for highly accurately and easily producing a polyimide thin film used for a medical instrument, and a medical instrument having the polyimide thin film. The photo-curing composition of the present invention comprises (A) a carbon cluster and/or its derivative, having a photosensitizing function, (B) a compound having plural heterocyclic rings in a molecule, and if necessary, (C) a photo-insensitive resin.

公开(公告)号：CA2424557A1

公开(公告)日：2003-03-31

申请号：CA2424557

申请日：2002-07-25

Applicant: JSR CORP

Inventor： KUMANO ATSUSHI ,  YAMADA KENJI ,  BESSHO NOBUO ,  NISHIMURA ISAO

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  H01L21/312 ,  H01L23/12 ,  H05K1/00 ,  H05K1/16 ,  C08L101/00 ,  G03F7/36

Abstract: A composition having a permitivity being radiation-sensitively changeable, which comprises (A) a decomposable compound, (B) a non-decomposable compound , (C) a radiation- sensitive decomposer and (D) a stabilizer. The composition allows the achievement of the change of the permitivity of a material, which is satisfactorily great and stable, in an easy and simple manner, and thus c an provide a permitivity pattern and an optical material having a satisfactory distribution of permitivity being stable independently of the condition for its use.

公开(公告)号：CA2431358A1

公开(公告)日：2002-06-20

申请号：CA2431358

申请日：2001-12-06

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  NISHIMURA ISAO ,  YAMADA KENJI ,  BESSHO NOBUO ,  KUMANO ATSUSHI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G03F7/36 ,  G03F7/38

Abstract: A radiation-sensitive composition changing in refractive index which compris es (A) a decomposable compound, (B) a nondecomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation-sensiti ve decomposer, and (D) a stabilizer. When the composition is irradiated with a radiation through a pattern mask, the ingredients (C) and (A) in the irradiated areas decompose to cause a difference in refractive index between the irradiated areas and the unirradiated areas. Thus, a pattern having different refractive indexes is formed.

公开(公告)号：DE69325480T2

公开(公告)日：2000-03-30

申请号：DE69325480

申请日：1993-07-23

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  ENDO MASAYUKI ,  SHIMADA ATSUFUMI ,  YOKOYAMA YASUAKI ,  BESSHO NOBUO

IPC: C08G81/00 ,  C08F2/50 ,  C08F220/04 ,  C08F220/32 ,  C08F222/04 ,  H05K3/28 ,  C08F291/10

Abstract: An epoxy group-containing thermosetting resin composition comprising (A) a copolymer obtained from (a) at least one member selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, (b) an epoxy group-containing unsaturated compound, (c) a monoolefin unsaturated compound, and (d) a conjugated diolefin unsaturated compound, and (B) an organic solvent for dissolving the above copolymer. There is also provided epoxy-group containing radiation sensitive resin composition which contains a component (A) obtained from (a), (b) and (c) and optionally (d), (C) a polymerizable compound having at least one ethylenically unsaturated double bond, and (D) a photopolymerization initiator. These epoxy-group containing thermosetting resin compositions are excellent in storage stability.