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公开(公告)号：DE69736024D1
公开(公告)日：2006-07-06
申请号：DE69736024
申请日：1997-02-07
Applicant: JSR CORP
Inventor： SUWA MITSUHITO , KAJITA TORU , IWANAGA SHIN-ICHIRO , OTA TOSHIYUKI
Abstract: A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.
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公开(公告)号：SG122899A1
公开(公告)日：2006-06-29
申请号：SG200507079
申请日：2005-11-17
Applicant: JSR CORP
Inventor： ICHINOHE DAIGO , NISHIO TOSHIHIRO , HAMAGUCHI HITOSHI , IWABUCHI TOMOKO , YONEKURA ISAMU , KAJITA TORU
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公开(公告)号：AT315245T
公开(公告)日：2006-02-15
申请号：AT00120000
申请日：2000-09-14
Applicant: JSR CORP
Inventor： DOUKI KATSUJI , MURATA KIYOSHI , ISHII HIROYUKI , KAJITA TORU , SHIMOKAWA TSUTOMU
Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.
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公开(公告)号：DE69733164D1
公开(公告)日：2005-06-09
申请号：DE69733164
申请日：1997-02-07
Applicant: JSR CORP
Inventor： SUWA MITSUHITO , KAJITA TORU , IWANAGA SHIN-ICHIRO , OTA TOSHIYUKI
Abstract: A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.
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15.发明公开COMPOSITION FOR SEALING OPTICAL SEMICONDUCTOR, OPTICAL SEMICONDUCTOR SEALING MATERIAL, AND METHOD FOR PRODUCING COMPOSITION FOR SEALING OPTICAL SEMICONDUCTOR 审中-公开用密封组合物的光头HALF，材料用于密封光学半目和方法生产组合物用于密封光学头HALF
公开(公告)号：EP1736500A4
公开(公告)日：2010-03-24
申请号：EP05734362
申请日：2005-04-13
Applicant: JSR CORP
Inventor： AKIIKE TOSHIYUKI , KAJITA TORU , YAMADA KINJI
IPC: C08G77/14 , C08G59/20 , C08G59/42 , C08K5/00 , C08K5/09 , C08L83/06 , C09K3/10 , H01L23/29 , H01L23/31 , H01L33/56
CPC classification number: C08G77/14 , C08K5/09 , C08L83/06 , C09K3/1018 , H01L23/293 , H01L33/56 , H01L2924/0002 , H01L2924/00
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Patent Agency Ranking16.发明专利Radiation-sensitive composition, color filter, black matrix, and liquid crystal display element 审中-公开辐射敏感组合物，彩色滤光片，黑色矩阵和液晶显示元件
公开(公告)号：JP2010061041A
公开(公告)日：2010-03-18
申请号：JP2008228954
申请日：2008-09-05
Inventor： MINOWA TAKAKI , KAJITA TORU
Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for forming a color layer, which forms a fine pattern without causing chipping in a pattern edge or undercut even when the luminous energy of exposure is low, without generating an undissolved substance remaining during development or scum on a pattern edge, and forms a color filter with high color purity and a black matrix having high light-shielding property. SOLUTION: The radiation-sensitive composition contains (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a specific photopolymerization initiator represented by a compound No.1. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种用于形成彩色层的辐射敏感性组合物，其即使在曝光的光能量低的情况下也形成精细图案而不会在图案边缘或底切中产生切屑，而不产生未溶解的物质 在图案边缘的显影或浮渣期间保留，并且形成具有高纯度的滤色器和具有高遮光性的黑色矩阵。 解决方案：辐射敏感性组合物包含（A）着色剂，（B）碱溶性树脂，（C）多官能单体和（D）由化合物1表示的特定光聚合引发剂。 版权所有（C）2010，JPO＆INPIT
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17.发明专利Thermosetting resin composition, method for producing color filter protective film, and color filter protective film 审中-公开热固性树脂组合物，生产彩色滤光片保护膜的方法和彩色滤光片保护膜
公开(公告)号：JP2009203345A
公开(公告)日：2009-09-10
申请号：JP2008046791
申请日：2008-02-27
Inventor： ICHINOHE DAIGO , KAJITA TORU
Abstract: PROBLEM TO BE SOLVED: To provide a thermosetting resin composition, which is suitably used to form a color filter protective film having excellent adhesiveness to an ITO film even under high temperature and high humidity, high in transparency and surface hardness, and excellent in various resistances such as sputtering resistance. SOLUTION: The thermosetting resin composition comprises: [A] a polymer having a repeating unit derived from a polymerizable unsaturated compound having an oxiranyl group or oxetanyl group; and [B] a calixarene compound having a specific structure. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 解决的问题：为了提供一种热固性树脂组合物，其适用于形成即使在高温高湿下也具有优异的与ITO膜的密合性的滤色器保护膜，透明性和表面硬度高， 在各种电阻例如溅射电阻。 解决方案：热固性树脂组合物包含：[A]具有衍生自具有环氧乙烷基或氧杂环丁烷基的可聚合不饱和化合物的重复单元的聚合物; 和[B]具有特定结构的杯芳烃化合物。 版权所有（C）2009，JPO＆INPIT
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18.发明专利
公开(公告)号：JP2009138127A
公开(公告)日：2009-06-25
申请号：JP2007316921
申请日：2007-12-07
Inventor： UEDA JIRO , KAJITA TORU , IIJIMA TAKAHIRO
IPC: C08L33/14 , C08F220/32 , C08F220/38 , C08K5/00 , C08L63/00 , C09D141/00 , C09D163/00 , C09D171/02 , C09D201/02 , G02B5/20
Abstract: PROBLEM TO BE SOLVED: To provide a composition, which can form a cured film having high flatness on a substrate having low surface flatness, and which is for forming an optical device protective film having high transparency and surface hardness, and various excellent resistive characteristics such as heat and pressure resistance, acid resistance, alkali resistance, sputtering resistance, and etching resistance. SOLUTION: The resin composition includes a copolymer containing a polymerization unit derived from a polymerizable unsaturated compound having an oxiranyl or oxetanyl group, and at least one kind of polymerization unit derived from at least one kind of polymerizable unsaturated compound selected from the group consisting of polymerizable unsaturated compounds having an alkoxy thiocarbonyl or alkoxyalkyl thiocarbonyl group, and a solvent. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种组合物，其可以在具有低表面平整度的基材上形成具有高平坦度的固化膜，并且用于形成具有高透明度和表面硬度的光学装置保护膜，以及各种优异的 电阻特性如耐热压性，耐酸性，耐碱性，耐溅射性和耐蚀刻性。 解决方案：树脂组合物包括含有衍生自具有环氧乙烷基或氧杂环丁烷基的可聚合不饱和化合物的聚合单元的共聚物和至少一种衍生自选自下组的可聚合不饱和化合物的聚合单元 由具有烷氧基硫代羰基或烷氧基烷基硫代羰基的可聚合不饱和化合物和溶剂组成。 版权所有（C）2009，JPO＆INPIT
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19.发明专利Radiation-sensitive resin composition, spacer for liquid crystal display device and method for producing the same 有权辐射敏感性树脂组合物，用于液晶显示装置的间隔件及其制造方法
公开(公告)号：JP2009075283A
公开(公告)日：2009-04-09
申请号：JP2007243285
申请日：2007-09-20
Inventor： ICHINOHE DAIGO , KAJITA TORU
Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition obtaining an adequate spacer shape even under ≤600 J/m 2 of exposure energy, and capable of forming a spacer for a liquid crystal display device excellent in rubbing resistance, adhesion to a transparent substrate, heat resistance and flexibility can be formed. SOLUTION: The radiation-sensitive resin composition comprises [A] a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound other than the component (a1), [B] a polymerizable unsaturated compound, and [C] an o-acyloxime-based radiation-sensitive polymerization initiator having a carbazole group. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：为了提供即使在≤600J/ m 2的曝光能量下获得足够的间隔物形状的辐射敏感性树脂组合物，并且能够形成用于液晶的间隔物 可以形成耐摩擦性优异，对透明基板的粘附性，耐热性和柔软性的显示装置。 解决方案：辐射敏感性树脂组合物包含[A]（a1）选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物和（a2）不同于组分（ a1），[B]可聚合不饱和化合物和[C]具有咔唑基团的邻酰基肟基辐射敏感聚合引发剂。 版权所有（C）2009，JPO＆INPIT
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20.发明专利Thermosetting resin composition, method for forming protective film of color filter, and protective film of color filter 审中-公开热固性树脂组合物，形成滤色膜保护膜的方法和彩色滤光片的保护膜
公开(公告)号：JP2009073871A
公开(公告)日：2009-04-09
申请号：JP2007241609
申请日：2007-09-18
Inventor： ICHINOHE DAIGO , KAJITA TORU
Abstract: PROBLEM TO BE SOLVED: To provide a thermosetting resin composition suitably used for forming a protective film of a color filter, the protective film showing high transparency and surface hardness and excellent in various kinds of durability such as heat resistance and alkali resistance even at a temperature of at most 200°C in a heat calcination step. SOLUTION: The composition comprises: [A] a copolymer of (a1) at least one kind of polymerizable unsaturated compound selected from a group consisting of polymerizable unsaturated compounds having an oxiranyl group and polymerizable unsaturated compounds having an oxetanyl group, and (a2) another polymerizable unsaturated compound excluding the compound of (a1); [B] a curing agent; and [C] a specified onium fluorinated alkyl fluorophosphate. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：为了提供适合用于形成滤色器保护膜的热固性树脂组合物，该保护膜显示出高透明度和表面硬度，并且具有优异的各种耐久性，例如耐热性和耐碱性，甚至 在热煅烧步骤中在至多200℃的温度下进行。 组合物包含：[a]（a1）选自由具有环氧乙烷基的可聚合不饱和化合物和具有氧杂环丁烷基的可聚合不饱和化合物组成的组中的至少一种可聚合不饱和化合物的共聚物和（ a2）不包括（a1）化合物的另一种可聚合不饱和化合物; [B]固化剂; 和[C]指定的氟化氟化烷基氟磷酸酯。 版权所有（C）2009，JPO＆INPIT
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