公开(公告)号：WO2010011560A2

公开(公告)日：2010-01-28

申请号：PCT/US2009050834

申请日：2009-07-16

Applicant: KLA TENCOR CORP ,  ADEL MICHAEL E ,  POSLAVSKY LEONID ,  FIELDEN JOHN ,  MADSEN JONATHAN MICHAEL ,  PETERS ROBERT

Inventor： ADEL MICHAEL E ,  POSLAVSKY LEONID ,  FIELDEN JOHN ,  MADSEN JONATHAN MICHAEL ,  PETERS ROBERT

IPC: H01L21/66

CPC classification number: H01L22/12 ,  H01L22/20 ,  H01L22/30 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.

Abstract translation: 可以在半导体器件制造期间通过以下步骤来实现计量：a）对形成在部分制造的器件的层中的第一测试单元上的第一测量进行建模; b）对所述层中的第二测试单元执行第二测量; c）将第二测量中的信息馈送到第一测量的建模中; 并且在包括第一和第二测试单元的层上形成光刻图案之后，d）分别使用来自a）和b）的信息对第一和第二测试单元上的第三和第四测量进行建模。

公开(公告)号：EP2761272A4

公开(公告)日：2015-07-29

申请号：EP12837177

申请日：2012-09-25

Applicant: KLA TENCOR CORP

Inventor： GAO XIANG ,  FLANNER III PHILIP D ,  POSLAVSKY LEONID ,  JIANG ZHIMING ,  YE JUN-JIE JULILEN ,  KAACK TORSTEN ,  ZHAO QIANG

IPC: G01N21/95 ,  G01B11/06 ,  G01N21/21 ,  G01N21/84 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/211 ,  G01N21/8422 ,  G01N21/8851 ,  H01L22/12

公开(公告)号：EP2729789A4

公开(公告)日：2015-03-18

申请号：EP12807285

申请日：2012-07-03

Applicant: KLA TENCOR CORP

Inventor： KWAK HINDONG ,  DIXON WARD ,  POSLAVSKY LEONID ,  KAACK TORSTEN

IPC: G01N21/21 ,  G01J4/00

CPC classification number: G01J4/00 ,  G01N21/211 ,  G01N2021/213

公开(公告)号：EP2783392A4

公开(公告)日：2015-10-21

申请号：EP12852321

申请日：2012-11-20

Applicant: KLA TENCOR CORP

Inventor： KWAK HIDONG ,  JIANG ZHIMING ,  DIXON WARD RDELL ,  JAMES KENNETH EDWARD ,  POSLAVSKY LEONID ,  KAACK TORSTEN

IPC: H01L21/66 ,  G01N21/21 ,  G03F7/20

CPC classification number: G01N21/274 ,  G01N21/211 ,  G03F7/70608

Abstract: Methods and systems for calibrating system parameter values of a target inspection system are presented. Spectral Error Based Calibration (SEBC) increases consistency among inspection systems by minimizing differences in the spectral error among different inspection systems for a given specimen or set of specimens. The system parameter values are determined such that differences between a spectral error associated with a measurement of a specimen by the target inspection system and a spectral error associated with a measurement of the same specimen by a reference inspection system are minimized. In some examples, system parameter values are calibrated without modifying specimen parameters. Small inaccuracies in specimen parameter values have little effect on the calibration because the target system and the reference system both measure the same specimen or set of specimens. By performing SEBC over a set of specimens, the resulting calibration is robust to a wide range of specimens under test.

公开(公告)号：EP2791653A4

公开(公告)日：2015-09-30

申请号：EP12857471

申请日：2012-12-14

Applicant: KLA TENCOR CORP

Inventor： ILORETA JONATHAN ,  AOYAGI PAUL ,  CHU HANYOU ,  CHARD JEFFREY ,  JIANG PEILIN ,  SUSHCHIK MIKHAIL ,  POSLAVSKY LEONID ,  FLANNER PHILIP D III

IPC: G03F7/20 ,  G01B11/24

CPC classification number: G01B11/00 ,  G01B11/24 ,  G01B11/30 ,  G01B2210/56 ,  G03F7/70625 ,  G06F7/00 ,  G06F17/16 ,  G06F17/40 ,  G06F19/00 ,  H01L22/12