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公开(公告)号：AT472172T
公开(公告)日：2010-07-15
申请号：AT03716753
申请日：2003-03-21
Applicant: LAM RES CORP
Inventor： REN DAXING , HUBACEK JEROME , WEBB NICHOLAS
IPC: H01L21/00 , H01L21/3065 , C23C16/44 , H01J1/00 , H01J37/32 , H01L21/205 , H01L21/30 , H01L21/306 , H01L21/316
Abstract: Silicon parts of a semiconductor processing apparatus containing low levels of metal impurities that are highly mobile in silicon are provided. The silicon parts include, for example, rings, electrodes and electrode assemblies. The silicon parts can reduce metal contamination of wafers processed in plasma atmospheres.
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公开(公告)号：AU2003220446A1
公开(公告)日：2003-11-03
申请号：AU2003220446
申请日：2003-03-21
Applicant: LAM RES CORP
Inventor： REN DAXING , HUBACEK JEROME S , WEBB NICHOLAS E
IPC: H01L21/3065 , C23C16/44 , H01J37/32 , H01L21/205 , H01L21/00 , H01L21/316 , H01L21/306 , H01J1/00 , H01L21/30
Abstract: Silicon parts of a semiconductor processing apparatus containing low levels of metal impurities that are highly mobile in silicon are provided. The silicon parts include, for example, rings, electrodes and electrode assemblies. The silicon parts can reduce metal contamination of wafers processed in plasma atmospheres.
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公开(公告)号：AT524824T
公开(公告)日：2011-09-15
申请号：AT05854136
申请日：2005-12-15
Applicant: LAM RES CORP
Inventor： HUANG TUOCHUAN , REN DAXING , SHIH HONG , ZHOU CATHERINE , YAN CHUN , MAGNI ENRICO , YEN BI , HUBACEK JEROME , LIM DAE , SUNG DOUGYONG
Abstract: Methods for cleaning an electrode assembly, which can be used for etching a dielectric material in a plasma etching chamber after the cleaning, comprise polishing a silicon surface of the electrode assembly, preferably to remove black silicon contamination therefrom.
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公开(公告)号：DE60333088D1
公开(公告)日：2010-08-05
申请号：DE60333088
申请日：2003-03-21
Applicant: LAM RES CORP
Inventor： REN DAXING , HUBACEK JEROME S , WEBB NICHOLAS E
IPC: H01L21/00 , H01L21/3065 , C23C16/44 , H01J1/00 , H01J37/32 , H01L21/205 , H01L21/30 , H01L21/306 , H01L21/316
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