公开(公告)号：EP1753549A4

公开(公告)日：2009-09-16

申请号：EP05756207

申请日：2005-06-03

Applicant: LAM RES CORP

Inventor： SHIH HONG ,  HUANG TUOCHUAN ,  OUTKA DUANE ,  KUO JACK ,  LIU SHENJIAN ,  MOREL BRUNO ,  CHEN ANTHONY

IPC: C23G1/02 ,  B08B3/00 ,  B08B3/04 ,  B08B3/12 ,  B08B3/14 ,  C23C16/00 ,  C23C16/44

CPC classification number: C23C16/4407 ,  H01J37/32862

公开(公告)号：EP1839330A4

公开(公告)日：2010-08-25

申请号：EP05854223

申请日：2005-12-15

Applicant: LAM RES CORP

Inventor： REN DAXING ,  SHIH HONG

IPC: H01L21/302 ,  C11D7/10 ,  C11D7/26 ,  C11D11/00 ,  C23G1/02

CPC classification number: B08B3/08 ,  C11D3/3947 ,  C11D7/10 ,  C11D7/265 ,  C11D11/0047 ,  Y10S134/902

公开(公告)号：WO2012061362A3

公开(公告)日：2012-09-07

申请号：PCT/US2011058745

申请日：2011-11-01

Applicant: LAM RES CORP ,  LA CROIX CLIFF ,  AVOYAN ARMEN ,  OUTKA DUANE ,  ZHOU CATHERINE ,  SHIH HONG

Inventor： LA CROIX CLIFF ,  AVOYAN ARMEN ,  OUTKA DUANE ,  ZHOU CATHERINE ,  SHIH HONG

IPC: H01L21/304

CPC classification number: B24B37/30 ,  B24B41/061

Abstract: In one embodiment, an electrode polishing assembly may include an electrode securing platen, a plurality of electrode locating fasteners, and an electrode. Each of the electrode locating fasteners may include an electrode spacing shoulder, a variance cancelling shoulder extending from the electrode spacing shoulder, a threaded platen clamping portion extending from the variance cancelling shoulder, and a threaded nut that engages the threaded platen clamping portion. The electrode locating fasteners clamp the electrode securing platen between the threaded nut and the electrode spacing shoulder. The variance cancelling shoulder is at least partially within one of a plurality of variance cancelling passages of the electrode securing platen. A minimum position stack-up is equal to a minimum passage size minus a maximum shoulder size. A maximum position stack-up is equal to a maximum passage size minus a minimum shoulder size. The maximum position stack-up is greater than the minimum position stack-up.

Abstract translation: 在一个实施例中，电极抛光组件可以包括电极固定台板，多个电极定位紧固件和电极。 每个电极定位紧固件可以包括电极间隔肩部，从电极间隔肩部延伸的变化抵消肩部，从变化抵消肩部延伸的螺纹压板夹紧部分以及与螺纹压板夹紧部分接合的螺纹螺母。 电极定位紧固件将电极固定板夹紧在螺母和电极间隔肩之间。 方差消除肩部至少部分在电极固定台板的多个方差消除通道中的一个之内。 最小位置叠加等于最小通道尺寸减去最大肩部尺寸。 最大位置叠加等于最大通道尺寸减去最小肩部尺寸。 最大位置叠加大于最小位置叠加。

公开(公告)号：WO2010042908A2

公开(公告)日：2010-04-15

申请号：PCT/US2009060290

申请日：2009-10-10

Applicant: LAM RES CORP ,  SHIH HONG ,  ULLAL SAURABH ,  HUANG TUOCHUAN ,  FANG YAN ,  MCCHESNEY JON

Inventor： SHIH HONG ,  ULLAL SAURABH ,  HUANG TUOCHUAN ,  FANG YAN ,  MCCHESNEY JON

IPC: H01L21/683 ,  H01L21/687

CPC classification number: H01L21/6833

Abstract: The present invention provides a reliable, non-invasive, electrical test method for predicting satisfactory performance of electrostatic chucks (ESCs). In accordance with an aspect of the present invention, a parameter, e.g., impedance, of an ESC is measured over a frequency band to generate a parameter functions. This parameter function may be used to establish predetermined acceptable limits of the parameter within the frequency band.

Abstract translation: 本发明提供了用于预测静电卡盘（ESC）的令人满意的性能的可靠的非侵入式电测试方法。 根据本发明的一个方面，在频带上测量ESC的参数，例如阻抗，以产生参数功能。 该参数功能可用于建立频带内参数的预定可接受极限。

公开(公告)号：EP1848597A4

公开(公告)日：2010-04-14

申请号：EP05854136

申请日：2005-12-15

Applicant: LAM RES CORP

Inventor： HUANG TUOCHUAN ,  REN DAXING ,  SHIH HONG ,  ZHOU CATHERINE ,  YAN CHUN ,  MAGNI ENRICO ,  YEN BI MING ,  HUBACEK JEROME ,  LIM DAE J ,  SUNG DOUGYONG

IPC: H01L21/00 ,  B08B3/12 ,  B24B1/00

CPC classification number: H01L21/67069 ,  B08B3/10 ,  B08B3/12 ,  B24C1/003 ,  H01J37/32605

公开(公告)号：EP1667850A4

公开(公告)日：2008-09-10

申请号：EP04784321

申请日：2004-09-16

Applicant: LAM RES CORP

Inventor： SHIH HONG ,  CHEN ANTHONY L ,  TAN SOK KIOW ,  HWANG STEPHEN ,  DAUGHERTY JOHN ,  MOREL BRUNO

IPC: C23F1/16 ,  B08B3/00 ,  B08B6/00 ,  B08B7/00 ,  B08B9/00 ,  B44C1/22 ,  C23C16/44 ,  C23F15/00 ,  C23F17/00 ,  C23G1/00 ,  C23G1/02 ,  C23G1/14 ,  H01L20060101

CPC classification number: H01J37/32431 ,  H01J2237/335

Abstract: A method of removing a set of particles from a set of structures including yttrium oxide is disclosed. The method includes exposing the set of structures to a first solution including an oxidizer for a first period. The method also includes removing the set of structures from the first solution, and exposing the set of structures to a second solution including a keytone reagent for a second period. The method further includes removing the set of structures from the second solution, and mechanically rubbing the set of structures with a third solution including a first set of acids for a third period.

公开(公告)号：EP2298042A4

公开(公告)日：2015-10-07

申请号：EP09774083

申请日：2009-06-23

Applicant: LAM RES CORP

Inventor： AVOYAN ARMEN ,  FANG YAN ,  OUTKA DUANE ,  SHIH HONG ,  WHITTEN STEPHEN

IPC: H05H1/34

CPC classification number: H01J37/32862 ,  H01J37/32559

公开(公告)号：EP1824615A4

公开(公告)日：2012-08-08

申请号：EP05849352

申请日：2005-11-21

Applicant: LAM RES CORP

Inventor： SHIH HONG ,  HUANG TUOCHUAN ,  ZHOU CATHERINE ,  MOREL BRUNO ,  MCMILLIN BRIAN ,  MULGREW PAUL ,  AVOYAN ARMEN

IPC: B08B3/12 ,  B08B3/00 ,  B08B3/10 ,  B08B5/00 ,  B08B7/00 ,  C23G1/02

CPC classification number: H01L21/6831 ,  B08B3/12 ,  H01L21/6704

公开(公告)号：WO2011084127A3

公开(公告)日：2011-10-13

申请号：PCT/US2010003092

申请日：2010-12-06

Applicant: LAM RES CORP ,  SHIH HONG ,  AVOYAN ARMEN ,  DESHMUKH SHASHANK C ,  CARMAN DAVID

Inventor： SHIH HONG ,  AVOYAN ARMEN ,  DESHMUKH SHASHANK C ,  CARMAN DAVID

IPC: H01L21/205 ,  H01L21/3065

CPC classification number: B08B3/08

Abstract: A method for cleaning metallic contaminants from an upper electrode used in a plasma chamber. The method comprises a step of soaking the upper electrode in a cleaning solution of concentrated ammonium hydroxide, hydrogen peroxide and water. The cleaning solution is free of hydrofluoric acid and hydrochloric acid. The method further comprises an optional step of soaking the upper electrode in dilute nitric acid and rinsing the cleaned upper electrode.

Abstract translation: 一种用于从等离子体室中使用的上电极清除金属污染物的方法。 该方法包括将上电极浸泡在浓氢氧化铵，过氧化氢和水的清洁溶液中的步骤。 清洁液不含氢氟酸和盐酸。 该方法还包括将上电极浸泡在稀硝酸中并冲洗清洁后的上电极的可选步骤。

公开(公告)号：WO2010042907A3

公开(公告)日：2010-07-15

申请号：PCT/US2009060289

申请日：2009-10-10

Applicant: LAM RES CORP ,  SHIH HONG

Inventor： SHIH HONG

IPC: H01L21/683 ,  H01L21/687

CPC classification number: H01L21/6833 ,  H02N13/00 ,  Y10T29/49004 ,  Y10T29/49155 ,  Y10T29/49718 ,  Y10T29/49719 ,  Y10T29/49746

Abstract: A bipolar electrostatic chuck refurbishing process in accordance with an aspect of the present invention does not require physical separation of the two electrodes of the electrostatic chuck. One aspect of the present invention is drawn to method of treating a bipolar electrostatic chuck having a front surface and a back surface and comprising a first electrode disposed at the front surface, a second electrode at the front surface and an anodized layer disposed on the front surface, the first electrode and the second electrode. The method comprises measuring a first parameter of the electrostatic chuck, discarding the electrostatic chuck if the first measured parameter is not within a first predetermined range, cleaning the electrostatic chuck if the first measured parameter is within the first predetermined range, sealing gaps between the first electrode and the second electrode at the front surface with a sealant, without displacing the first electrode relative to the second electrode, eliminating the anodized layer; and disposing a new anodized layer onto the front surface, the first electrode and the second electrode.

Abstract translation: 根据本发明的一个方面的双极静电卡盘翻新工艺不需要静电卡盘的两个电极的物理分离。 本发明的一个方面涉及一种处理具有前表面和后表面的双极静电卡盘的方法，所述双极性静电卡盘包括位于前表面处的第一电极，在前表面处的第二电极和设置在前表面上的阳极氧化层 表面，第一电极和第二电极。 该方法包括测量静电卡盘的第一参数，如果第一测量参数不在第一预定范围内，则将静电卡盘丢弃;如果第一测量参数在第一预定范围内，则清洁静电卡盘;密封第一测量参数之间的间隙 电极和第二电极在前表面具有密封剂，而不相对于第二电极移动第一电极，消除阳极氧化层; 以及在所述前表面，所述第一电极和所述第二电极上设置新的阳极氧化层。