Abstract:
Thin semiconductor foils can be formed using light reactive deposition. These foils can have an average thickness of less than 100 microns. In some embodiments, the semiconductor foils can have a large surface area, such as greater than about 900 square centimeters. The foil can be free standing or releasably held on one surface. The semiconductor foil can comprise elemental silicon, elemental germanium, silicon carbide, doped forms thereof, alloys thereof or mixtures thereof. The foils can be formed using a release layer that can release the foil after its deposition. The foils can be patterned, cut and processed in other ways for the formation of devices. Suitable devices that can be formed form the foils include, for example, photovoltaic modules and display control circuits.
Abstract:
Silicon nanoparticle inks provide a basis for the formation of desirable materials. Specifically, composites have been formed in thin layers comprising silicon nanoparticles embedded in an amorphous silicon matrix, which can be formed at relatively low temperatures. The composite material can be heated to form a nanocrystalline material having crystals that are non-rod shaped. The nanocrystalline material can have desirable electrical conductive properties, and the materials can be formed with a high dopant level. Also, nanocrystalline silicon pellets can be formed from silicon nanoparticles deposited form an ink in which the pellets can be relatively dense although less dense than bulk silicon. The pellets can be formed from the application of pressure and heat to a silicon nanoparticle layer.
Abstract:
Desirable composites of polysiloxane polymers and inorganic nanoparticles can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion through the polymer. The composites can have good optical properties. In some embodiments, the inorganic particles are substantially free of surface modification.
Abstract:
Collections of phosphor particles have achieved improved performance based on improved material properties, such as crystallinity. Display devices can be formed with these improved submicron phosphor particles. Improved processing methods contribute to the improved phosphor particles, which can have high crystallinity and a high degree of particle size uniformity. Dispersions and composites can be effectively formed from the powders of the submicron particle collections.
Abstract:
PROBLEM TO BE SOLVED: To provide a composite composition including a polymer with side groups chemically bonded to inorganic particles. SOLUTION: The composite 100 of inorganic particle 102/polymer molecule 104 is explained to participate a chemical bond between composite elements. In some embodiments, a composite composition includes a polymer with a side group chemically bonded to the inorganic particles. Further more, the composite composition can include chemically bonded inorganic particles and an ordered polymer. Various electric, optical and electro-optical devices can be formed from the composition. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
Highly uniform silicon/germanium nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silicon/germanium particles can be surface modified to form the dispersions. The silicon/germanium nanoparticles can be doped to change the particle properties. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to form selectively doped deposits of semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
Abstract:
Nanoscale particles, particle coatings/particle arrays and corresponding consolidated materials are described based on an ability to vary the composition involving a wide range of metal and/or metalloid elements and corresponding compositions. In particular, metalloid oxides and metal-metalloid compositions are described in the form of improved nanoscale particles and coatings formed from the nanoscale particles. Compositions comprising rare earth metals and dopants/additives with rare earth metals are described. Complex compositions with a range of host compositions and dopants/additives can be formed using the approaches described herein. The particle coating can take the form of particle arrays that range from collections of disbursable primary particles to fused networks of primary particles forming channels that reflect the nanoscale of the primary particles. Suitable materials for optical applications are described along with some optical devices of interest.
Abstract:
LASER PYROLYSIS REACTOR DESIGNS AND CORRESPONDING REACTANT INLET NOZZLES ARE DESCRIBED TO PROVIDE DESIRABLE PARTICLE QUENCHING THAT IS PARTICULARLY SUITABLE FOR THE SYNTHESIS OF ELEMENTAL SILICON PARTICLES. IN PARTICULAR, THE NOZZLES CAN HAVE A DESIGN TO ENCOURAGE NUCLEATION AND QUENCHING WITH INERT GAS BASED ON A SIGNIFICANT FLOW OF INERT GAS SURROUNDING THE REACTANT PRECURSOR FLOW AND WITH A LARGE INERT ENTRAINMENT FLOW EFFECTIVELY SURROUNDING THE REACTANT PRECURSOR AND QUENCH GAS FLOWS. IMPROVED SILICON NANOPARTICLE INKS ARE DESCRIBED THAT HAS SILICON NANOPARTICLES WITHOUT ANY SURFACE MODIFICATION WITH ORGANIC COMPOUNDS. THE SILICON INK PROPERTIES CAN BE ENGINEERED FOR PARTICULAR PRINTING APPLICATIONS, SUCH AS INKJET PRINTING, GRAVURE PRINTING OR SCREEN PRINTING. APPROPRIATE PROCESSING METHODS ARE DESCRIBED TO PROVIDE FLEXIBILITY FOR INK DESIGNS WITHOUT SURFACE MODIFYING THE SILICON NANOPARTICLES.
Abstract:
The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate (240) using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.