MANUFACTURE OF COMPOUND SEMICONDUCTOR LASER

    公开(公告)号:JPH11346034A

    公开(公告)日:1999-12-14

    申请号:JP14153399

    申请日:1999-05-21

    Applicant: SONY CORP

    Abstract: PROBLEM TO BE SOLVED: To contrive avoidance of an inactivation of an acceptor due to the H group of an arsine AsH3 raw material in the method of manufacturing a compound semiconductor laser. SOLUTION: When a compound semiconductor layer 18 containing As is formed on a p-type compound semiconductor layer 17, the layer 18 containing the As is formed by the feed of an organic arsenic raw material. Thereby, when the later 18 containing the As is formed on the layer 17, avoidance of an inactivation of an acceptor due to the H group of an arsine AsH3 raw material, which is hitherto used, can be contrived and in the case where the method of manufacturing the layer 18 is adapted to the manufacture of a semiconductor laser, a reduction in the resistance between a p-type cap layer and an active layer, the enhancement of the controllability of p-type carriers and the enhancement of the characteristics of the laser can be contrived.

    SEMICONDUCTOR LASER
    13.
    发明专利

    公开(公告)号:JPH0870157A

    公开(公告)日:1996-03-12

    申请号:JP22874594

    申请日:1994-08-30

    Applicant: SONY CORP

    Abstract: PURPOSE: To achieve a semiconductor laser using II-VI compound semiconductor realizing a high-frequency modulation without any oscillation delay. CONSTITUTION: In a semiconductor laser using II-VI compound semiconductor as the materials of clad layers 3 and 7 and an activated layer 5, an effective refractive index difference in the oscillation wavelength between the center of a current-injection part in a direction which is parallel to the activated layer 5 and a current non-injection part is provided to be at least 1×10 . Setting the gain at the oscillation wavelength immediately after injecting current to gm (0) and the total loss in a laser resonator to αtotal , current is injected under the conditions where gm (0)>=αtotal is established.

    MANUFACTURE OF SEMICONDUCTOR DEVICE

    公开(公告)号:JPH07263814A

    公开(公告)日:1995-10-13

    申请号:JP7256894

    申请日:1994-03-16

    Applicant: SONY CORP

    Abstract: PURPOSE:To prevent the lowering of adhesion strength of a coated insulating material by depositing the insulating material on the surface of the surface of a semiconductor substrate in which irregularities constituting a predetermined roughness are formed. CONSTITUTION:At a first step, a semiconductor substrate 1 on which an insulating material is to be deposited on is prepared. The semiconductor substrate 1 is a III-V or II-VI compound semiconductor. Next, at a second step, the predetermined irregularities 1a are formed in the surface of the semiconductor substrate 1 to increase the surface area. Next, at a third step, an insulating material 2 is deposited on the surface of the semiconductor substrate 1 in which irregularities are formed. The insulating material 2 is SiO2, SiNx, Al2O3, TiO2, MgF2 or the like. Since the surface area of the semiconductor substrate 1 with the insulating material 2 is increased by the irregularities 1a, the adhesion strength of the insulating material deposited is increased.

    Optical pickup and optical disk drive unit
    16.
    发明专利
    Optical pickup and optical disk drive unit 审中-公开
    光学拾取和光盘驱动器

    公开(公告)号:JP2009140551A

    公开(公告)日:2009-06-25

    申请号:JP2007314736

    申请日:2007-12-05

    Abstract: PROBLEM TO BE SOLVED: To achieve stable servo control of an optical pickup with a relatively simple configuration. SOLUTION: A diffraction grating disposed before a photo detector 47 has dual partitioning in the tangential direction of an optical disk, and the partitioned diffraction regions A and B have diffraction efficiencies respectively inclined in the radial direction of the optical disk while the directions of the inclinations of the diffraction efficiencies of the diffraction regions A and B are opposite. Specifically, the diffraction region A has the higher diffraction efficiency on the left hand side than on the right hand side in the drawing. In contrast, the diffraction region B has the diffraction efficiency higher on the right hand side than on the left hand side in the drawing. This technology can be applied to an optical disk drive. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:以相对简单的结构实现光拾取器的稳定伺服控制。 解决方案:设置在光电检测器47之前的衍射光栅在光盘的切线方向上具有双重划分,并且分割的衍射区域A和B具有分别沿着光盘的径向方向倾斜的衍射效率,而方向 的衍射区域A和B的衍射效率的倾斜相反。 具体而言,衍射区域A的左侧的衍射效率比图中右侧的衍射效率高。 相反,衍射区域B的衍射效率比图中左侧的衍射效率高于左侧。 该技术可以应用于光盘驱动器。 版权所有(C)2009,JPO&INPIT

    Semiconductor device, laser light-emitting device, and method of manufacturing semiconductor device
    17.
    发明专利
    Semiconductor device, laser light-emitting device, and method of manufacturing semiconductor device 审中-公开
    半导体器件,激光发光器件及制造半导体器件的方法

    公开(公告)号:JP2008182143A

    公开(公告)日:2008-08-07

    申请号:JP2007015963

    申请日:2007-01-26

    Abstract: PROBLEM TO BE SOLVED: To obtain a spot shape in which a radial/tangential direction is equal on an irradiated field of a beam light even if a spot-shaped beam light whose aspect ratio differs is emitted. SOLUTION: A semiconductor device is used for a laser light-emitting device which irradiates the laser beam to the irradiated field. The semiconductor device includes: a light-emitting element 11 which emits the spot-shaped beam light whose aspect ratio differs; and an element loading side 12a on which the light-emitting element 11 is attached while being inclined to a reference plane by using an optical axis of the beam light as a center of rotation. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:即使发射长宽比不同的点状光束,也可以获得射束的照射场上的径向/切线方向相等的光斑形状。 解决方案:半导体器件用于将激光束照射到照射场的激光发光器件。 半导体器件包括:发光元件11,其发射纵横比不同的点状光束; 以及通过使用光束光的光轴作为旋转中心而倾斜于基准面的元件装载侧12a,其上安装有发光元件11。 版权所有(C)2008,JPO&INPIT

    SEMICONDUCTOR LIGHT EMITTING DEVICE

    公开(公告)号:JPH1022586A

    公开(公告)日:1998-01-23

    申请号:JP18856996

    申请日:1996-06-28

    Applicant: SONY CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor light emitting device using a low-threshold current density and long-life nitride III-V compound semiconductor. SOLUTION: A GaN semiconductor laser is constructed by sequentially depositing an n-type GaN layer 2, an n-type InGaN light absorbing layer 3, an n-type AlGaN clad layer 4, an n-type GaN light waveguide layer 5, an active layer 6 of InGaN, a p-type GaN light waveguide layer 7, a p-type AlGaN clad layer 8, a p-type InGaN light absorbing layer 9 and a p-type GaN layer 10, on a c-surface sapphire substrate 1. The compositional ratio of In of the n-type InGaN light absorbing layer 3 and the p-type InGaN light absorbing layer 9 is higher than that of the active layer 6 of InGaN, such that these n-type InGaN light absorbing layer 3 and the p-type InGaN light absorbing layer 9 absorb light of an emission wavelength.

    SEMICONDUCTOR LIGHT EMITTING DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:JPH09246655A

    公开(公告)日:1997-09-19

    申请号:JP4504896

    申请日:1996-03-01

    Applicant: SONY CORP

    Abstract: PROBLEM TO BE SOLVED: To improve the emission characteristic and prolong the life by avoiding deterioration of the crystallinity of the interface between semiconductor layers due to insertion of a step of forming opening through a current restriction layer. SOLUTION: This device comprises a first-conductivity-type clad layer 5, active layer 7, second-conductivity-type clad layer 9 and current restriction layers 10 disposed on both sides of a current passage, each made of a compd. semiconductor. The layers 10 are a base compd. semiconductor film layer 11 and upper compd. semiconductor layer 12 formed on the layer 11 having a different compsn. from the layer 12 forming a main current constriction layer.

    SEMICONDUCTOR LIGHT EMITTING DEVICE

    公开(公告)号:JPH09167879A

    公开(公告)日:1997-06-24

    申请号:JP34724095

    申请日:1995-12-14

    Applicant: SONY CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor light emitting device of II-VI group compound semiconductor which has a long service life and high reliability. SOLUTION: A stripe-like P-type GaAs current constriction region 2 is formed on a P-type GaAs substrate 1, and an N-type GaAs layer 3 is provided onto both the sides of the current constriction region 2 so as to sandwich the region 2 for the formation of a current constriction structure. The surfaces of the P-type GaAs current constriction region 2 and the N-type GaAs layer 3 are set nearly flat and flush with each other. A P-type ZnSe buffer layer 7, a P-type ZnSSe buffer layer 8, a P-type ZnMgSSe clad layer 9, a P-type ZnSSe optical waveguide layer 10, a ZnCdSe active layer 11, an N-type ZnSSe optical waveguide layer 12, an N-type ZnMgSSe clad layer 13, an N-type ZnSSe layer 14, and an N-type ZnSe contact layer 15 are successively laminated on the the P-type GaAs current constriction region 2 and the N-type GaAs layer 3 through the intermediary of a P-type GaAs layer 4, a P-type GaInP layer 5, and a P-type AlInP layer 6 for the formation of a laser structure.

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