Abstract:
Described herein is a fuse device (1) having a fuse element (2) provided with a first terminal (10) and a second terminal (16) and an electrically breakable region (15a), which is arranged between the first terminal (10) and the second terminal (16) and is configured to undergo breaking as a result of the supply of a programming electrical quantity, thus electrically separating the first terminal (10) from the second terminal (16). The electrically breakable region (15a) is of a phase-change material, in particular a calcogenic material, for example GST.
Abstract:
A method and apparatus for programming a phase change memory cell (2) is disclosed. A phase change memory cell (2) includes a memory element (10) of a phase change material having a first state ("11"), in which the phase change material is crystalline and has a minimum resistance level, a second state ("00") in which the phase change material is amorphous and has a maximum resistance level, and a plurality of intermediate states with resistance levels there between. The method includes using programming pulses to program the phase change memory cell (2) in either the set, reset, or one of the intermediate states. To program in the intermediate states, a programming pulse creates a crystalline percolation path having an average diameter (D) through amorphous phase change material and a second programming pulse modifies the diameter (D) of the crystalline percolation path to program the phase change memory cell to the proper current level.
Abstract:
A vertical MOSFET transistor, formed in a body (13) of semiconductor material having a surface and housing a buried conductive region (19) of a first conductivity type; a channel region (29) of a second conductivity type, arranged on top of the buried conductive region; a surface conductive region (26, 35c) of the first conductivity type, arranged on top of the channel region (29) and the buried conductive region (19); a gate insulation region (22), extending at the sides of and contiguous to the channel region (29); and a gate region (23, 35d) extending at the sides of and contiguous to the gate insulation region (22).