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    METHOD AND APPARATUS FOR POLYCONDENSATION OF POLYAMIDE
    12.
    发明专利
    METHOD AND APPARATUS FOR POLYCONDENSATION OF POLYAMIDE 失效

    公开(公告)号：JPS5690832A

    公开(公告)日：1981-07-23

    申请号：JP16754479

    申请日：1979-12-25

    Applicant: UBE INDUSTRIES

    Inventor： KANEDA TAKAHO ,  OOIZUMI KIYOUHEI ,  ISHIKAWA SEIJI

    IPC: C08G69/00 ,  C08G69/04 ,  C08G69/32

    Abstract: PURPOSE:To obtain effectively the titled rigid polyamide, by a method wherein an acid chloride is added to a solvent contg. an amine dissolved therein and a polycondensation reaction is conducted at different stirring rates in the initial stage and in the end stage of the reaction in a reaction tank equipped with a stirrer and provided with a projected part at the central part of the bottom of the tank. CONSTITUTION:Within a cylindrical container 1 is provided a reaction tank 4 equipped with a stirrer which is provided with agitating elements 3 revolving on a vertical shaft 2. At the central part of the bottom 5 of the tank 4 is provided a projected part 6 in such a manner that the diameter d of the bottom of the projected part is 20-60% of the diameter D of the bottom of the reaction tank 4, an angle theta of inclination of projected part 6 is at least 20 deg., and the height h of the projected part is 3% or more of the depth H of the reaction tank. In this reaction tank, a polycondensation reaction is conducted by adding an acid chloride to a solvent contg. an amine dissolved therein. In the initial stage, the stirring rate is kept at a peripheral speed of 1.5m/sec or faster. In the end stage in which the reaction mixt. is in the form of millet jelly, the stirring rate is reduced to 1.5m/sec or slower. In this way the polycondensation of rigid arom. polyamide is effectively conducted.

    COPOLYAMIDE FILAMENT YARNS AND THEIR PRODUCTION
    13.
    发明专利
    COPOLYAMIDE FILAMENT YARNS AND THEIR PRODUCTION 失效

    公开(公告)号：JPS5482427A

    公开(公告)日：1979-06-30

    申请号：JP14656577

    申请日：1977-12-08

    Applicant: UBE INDUSTRIES

    Inventor： KANEDA TAKAHO ,  ISHIKAWA SEIJI ,  HONDOU TADAHIRO ,  UEDA MASAHIRO

    IPC: D01F6/80 ,  D01F6/60

    Abstract: PURPOSE:Filament yarns having high initial modlus and tenacity, made from a wholly aromatic copolyamide consisting of specific sturctural units. CONSTITUTION:A solution of a copolyamide consisting substantially of units of formula I: (X is CO or SO2) and units of formula II and III in substantially equimolar amounts of units of formula III and formula I and II at a molar ratio of the units of formulas (I) to (II) of 10:90-50:50 in >=98% conc. sulfuric acid is spun into filament yarns having an inital modulus >=400g/dl and a tenacity >=16g/ dl. The copolyamide has an inherent viscosity >=2.0 dl/g, preferably >=3.0dl/g measured by using a 0.5g/dl solution in conc. sulfuric acid at 30 deg.C.

    METHOD FOR PRODUCING POLYIMIDE POLYMER, COMPOSITION FOR POLYIMIDE-BASED INSULATION FILM
    16.
    发明专利
    METHOD FOR PRODUCING POLYIMIDE POLYMER, COMPOSITION FOR POLYIMIDE-BASED INSULATION FILM 失效

    公开(公告)号：JP2002012664A

    公开(公告)日：2002-01-15

    申请号：JP2000195883

    申请日：2000-06-29

    Applicant: UBE INDUSTRIES

    Inventor： ISHIKAWA SEIJI ,  MATSUI YUJI

    IPC: C08K3/00 ,  C08G73/10 ,  C08K5/00 ,  C08K5/29 ,  C08L63/00 ,  C08L79/08 ,  C09D5/25 ,  C09D179/08 ,  H01B3/30

    Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a polyimide polymer by which the rise in the viscosity of the polymer liquid is controlled to prevent the polymer liquid from winding around a stirrer on the production of the polyimidosiloxane and which does not need a special operation for lowering the viscosity during the process. SOLUTION: This method for producing the polyimide copolymer, characterized by carrying out the copolymerization of (a) a tetracarboxylic acid component capable of giving the heat-resistant polyimide with a diamine component comprising (b) a diaminopolysiloxane, (c) an aromatic diamine having a polar group, and, if necessary, (d) an aromatic diamine having plural benzene rings in an organic solvent under the flow of humidified nitrogen in a reaction vessel equipped with a stirrer.

    PLASMA ETCHING RESIST AND ETCHING METHOD
    17.
    发明专利
    PLASMA ETCHING RESIST AND ETCHING METHOD 失效

    公开(公告)号：JP2001125273A

    公开(公告)日：2001-05-11

    申请号：JP30843499

    申请日：1999-10-29

    Applicant: UBE INDUSTRIES

    Inventor： ISHIKAWA SEIJI ,  NISHIO KAZUAKI ,  YAMAMOTO SHIGERU ,  TAGUCHI MITSUSHI

    IPC: G03F7/075 ,  C08G73/10 ,  G03F7/037 ,  G03F7/36

    Abstract: PROBLEM TO BE SOLVED: To provide an etching resist capable of plasma etching and to provide an etching method using the resist. SOLUTION: The plasma etching resist contains (1) an end-half-esterified siloxane oligomer, (2) a photosensitive monomer, (3) a photopolymerization initiator, (4) a fine inorganic filler and (5) a solvent. The proportions of the components 2-5 are 0.1-300 pts.wt., 0.01-30 pts.wt., 1-100 pts.wt. and 0-200 pts.wt., respectively, based on 100 pts.wt. of the component 1.

    FLEXIBLE CIRCUIT BOARD
    18.
    发明专利
    FLEXIBLE CIRCUIT BOARD 失效

    公开(公告)号：JP2000244083A

    公开(公告)日：2000-09-08

    申请号：JP4106099

    申请日：1999-02-19

    Applicant: UBE INDUSTRIES

    Inventor： INOUE HIROSHI ,  YAMAMOTO TOMOHIKO ,  UEKIDO TAKESHI ,  ISHIKAWA SEIJI ,  YASUNO HIROSHI

    IPC: H05K1/03 ,  C08G73/10 ,  C08J5/18 ,  H01B3/30

    Abstract: PROBLEM TO BE SOLVED: To provide a flexible circuit board wherein an insulating film which can realize high density pattern and positioning when a semiconductor is mounted is excellent in heat resistance, dimentional stability and workability, a circuit is formed on the insulating film, and a coating layer excellent in insulating properties is formed. SOLUTION: A conductor is laminated on at least one side of an aromatic polyimide film which is composed of polyimide whose main component is biphenyl tetracarboxylic acid group and phenylenediamine, and whose thickness is 5-150 μm, elongation is 45-90%, tensile elastic modulus is 550-1300 kg/mm2 and tearing propagation resistance (Elmendorf) is 350-1500 g/mm, and a circuit is formed. Coating material is spread and dried, and a coating layer where warp is at least 25 mm and corrosion due to tin plating is at most 250 mm is formed.

    PRODUCTION OF POLYETHER SULFONE
    20.
    发明专利
    PRODUCTION OF POLYETHER SULFONE 失效

    公开(公告)号：JPH06263872A

    公开(公告)日：1994-09-20

    申请号：JP5561293

    申请日：1993-03-16

    Applicant: UBE INDUSTRIES

    Inventor： KIUCHI MASAYUKI ,  OZAWA HIDEO ,  ISHIKAWA SEIJI ,  NAKATANI MASAYUKI

    IPC: C08G75/23 ,  C08G75/00

    Abstract: PURPOSE:To obtain a polyether sulfone small in a contact of residues such as solvent and unreacted monomer at good efficiency by feeding a polyether sulfone to an extruder provided with a vacuum vent hole and melt-extruding the polymer while pouring water between the compression melting zone of the extruder and the vent hole. CONSTITUTION:The production process of the polyether sulfone comprises feeding a polyether sulfone to an extruder provided with a vacuum vent hole and melt-extruding the polymer while pouring water between the compression melting zone of the extruder and the vent hole. According to this process, residues such as solvent, unreacted monomer and oligomer can be removed at good efficiency from the polyether sulfone separated from the reaction solution, and therefore, a polyaryl ether less colored and excellent in heat resistance and mechanical strengths can be produced.

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