3D NAND FLASH MEMORY DEVICES AND RELATED ELECTRONIC SYSTEMS

    公开(公告)号:US20230143421A1

    公开(公告)日:2023-05-11

    申请号:US18148684

    申请日:2022-12-30

    Abstract: A microelectronic device comprises local digit line structures, global digit line structures, source line structures, sense transistors, read transistors, and write transistors. The local digit line structures are coupled to strings of memory cells. The global digit line structures overlie the local digit line structures. The source line structures are interposed between the local digit line structures and the global digit line structures. The sense transistors are interposed between the source line structures and the global digit line structures, and are coupled to the local digit line structures and the source line structures. The read transistors are interposed between and are coupled to the sense transistors and the global digit line structures. The write transistors are interposed between and are coupled to the global digit line structures and the local digit line structures. Additional microelectronic devices, memory devices, and electronic systems are also described.

    PROCESS FOR MANUFACTURING A MICROELECTROMECHANICAL INTERACTION SYSTEM FOR A STORAGE MEDIUM
    17.
    发明申请
    PROCESS FOR MANUFACTURING A MICROELECTROMECHANICAL INTERACTION SYSTEM FOR A STORAGE MEDIUM 审中-公开
    用于制造存储介质的微电子交互系统的方法

    公开(公告)号:US20160332871A1

    公开(公告)日:2016-11-17

    申请号:US15220267

    申请日:2016-07-26

    Abstract: A process for manufacturing an interaction system of a microelectromechanical type for a storage medium, the interaction system provided with a supporting element and an interaction element carried by the supporting element, envisages the steps of: providing a wafer of semiconductor material having a substrate with a first type of conductivity and a top surface; forming a first interaction region having a second type of conductivity, opposite to the first type of conductivity, in a surface portion of the substrate in the proximity of the top surface; and carrying out an electrochemical etch of the substrate starting from the top surface, the etching being selective with respect to the second type of conductivity, so as to remove the surface portion of the substrate and separate the first interaction region from the substrate, thus forming the supporting element.

    Abstract translation: 一种用于制造用于存储介质的微机电类型的相互作用系统的方法,具有支撑元件的相互作用系统和由支撑元件承载的相互作用元件,其设想是提供具有基板的半导体材料晶片,其具有 第一类导电性和顶面; 在所述顶表面附近的所述衬底的表面部分中形成具有与所述第一类型导电性相反的第二导电类型的第一相互作用区域; 并且从顶表面开始进行基板的电化学蚀刻,蚀刻相对于第二类型的导电性是选择性的,以便去除基板的表面部分并将第一相互作用区域与基板分离,从而形成 支撑元件。

    METHOD FOR GENERATING NANO PATTERNS UPON MATERIAL SURFACES
    18.
    发明申请
    METHOD FOR GENERATING NANO PATTERNS UPON MATERIAL SURFACES 有权
    在材料表面上生成纳米图案的方法

    公开(公告)号:US20090272172A1

    公开(公告)日:2009-11-05

    申请号:US12431213

    申请日:2009-04-28

    Abstract: The present invention discloses a method for generating nano patterns upon material surfaces. The method for generating nano patterns upon material surfaces comprises the following steps: providing a thin film capable of controlling lattice directions, applying a nanoindentation action to the thin film to generate an indentation at a specific position on the thin film. At least one hillock is then generated in a specific direction to generate a pattern and to be applied to a data storage system.

    Abstract translation: 本发明公开了一种在材料表面上产生纳米图案的方法。 在材料表面上产生纳米图案的方法包括以下步骤:提供能够控制晶格方向的薄膜,对薄膜施加纳米压痕作用以在薄膜上的特定位置产生凹陷。 然后在特定方向上产生至少一个小丘以产生模式并应用于数据存储系统。

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