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    Optimized curvilinear variable axis lens doublet for charged particle beam projection system
    11.
    发明授权
    Optimized curvilinear variable axis lens doublet for charged particle beam projection system 失效
    用于带电粒子束投影系统的优化曲线可变轴透镜双峰

    公开(公告)号：US06617585B1

    公开(公告)日：2003-09-09

    申请号：US09577475

    申请日：2000-05-24

    Applicant: Werner Stickel

    Inventor： Werner Stickel

    IPC: H01J3709

    CPC classification number: H01J37/141 ,  H01J9/00 ,  H01J2237/04922 ,  H01J2237/04928 ,  H01J2237/1405 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/31777

    Abstract: This is a method for designing an optimized charged particle beam projection system. Specify lens configuration and first order optics. Calculate lens excitations. Configure the lens system, providing lens field distributions, beam landing angle, and imaging ray/axis cross-over. Provide an input deflector configuration. Solve a linear equation set, and thereby provide a curvilinear axis and associated deflection field distributions. Calculate the third order aberration coefficients yielding a list of up to 54 aberration coefficients. Provide an input of dynamic correctors. Calculate excitations to eliminate quadratic aberrations in deflection. Calculate third and fifth order aberrations, providing image blur and distortion vs. deflection, best focal plane, and depth of focus. Determine whether the current result is better than the previous result. If YES then change the axial location input to the solve linear equation set. If NO, test whether the current result is acceptable. If NO, provide a deflector configuration. If YES, test whether the deflection current is larger. If YES, change the input for the axial location of the deflectors to solve the linear equation set again. If NO then END the process.

    Abstract translation: 这是设计优化的带电粒子束投影系统的方法。 指定镜头配置和一阶光学。 计算镜头激发。 配置镜头系统，提供镜头场分布，光束着陆角度和成像光线/轴交叉。 提供输入偏转器配置。 求解线性方程组，从而提供曲线轴和相关的偏转场分布。 计算三阶像差系数，得到最多54个像差系数的列表。 提供动态校正器的输入。 计算激发以消除偏转中的二次像差。 计算第三和第五阶像差，提供图像模糊和失真与偏转，最佳焦平面和焦深。 确定当前结果是否比以前的结果更好。 如果是，则将轴向位置输入改为求解线性方程组。 如果否，则检查当前结果是否可以接受。 如果否，请提供偏转器配置。 如果是，则检查偏转电流是否较大。 如果是，则更改偏转器的轴向位置的输入，以再次求解线性方程组。 如果否，则END过程。

    Curvilinear variable axis lens correction with crossed coils
    12.
    发明授权
    Curvilinear variable axis lens correction with crossed coils 失效
    带交叉线圈的曲线可变轴透镜校正

    公开(公告)号：US5708274A

    公开(公告)日：1998-01-13

    申请号：US769084

    申请日：1996-12-18

    Applicant: Guenther O. Langner ,  Werner Stickel

    Inventor： Guenther O. Langner ,  Werner Stickel

    IPC: H01J37/141 ,  H01J37/153 ,  H01J37/14

    CPC classification number: H01J37/153 ,  H01J37/141 ,  H01J2237/04922 ,  H01J2237/04928

    Abstract: A charged particle lens has an axis that is shifted to follow the central ray of the beam as it is deflected through the lens creating, in effect, a variable curvilinear optical axis for the lens and introducing aberrations having depending on the object size and the distance off the lens symmetry axis. These aberrations are corrected by a set of coil pairs tilted with respect to the system axis, which generate compensating aberrations of the same type.

    Abstract translation: 带电粒子透镜具有在被偏转穿过透镜时沿着光束的中心光线移动的轴，实际上产生用于透镜的可变曲线光轴并引入具有取决于物体尺寸和距离的像差 离开镜头对称轴。 这些像差由相对于系统轴倾斜的一组线圈对来校正，这产生相同类型的补偿像差。

    Illumination deflection system for E-beam projection
    15.
    发明授权
    Illumination deflection system for E-beam projection 失效
    用于电子束投影的照明偏转系统

    公开(公告)号：US6005250A

    公开(公告)日：1999-12-21

    申请号：US138595

    申请日：1998-08-22

    Applicant: Werner Stickel ,  Steven Douglas Golladay

    Inventor： Werner Stickel ,  Steven Douglas Golladay

    IPC: H01L21/027 ,  G03F7/20 ,  H01J37/30 ,  H01J37/09

    CPC classification number: H01J37/3007 ,  H01J2237/04928 ,  H01J2237/3175

    Abstract: An electron beam projection system comprises a source of an electron beam, a first doublet of condenser lenses with a first symmetry plane, a first aperture comprising a trim aperture located at the first symmetry plane of the first doublet also serving as a first blanking aperture. A second aperture comprises a shaping aperture located below the trim aperture. A second doublet of condenser lenses with a second symmetry plane is located below the second aperture, the second doublet having a symmetry plane. A third aperture is located at the symmetry plane of the second doublet wherein the third aperture comprises another blanking aperture. There are first blanking plates between the first condenser lens and the trim aperture, and second electrostatic alignment plates between the trim aperture and the second aperture. The second doublet comprises a pair of illuminator lenses including deflectors coaxial therewith and located inside the radius of the lenses and shielding rings located along the inner surfaces of the lenses, and correctors located coaxial with the deflectors and inside or outside of the radii thereof including stigmators, focus coils and a hexapole.

    Abstract translation: 电子束投影系统包括电子束源，具有第一对称平面的聚光透镜的第一双重透镜，第一孔包括位于第一双峰的第一对称平面处的微调孔，其也用作第一消隐孔。 第二孔包括位于修剪孔下方的成形孔。 具有第二对称平面的第二个具有第二对称平面的聚光透镜位于第二孔的下方，第二双峰具有对称平面。 第三孔位于第二双层的对称平面处，其中第三孔包括另一消隐孔。 在第一聚光透镜和调节孔之间存在第一遮挡板，以及在修剪孔和第二孔之间的第二静电对准板。 第二双层包括一对照明器透镜，其包括与其同轴的偏转器，位于透镜的半径内并且沿着透镜的内表面定位的屏蔽环，以及与偏转器同轴并且其半径的内部或外部的校正器包括标示器 ，聚焦线圈和六极。

    Particle beam, in particular ionic optic imaging system
    16.
    发明授权
    Particle beam, in particular ionic optic imaging system 失效
    粒子束，特别是离子光学成像系统

    公开(公告)号：US5801388A

    公开(公告)日：1998-09-01

    申请号：US669481

    申请日：1996-09-17

    Applicant: Gerhard Stengl ,  Alfred Chalupka ,  Herbert Vonach

    Inventor： Gerhard Stengl ,  Alfred Chalupka ,  Herbert Vonach

    IPC: H01J37/12 ,  H01J37/30 ,  H01J37/305 ,  H01L21/027

    CPC classification number: H01J37/3007 ,  H01J37/12 ,  H01J2237/04924 ,  H01J2237/04928 ,  H01J2237/31755

    Abstract: A particle beam, in particular in ionic on the reproduction system, preferably for lithographic purposes, has a particle source, in particular an ion source for reproducing on a wafer a structure designed in a masking foil as one or several transparent spots, in particular openings, through at least two electrostatic lenses arranged upstream of the wafer. One of the lenses is a grating lens constituted by one or two tubular electrodes and by a perforated plate arranged in the path of the beam perpendicularly to the optical axis. The plate is formed by a masking foil which forms the central or first electrode of the granting lens, in the direction of propagation of the beam.

    Abstract translation: PCT No.PCT / AT95 / 00003 Sec。 371日期1996年9月17日 102（e）1996年9月17日PCT 1995年1月12日PCT PCT。 公开号WO95 / 19637 日期1995年7月20日粒子束，特别是在再生系统上的离子，优选用于光刻目的，具有粒子源，特别是用于在晶片上再现设计在掩模箔中的结构作为一个或多个透明的离子源 斑点，特别是开口，通过布置在晶片上游的至少两个静电透镜。 其中一个透镜是由一个或两个管状电极和布置在垂直于光轴的光束路径中的多孔板构成的光栅透镜。 该板由掩模箔形成，该掩模箔沿着光束的传播方向形成准许透镜的中心或第一电极。

    MULTI-BEAM SOURCE
    20.
    发明申请
    MULTI-BEAM SOURCE 有权
    多波束源

    公开(公告)号：US20090026389A1

    公开(公告)日：2009-01-29

    申请号：US12178153

    申请日：2008-07-23

    Applicant: Elmar Platzgummer

    Inventor： Elmar Platzgummer

    IPC: A61N5/00

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/3045

    Abstract: A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

    Abstract translation: 一种用于产生能量带电粒子的多个子束的多光束源。 多光束源包括产生带电粒子的照明光束的照明系统，以及沿着光束的方向被布置在照明系统之后的束形成系统，适于在多个远心或同心圆的子束之外形成 照明光束。 光束形成系统包括分光器和电区设备，电区具有由多个基本上平面的部分电极组成的复合电极，其适于施加不同的静电电势并因此影响子束。

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