Photosensitive resin composition and method for the formation of a resin pattern using the composition
    193.
    发明授权
    Photosensitive resin composition and method for the formation of a resin pattern using the composition 有权
    感光树脂组合物和使用该组合物形成树脂图案的方法

    公开(公告)号:US07504191B2

    公开(公告)日:2009-03-17

    申请号:US10768859

    申请日:2004-01-30

    Abstract: A photosensitive resin composition and a method for the formation of a resin pattern using the photosensitive resin composition are provided. The photosensitive resin composition contains, as a catalyst precursor, a catalytic metal element with a metal-deposition catalytic activity suitable for electroless metal plating. The method for the formation of a resin pattern uses a photosensitive resin composition, which contains, as a catalyst precursor, a catalytic metal element with a metal-deposition catalytic activity suitable for electroless metal plating. By using the method of this invention, it is possible to form a conductive film selectively on a resin pattern formed through exposure and development of the photosensitive resin composition of this invention.

    Abstract translation: 提供感光性树脂组合物和使用该感光性树脂组合物形成树脂图案的方法。 作为催化剂前体,感光性树脂组合物含有适用于化学镀金属的金属沉积催化活性的催化金属元素。 形成树脂图案的方法使用含有作为催化剂前体的具有适用于化学镀金属的金属沉积催化活性的催化金属元素的感光性树脂组合物。 通过使用本发明的方法,可以在通过本发明的感光性树脂组合物的曝光和显影形成的树脂图案上选择性地形成导电膜。

    Metal Film Formation Method of Metal Film
    194.
    发明申请
    Metal Film Formation Method of Metal Film 审中-公开
    金属膜金属成膜方法

    公开(公告)号:US20090004465A1

    公开(公告)日:2009-01-01

    申请号:US11813839

    申请日:2006-01-13

    Abstract: The present invention provides a metal film formed by applying an electroless plating catalyst or its precursor to a polymer layer on a base plate having a surface roughness of 500 nm or less and then carrying out electroless plating, the polymer layer containing a polymer which has a functional group capable of interacting with the electroless plating catalyst or its precursor and is chemically bonded directly to the base plate, wherein the adhesion strength between the base plate and the metal film is 0.2 kN/m or more.

    Abstract translation: 本发明提供一种金属膜,该金属膜是通过将化学镀催化剂或其前体施加到表面粗糙度为500nm以下的基板上的聚合物层上,然后进行无电解电镀而形成的,该聚合物层含有具有 能够与化学镀催化剂或其前体相互作用并与基板直接化学键合的官能团,其中基板和金属膜之间的粘合强度为0.2kN / m以上。

    Method for making an integrated circuit substrate having embedded passive components
    196.
    发明授权
    Method for making an integrated circuit substrate having embedded passive components 有权
    制造具有嵌入式无源元件的集成电路基板的方法

    公开(公告)号:US07334326B1

    公开(公告)日:2008-02-26

    申请号:US11078833

    申请日:2005-03-11

    Abstract: A method for making an integrated circuit substrate having embedded passive components provides a reduced cost and compact package for a die and one or more passive components. An insulating layer of the substrate is embossed or laser-ablated to generate apertures for insertion of a paste forming the body of the passive component. A resistive paste is used to form resistors and a dielectric paste is used for forming capacitors. A capacitor plate may be deposited at a bottom of the aperture by using a doped substrate material and activating only the bottom wall of the aperture, enabling plating of the bottom wall without depositing conductive material on the side walls of the aperture. Vias may be formed to the bottom plate by using a disjoint structure and conductive paste technology. Connection to the passive components may be made by conductive paste-filled channels forming conductive patterns on the substrate.

    Abstract translation: 制造具有嵌入式无源元件的集成电路基板的方法为芯片和一个或多个无源部件提供了降低的成本和紧凑的封装。 衬底的绝缘层被压花或激光烧蚀以产生用于插入形成被动部件的主体的糊状物的孔。 电阻膏用于形成电阻器,并且使用电介质浆料来形成电容器。 电容器板可以通过使用掺杂的衬底材料沉积在孔的底部,并且仅激活孔的底壁,使得能够电镀底壁而不在孔的侧壁上沉积导电材料。 可以通过使用不相交的结构和导电糊技术将通孔形成到底板。 与无源部件的连接可以由在衬底上形成导电图案的导电糊填充通道制成。

    Method of manufacturing wiring substrate, and wiring substrate
    198.
    发明申请
    Method of manufacturing wiring substrate, and wiring substrate 审中-公开
    制造布线基板和布线基板的方法

    公开(公告)号:US20070014975A1

    公开(公告)日:2007-01-18

    申请号:US11485428

    申请日:2006-07-13

    Applicant: Hiroshi Ota

    Inventor: Hiroshi Ota

    Abstract: The method of manufacturing a wiring substrate comprises the steps of: performing a pattern exposure of a resin layer containing photocatalyst particles, in a shape of a desired wiring pattern so that the photocatalyst particles are exposed at a surface of the resin layer; performing irradiation of radiation to the resin layer having the exposed photocatalyst particles while the resin layer having the exposed photocatalyst particles is immersed in an aqueous solution of a metallic salt so that a photochemical reduction and precipitating of a metal film onto the exposed photocatalyst particles are performed; and forming a conducting layer on the metal film.

    Abstract translation: 制造布线基板的方法包括以下步骤:以所需的布线图案的形式进行含有光催化剂颗粒的树脂层的图案曝光,使得光催化剂颗粒在树脂层的表面露出; 对具有暴露的光催化剂颗粒的树脂层进行辐射照射,同时将具有暴露的光催化剂颗粒的树脂层浸入金属盐的水溶液中,使得金属膜的光化学还原和沉淀到曝光的光催化剂颗粒上 ; 并在金属膜上形成导电层。

    Formation of layers on substrates
    200.
    发明申请
    Formation of layers on substrates 审中-公开
    在基底上形成层

    公开(公告)号:US20050130397A1

    公开(公告)日:2005-06-16

    申请号:US10975499

    申请日:2004-10-29

    Abstract: Disclosed is a method of forming, on the surface of a substrate, a first layer which is suitable for activating a second solid-layer-forming chemical reaction thereon, the method comprising the steps of bringing into contact with the substrate a first liquid which forms a first solid layer thereon, the first liquid comprising an activator for the second solid-layer-forming chemical reaction, characterised in that the first liquid is selected so that the first solid layer adheres to the substrate and is permeable to a second liquid that comprises one or more reagents for the second solid-layer-forming chemical reaction. A second solid layer can then be formed on the substrate by bringing into contact with the first solid layer a second liquid comprising one or more reagents for the second solid-layer-forming reaction.

    Abstract translation: 公开了一种在基板的表面上形成适于在其上激活第二固体层形成化学反应的第一层的方法,所述方法包括以下步骤:与基板接触形成第一液体的步骤 其上的第一固体层,所述第一液体包含用于第二固体层形成化学反应的活化剂,其特征在于,所述第一液体被选择为使得所述第一固体层粘附到所述基底并且可渗透第二液体,所述第二液体包含 用于第二固体层形成化学反应的一种或多种试剂。 然后可以通过与第一固体层接触包含用于第二固体层形成反应的一种或多种试剂的第二液体在基底上形成第二固体层。

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