Abstract:
The specification describes an improved optical fiber produced by a hybrid VAD/MCVD process. The core of the fiber is produced using VAD and the inner cladding layer has a depressed index and is produced using MCVD. In preferred embodiments, the optical power envelope is essentially entirely contained in VAD produced core material and the MCVD produced depressed index cladding material. Optical loss is minimized by confining most of the optical power to the VAD core where OH presence is low, as well as by maximizing the optical power in the un-doped silica region. The MCVD substrate tube material is essentially devoid of optical power.
Abstract:
A method for producing an optical fiber preform according to the present invention includes an etching step of heating a silica-based glass tube using a heat source continuously traversed in the longitudinal direction of the glass tube to etch the inner surface portion of the glass tube containing impurities while an etching gas is allowed to flow into the glass tube. The glass tube has a maximum alkali metal concentration of 500 to 20,000 atomic ppm, a maximum chlorine concentration of 0 to 1000 atomic ppm, and a maximum fluorine concentration of 0 to 10,000 atomic ppm. In the etching step, the maximum temperature of the outer surface of the glass tube is in the range of 1900° C. to 2250° C., and the heating time is set to a time equal to or less than a time (min) given by ( 7 - alkai metal concentration ppm 5000 ) .
Abstract:
A fiber preform, including: a fiber core rod and an outer cladding layer. The ratio of the diameter of the fiber core rod to the diameter of the core layer thereof is 2.1-2.8. The fiber core rod and a small fluorine-doped quartz glass tube are melted to form a core rod assembly. The ratio of the diameter difference between the core rod assembly and the fiber core rod to the diameter of the core layer is 0.5-2.2. The relative refractive index difference of fluorine-doped quartz glass relative to purified quartz glass ΔF is −0.20% to −0.35%. The core rod assembly is arranged with a large purified quartz glass tube, or directly deposited with a SiO2 glass cladding layer. A ratio of an effective diameter of the fiber preform to the diameter of the core rod assembly is 2.0-5.6. Methods for manufacturing the preform and a fiber are also provided.
Abstract:
The present invention relates to a method for manufacturing a preform for optical fibers, wherein deposition of glass-forming compounds on the substrate takes place. The present invention furthermore relates to a method for manufacturing optical fibers, wherein one end of a solid preform is heated, after which an optical fibre is drawn from said heated end.
Abstract:
The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps: providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, and treating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.
Abstract translation:本发明涉及一种用于制造具有增加的H 2含量的合成石英玻璃透镜的方法,特别是用于具有小于250nm,特别是小于200nm的工作波长的光学系统的透镜,步骤 :提供合成石英玻璃的前体产物,特别是具有小于2×1015分子/ cm 3的第一H 2含量,周边边界表面和位于相对侧上的两个基底表面,其中至少一个部分表面至少 所述基面之一具有曲率,并且在含H2气氛中处理前体产物,以便产生具有相对于第一H 2含量增加的第二H 2含量的合成石英玻璃的前体产物,特别是与 大于1016分子/ cm 3的第二H 2含量,并测量所述前体产物与所述第二H 2含量的至少一种光学性质。
Abstract:
The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.
Abstract translation:本发明涉及一种含有TiO2含量为3〜10质量%的含TiO 2的二氧化硅玻璃的光学构件, Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数,CTE0-100,为0±150ppb /℃。 并且在400〜700nm的波长范围内的内部透射率,每1mm厚度,T400〜700,为80%以上,其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值, 在光学用表面上的浓度&Dgr; Ti 3+ / Ti 3+为0.2以下。
Abstract:
To provide an optical component of quartz glass for use in a projection objective for immersion lithography at an operating wavelength below 250 nm, which component is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should contain hydroxyl groups in the range of from 1 wtppm to 60 wtppm and chemically bound nitrogen, and that the mean hydrogen content of the quartz glass should be in the range of 5×1015 molecules/cm to 1×1017 molecules/cm3.
Abstract translation:为了提供石英玻璃的光学部件,用于在250nm以下的工作波长下用于浸没式光刻的投影物镜,该成分被优化用于线偏振UV激光辐射,特别是关于由各向异性密度变化引起的压实和双折射 根据本发明,建议石英玻璃应含有1〜60重量ppm的羟基和化学键合的氮,石英玻璃的平均氢含量应在5×1015的范围内 分子/ cm至1×1017分子/ cm 3。
Abstract:
What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-doped synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.
Abstract:
Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.
Abstract:
To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100° C. and 1200° C. and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heating is carried out at a temperature between 1200° C. and 2000° C. to produce a compact glass body.