나노임프린트 몰드용 티타니아 도핑 석영 유리
    232.
    发明公开
    나노임프린트 몰드용 티타니아 도핑 석영 유리 有权
    TITANIA-DOPED QUARTZ GLAS NANOIMPRINT MOLDS

    公开(公告)号:KR1020080107300A

    公开(公告)日:2008-12-10

    申请号:KR1020080052980

    申请日:2008-06-05

    Abstract: Titania doping quartz glass for molding a nanoimprint is provided to have a low internal transmittance distribution and a low thermal expansion coefficient in a mold and to have a low thermal expansibility. Titania doping quartz glass for molding a nanoimprint has an internal transmittance distribution to an ultraviolet ray of a wavelength 365 nm less than 10% and contains titania having 5-10 mass%. A concentration distribution of the titania is 3 mass% or less and includes no occluded materials. A concentration of chlorine is 500 ppm or less.

    Abstract translation: 提供用于模塑纳米压印的二氧化钛掺杂石英玻璃以在模具中具有低内部透射率分布和低热膨胀系数并具有低热膨胀性。 用于模塑纳米压印的二氧化钛掺杂石英玻璃具有小于10%的波长365nm的紫外线的内部透射率分布,并且包含具有5-10质量%的二氧化钛。 二氧化钛的浓度分布为3质量%以下,不含有堵塞材料。 氯的浓度为500ppm以下。

    티타니아 도핑 석영 유리, EUV 리소그래피용 부재,EUV 리소그래피용 포토마스크 기판 및 티타니아 도핑석영 유리의 제조 방법
    233.
    发明公开
    티타니아 도핑 석영 유리, EUV 리소그래피용 부재,EUV 리소그래피용 포토마스크 기판 및 티타니아 도핑석영 유리의 제조 방법 有权
    TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD,EUV LITHOGRAPHIC MEMBER AND PHOTOMASK SUBSTRATE

    公开(公告)号:KR1020070061414A

    公开(公告)日:2007-06-13

    申请号:KR1020060123770

    申请日:2006-12-07

    Abstract: Titania doped quartz glass for EUV lithographic material is provided to have high homogeneity sufficient to endow excellent surface precision to the lithographic material, and to make EUV lithographic material with planarity or thermal expansion property by comprising titania with desired content and defining specific apparent permeability of the glass. The titania doped quartz glass includes 3-12wt.% of titania with concentration gradient of less than 0.01wt.% /micron. The quartz glass has more than 30% of apparent permeability at 440nm in case thickness of the glass is 6.35mm, and also double refraction of less than 20nm/cm. The quartz glass has average line thermal expansion coefficient of -30 to +30ppb/deg.C at 10-30deg.C, distribution of OH group concentrations less than 400ppm and chlorine concentration of 1-500ppm. The quartz glass does not produce crystalline materials by annealing process at 700deg.C.

    Abstract translation: 提供用于EUV平版印刷材料的二氧化钛掺杂石英玻璃以具有足够高的均匀性以赋予平版印刷材料优异的表面精度,并且通过包含具有期望含量的二氧化钛并且定义具有所需含量的特定表观渗透性来制备具有平面性或热膨胀性质的EUV平版印刷材料 玻璃。 掺杂二氧化钛的石英玻璃包括3-12重量%的浓度梯度小于0.01重量%/微米的二氧化钛。 在玻璃厚度为6.35mm的情况下,石英玻璃在440nm处具有超过30%的表观渗透率,并且双折射小于20nm / cm。 石英玻璃的平均线热膨胀系数为30〜30ppb /℃,10-30℃,OH基浓度分布小于400ppm,氯浓度为1-500ppm。 石英玻璃在700℃退火过程中不会产生结晶材料。

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