반도체 소자의 제조 방법
    21.
    发明公开
    반도체 소자의 제조 방법 审中-实审
    制造半导体器件的方法

    公开(公告)号:KR1020120075037A

    公开(公告)日:2012-07-06

    申请号:KR1020100137056

    申请日:2010-12-28

    Abstract: PURPOSE: A method for manufacturing a semiconductor device is provided to form a semiconductor device with multilayer step profile through a photolithography and an etching process. CONSTITUTION: A stack structure is formed by alternately laminating a plurality of insulating films(20) and conductive films(30) on a substrate(10). The insulating film includes a first insulating film(21), a second insulating film(22), and a third insulating film(23). The conductive film includes a first conductive film(31), a second conductive film(32), and a third conductive film(33). A first photoresist pattern is formed on the stack structure. A second photoresist pattern(43) is formed by thermally processing the first photoresist pattern.

    Abstract translation: 目的:提供一种用于制造半导体器件的方法,以通过光刻和蚀刻工艺形成具有多层台阶轮廓的半导体器件。 构成:通过在基板(10)上交替层叠多个绝缘膜(20)和导电膜(30)而形成堆叠结构。 绝缘膜包括第一绝缘膜(21),第二绝缘膜(22)和第三绝缘膜(23)。 导电膜包括第一导电膜(31),第二导电膜(32)和第三导电膜(33)。 在堆叠结构上形成第一光致抗蚀剂图案。 通过热处理第一光致抗蚀剂图案形成第二光致抗蚀剂图案(43)。

    반도체 기판 및 그 인식 장치
    25.
    发明公开
    반도체 기판 및 그 인식 장치 无效
    半导体基板及其识别装置

    公开(公告)号:KR1020090009056A

    公开(公告)日:2009-01-22

    申请号:KR1020070072493

    申请日:2007-07-19

    Inventor: 김미연 유지용

    CPC classification number: H01L23/544 H01L21/265 H01L21/67294 H01L2223/54433

    Abstract: The semiconductor substrate and recognition apparatus are provided to suppress the generation of particle in the semiconductor substrate and to form a label on the surface of the semiconductor substrate without forming the physical hole. The semiconductor substrate comprises the first area and the second part. The first area is comprised of the labeling region among the semiconductor substrate. The second part is comprised of the part except for the labeling region. The optical characteristic of the first area is different from the optical characteristic of the second part to distinct the first area and the second part. The first area of the semiconductor substrate is automatically acknowledged with the semiconductor substrate recognizing apparatus.

    Abstract translation: 提供半导体衬底和识别装置以抑制半导体衬底中的颗粒的产生并且在不形成物理孔的情况下在半导体衬底的表面上形成标签。 半导体衬底包括第一区域和第二部分。 第一区域由半导体衬底中的标记区域组成。 第二部分由除标签区域外的部分组成。 第一区域的光学特性与第二部分的光学特性不同,以区分第一区域和第二部分。 半导体衬底识别装置自动确认半导体衬底的第一区域。

    레티클 암 및 이를 갖는 노광 장치
    26.
    发明公开
    레티클 암 및 이를 갖는 노광 장치 无效
    具有相同的装置和装置

    公开(公告)号:KR1020060129772A

    公开(公告)日:2006-12-18

    申请号:KR1020050050419

    申请日:2005-06-13

    CPC classification number: G03F7/70733 G03F7/707 G03F7/70916

    Abstract: A reticle arm and an exposure apparatus having the same are provided to reduce a time for preparing reticle by loading and arranging a plurality of reticles on a plurality of reticle arms. A reticle arm includes a first connection part(1410), a supporting part(1420), and a second connection part(1430). The first connection part is connected with a rail. The supporting part is connected with the first connection part. The second connection part is projected from the supporting part and is fixed to a lateral face of the reticle. The second connection part and the supporting part are integrated. The second connection part is inserted into a concave part which is formed on the lateral face of the reticle.

    Abstract translation: 提供了一种掩模版臂和具有该掩模版臂的曝光设备,以通过在多个掩模版臂上装载和布置多个掩模版来减少准备掩模版的时间。 标线臂包括第一连接部分(1410),支撑部分(1420)和第二连接部分(1430)。 第一连接部分与导轨连接。 支撑部与第一连接部连接。 第二连接部从支撑部突出并固定在标线的侧面。 第二连接部和支撑部被集成。 第二连接部被插入形成在标线片的侧面上的凹部中。

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