Abstract:
광 감지 센서는, 제1 인터디지테이티드(interdigitated) 전극; 제2 인터디지테이티드 전극; 및 상기 제1 인터디지테이티드 전극 및 상기 제2 인터디지테이티드 전극 각각과 접촉하는 광전도층을 포함할 수 있다. 상기 광전도층에 입사된 입사광에 의해, 상기 제1 인터디지테이티드 전극과 상기 광전도층의 계면 및 상기 제2 인터디지테이티드 전극과 상기 광전도층의 계면에 표면 플라즈몬 플라리톤(surface plasmon polariton)이 여기될 수 있다. 표면 플라즈몬 폴라리톤에 의하여 광전도층의 광흡수가 특정 파장 대역에서 증폭될 수 있으며, 이를 이용하여 해당 파장 대역에서 광흡수를 나타내는 물질을 민감하게 감지할 수 있다.
Abstract:
An optical detection sensor includes a first interdigitated electrode; a second interdigitated electrode; and an optical conduction layer which is in contact with each of the first and second interdigitated electrodes. Due to incident light inputted into the optical conduction layer, surface plasmon polaritons can be excited on the interface between the first interdigitated electrode and optical conduction layer, and interface between the second interdigitated electrode and optical conduction layer. The optical absorption of the optical conduction layer can be amplified at a specific wavelength range due to the surface plasmon polaritons and a material which shows optical absorption in the corresponding wavelength range can be sensitively detected using the same.
Abstract:
The present invention relates to a sunlight collecting apparatus. According to the present invention, the sunlight collecting apparatus comprises a solar focusing unit to which sunlight is incident; a multiplex solar energy collecting unit which is disposed at the bottom of the sunlight focusing unit and arranged in the form of an array by equally dividing a plurality of unit condensates; and a solar cell panel unit which is disposed at the bottom of the multiplex solar energy collecting unit to be in parallel with the solar focusing unit and generates electrical power by the light emitted from the multiplex solar energy collecting unit.
Abstract:
An attenuated total reflection (ATR) type waveguide mode resonance sensor comprises a waveguide layer being in contact with a sample and formed of nanocrystalline diamond (NCD). The incident angle of incident light causing standing waves on the waveguide layer can be measured by the incident light entered into the ATR type waveguide mode resonance sensor. The waveguide formed of the NCD is formed by a hot filament chemical vapor deposition process using hydrocarbon-containing material gas. At this time, the crystal grain size of the NCD can be controlled by adjusting at least one among a substance temperature, a distance between a filament and a substance, and a hydrocarbon rate contained in the material gas. [Reference numerals] (AA) P-wave / TM mode; (BB) S-wave / TE mode
Abstract:
PURPOSE: A manufacturing method of a nano-structure array and a device including the nano-structure array are provided to improve the sensitivity and the reliability of a sensor including the nano-structure array. CONSTITUTION: A manufacturing method of a nano-structure array includes the following steps: a stacked structure of a substrate, a resist layer, and a focusing layer is irradiated with light to be focused; the focused light patterns resist on the resist layer; and a material forming a nano-structure array is stacked on the patterned resist layer to form a nano-structure array. The resist layer includes a resist material layer and an undercut forming layer.
Abstract:
본 발명의 일 실시예에 따른 귀금속의 플라즈마 이온주입 장치가 제공된다. 귀금속의 플라즈마 이온주입 장치는, 내부를 진공 상태로 유지하는 진공조와, 박막증착을 위해 진공조 내부에 배치되고 귀금속 스퍼터링 타겟이 장착되는 마그네트론 증착원과, 진공조 내에서 마그네트론 증착원에 대향하도록 배치되어 시료가 장착되는 시료장착대와, 마그네트론 증착원에 펄스직류전력을 인가하여 마그네트론 증착원으로부터 스퍼터링되는 귀금속을 이온화시키는 펄스직류 전원장치와, 시료장착대에 펄스직류전력에 동기화된 고전압펄스를 인가하여 귀금속의 이온들을 시료 쪽으로 가속시키는 고전압펄스 전원장치를 포함한다.
Abstract:
PURPOSE: A method for growing a ZnO thin film, a thin film solar cell using the same, and a method for manufacturing the thin film solar cell are provided to prevent a void and a crack in a silicon thin film deposition process by making the surface of the ZnO thin film with a U-shape. CONSTITUTION: Textures in a (0002) direction and a (1120) direction are simultaneously grown by controlling a deposition temperature, a deposition pressure, or the injection ratio of precursors. The deposition temperature is controlled between 90 and 150 degrees centigrade. The deposition pressure is controlled between 0.1 and 10 torr. The precursor is made of oxygen materials and zinc materials.