Abstract:
PURPOSE: A bump electrode structure of a semiconductor device and a manufacturing method thereof are provided to prevent a short phenomenon, to secure the insulation property of a non-conductive adhesive, and to obtain the high reliability of an anisotropic conductive adhesive in a fine pitch condition. CONSTITUTION: A bump(120) is formed on the upper side of a semiconductor(110). At least one or more protruding cores(130) are formed on the upper side of the bump and are made of polymer materials with a thermosetting property or a thermoplastic property. The width of the protruding core is 1 to 10 um. A metal layer(150) is formed on the upper sides of the protruding core and the bump. The metal layer is contacted with an electrode of a substrate or another semiconductor device.
Abstract:
PURPOSE: A method and apparatus for connecting electronic parts using a high frequency electromagnetic field are provided to heat a specific component which is contained in an interposer and a polymeric adhesive by applying a high frequency to an adhesive included in an electronic component to heat the adhesive. CONSTITUTION: An adhesive to be used in adhesion is arranged in an electronic component. The adhesive is heated using an applied high frequency. The applied high frequency simultaneously contacts a microwave electrode. The applied high frequency heats an interposer layer. The interposer layer includes one or more which are selected from components having a chemical dipole, metal, and a ferromagnetic material. [Reference numerals] (AA) Component alignment; (BB) Applying a high frequency or applying/pressurizing the high frequency
Abstract:
PURPOSE: An adhesive composition and a preparation method of wafer level package using the composition are provided to reduce processing steps of manufacturing wafer level package. CONSTITUTION: An adhesive composition comprises a compound of chemical formula 1, a compound of chemical formula 2, or a mixture thereof. A manufacturing method of a wafer level package of comprises the following steps: spreading the wafer adhesive composition on wafer; forming a pattern by exposing the adhesive composition; dicing the wafer to individual chips; and bonding the individual chips on the circuit board by thermosetting.
Abstract:
본 발명은 터치 스크린 패널의 배선 구조 및 터치 스크린 패널의 배선 형성 방법에 관한 것으로서, 보다 구체적으로는 베젤 부분 아래에 은 페이스트 배선을 사용하지 않고 전면에 ITO 또는 전도성 고분자와 같은 투명 전극을 이용하여 3차원 배선을 하는 구조를 제공하여, 베젤 부분의 최소화 및 제거가 가능한 터치 스크린 패널의 배선 구조 및 터치 스크린 패널의 배선 형성 방법에 관한 것이다.
Abstract:
라디칼 트랩 성분을 함유하는 전자부품 접속용 접착조성물이 제공된다. 본 발명에 따른 전자부품 접속용 접착조성물은 열가소성 수지, 열경화성 수지 및 경화제를 포함하는 전자부품 접속용 접착조성물로, 상기 경화제는 상기 열경화성 수지의 경화를 개시하기 위한 라디칼을 발생시키며, 상기 조성물은 상기 라디칼을 소모시키기 위한 라디칼 트랩 성분을 더 포함하는 것을 특징으로 하며, 본 발명에 따른 전자부품 접속용 접착조성물은 라디칼에 의하여 중합되는 열경화성 수지와 라디칼 트랩성분을 동시에 갖는다. 상기 첨가되는 라디칼 트랩 성분은 보관 도중 발생하는 라디칼과 결합하여, 라디칼을 소모시키나, 열접착 과정에서 다량 발생하는 라디칼은 전량 소모시키기 어려운 수준으로 첨가된다. 이에 따라, 열접착 공정 온도 미만에서는 접착조성물의 경화가 진행되지 않으므로, 접착조성물의 안정된 보관이 가능하다. 반면, 접착 공정이 진행되는 온도에서는 상기 접착조성물 내에서 발생하는 라디칼에 의하여 경화가 진행되어, 전자부품을 효과적으로 접속시킬 수 있으므로, 저온의 접착공정이 가능하다.
Abstract:
PURPOSE: A chip laminating method, a chip assembly laminated by the same, and a chip manufacturing method for the same are provided to electrically connect a chip pad exposed on a side of a chip in a simple process such as thermo-compression bonding. CONSTITUTION: A chip laminating structure of a chip(100)-first insulating layer(310)-chip is formed. A second insulating layer(320) is laminated on a side of the chip laminating structure. A conductive connecting member(340) is compressed inside the second insulating layer. One or more bumps(330) is formed in the conductive connecting member. A side of a chip pad(110) is exposed in the chip laminating structure. The bump is contacted with the chip pad.
Abstract:
A method for fabricating a wafer-level flip chip package is provided to suppress shadow effects by using ACA(Anisotropic Conductive Adhesives) for easily adjusting coating thickness and NCA(Non-Conductive Adhesives), for achieving high selectivity in electrical connections while stabilizing a bonding process. A method for fabricating a wafer-level flip chip package comprises the steps of: forming a non-conductive layer(115) by coating and drying non-conductive mixture solution containing insulating polymer resin, hardener, and organic solvent onto a wafer(100) on which a non-solder bump(113) is formed; forming an anisotropic conductive layer(116) by coating and drying conductive mixture solution containing insulating polymer resin, hardener, organic solvent, and conductive materials onto the non-conductive layer; dicing the wafer coated with the non-conductive layer and anisotropic conductive layer to form individual semiconductor chips(200); and subjecting the individual semiconductor chip to a flip-chip bonding in alignment with an electrode of a substrate.