Abstract:
PURPOSE: A silicon nanoparticle collection system and a nanoparticle collection/storage container used for the same are provided to supply nanoparticles to a deposition system which is collected and stored, after a nanoparticle container in which nanoparticles are collected is separated from an inlet system for collecting the nanoparticles inflowing with carrier gas into multiple nanoparticle containers which is connected to one inlet line. CONSTITUTION: A silicon nano particle collection system comprises an inlet line, multiple nanoparticle collection/storage containers(10), and a carrier gas discharge line. The inlet line flows nanoparticles and carrier gas in. The multiple nanoparticle collection/storage containers are connected to the inlet line. The carrier gas discharge line discharges the carrier gas which is flowing through the inlet line from the nanoparticle collection/storage containers. The nanoparticle collection/storage containers comprise a nano particle inlet unit(11), a filter screen(13), and a carrier gas discharge unit(14). The nanoparticle inlet unit is connected to the inlet line, and is installed on one side of the nanoparticle collection/storage containers. The filter screen is equipped in the nanoparticle collection/storage containers. The carrier gas discharge unit is installed in the nanoparticle collection/storage container to discharge the carrier gas which is passing through the filter screen, and is connected to the carrier gas discharge line.
Abstract:
PURPOSE: A method and apparatus for texturing a thin-film solar cell using droplets and the thin-film solar cell textured by the same are provided to perform a environment-friendly process using a plasma reactor in which the process is easily controlled. CONSTITUTION: Textured solutions of droplets are formed. The texturing solution of the droplet is injected in a plasma reactor in which plasma is formed. A thin film solar cell is textured. The texturing solutions of the droplets are formed by an ultrasonic droplet generator. The texturing solution can be methanol or ethanol. [Reference numerals] (AA) Making droplets from texturing solutions; (BB) Injection of the droplets into a reactor
Abstract:
PURPOSE: An apparatus, a method, and a system for depositing a solar cell thin film are provided to reduce the number of equipment pieces by performing a fixed dual deposition of a substrate without rotation. CONSTITUTION: A plurality of unit chambers(110a, 110b) are divided based on a substrate(W). A deposition gas spraying unit(120) independently sprays deposition gas(G1, G2) to the plurality of unit chambers. A dissolving unit(130) dissolves the deposition gas and is separated from one side of the substrate. A support unit(140) supports the substrate.
Abstract:
PURPOSE: A CIS system compound thin film manufacturing device is provided to form a uniform thin film by preventing the heat loss and the damage of a substrate due to contact. CONSTITUTION: A vacuum chamber(20) includes a boat containing elements such as Cu, In, Ga. A heating part(30) comprises a body, a tray and a heating source. A pyrometer(40) measures the temperature of the substrate placed in the tray. A controller receives a signal which is measured from the pyrometer. The pyrometer is installed inside the body of the heating part and measures the temperature of the back side of the substrate.
Abstract:
Cds는 Ⅱ-Ⅵ족 화합물 반도체의 일종으로 주로 태양전지의 창문층(Window layer)의 용도로 주로 연구되고 있으며 광학전자 분야에서도 많이 연구되고 있는 물질이다. 박막을 제조하는 방법으로는 진공증착, 스퍼터링, 화학기상성장법, 전착법과 화학적인 방법이 주로 쓰이고 있다. 그중 화학적인 방법은 반응 용액중에서 CdS의 핵이 생겨 콜로이드가 형성되며, 형성된 클로이드가 기판에 달라붙어 이미 성장하고 있는 박막 미세조직의 치밀도를 저하시키고 두께가 고르지 않게 되며, 표면이 거칠게 되는 등의 문제가 발생되므로 질이 우수한 CdS 박막을 얻기 위하여 일반적으로 반응속도를 낮추고 반응용액의 화학적 조성과 pH 및 온도를 최적 조건으로 맞추는 방법이 쓰인다. 화학 반응은 정밀하게 제어하기가 어렵고 반응 용액의 화학적 조성등 실험조건의 메시한 변화에 따라 막의 물리적 성질과 미세조직이 급격히 변하는 문제가 있기때문에 재현성이 좋으면서도 빠르고 쉽게 우수한 특성의 박막을 양산할 수 있도록 공정을 개선할 필요가 있다. 화학적인 CdS 박막 제조 방법에서 박막 형성 조건을 엄밀하게 제어하는 대신에 형성 반응이 일어나는 반응 용액에 초음파를 가하면 막질 개선과 함께 공정이 단순해지고 제어가 쉬어지는 효과를 얻을 수 있다. 본 발명은 CdS 조성 원소를 함유한 반응 용액에 초음파를 가하여 제조공정을 개선하고 막질을 획기적으로 개선하는 방법이다.
Abstract:
PURPOSE: A container for collecting and storing silicon nanoparticles and an apparatus and method for depositing a silicion nanoparticle thin film using the same are provided to efficiently deposit nanoparticles on a substrate using carrier gas without an additional nanoparticle transfer unit. CONSTITUTION: A first inflow line(11) is connected to one side of a container(10). The nanoparticles are inputted to a first inflow line by carrier gas. A second inflow line(16) is connected to the other side of the container. The inputted nanoparticles are discharged to the outside through the second inflow line. A filter screen(13) is formed in the container. A discharge line(14) is connected to the container to discharge carrier gas passing through the filter screen to the outside. [Reference numerals] (AA) Carrier gas; (BB) Collected nanoparticles
Abstract:
PURPOSE: An apparatus and a method for deposition of a silicone-based nano-particle thin film are provided to effectively deposit nano-particles on a substrate without a separate nano-particle transfer unit because the nano-particles are injected into a deposition chamber by the pressure difference between the deposition chamber and a nano-particle container. CONSTITUTION: An apparatus for deposition of a silicone-based nano-particle thin film comprises a nano-particle container(100) and a deposition chamber(200). Silicon-based nano-particles are led by carrier gas and collected in the nano-particle container. The nano-particles in the nano-particle container are injected into the deposition chamber by the pressure difference between the nano-particle container and the deposition chamber and deposited on a substrate(S) placed in the deposition chamber. A first inlet line(102) is provided between the nano-particle container and the deposition chamber. A flow controller is provided in the first inlet line. [Reference numerals] (AA) Nano particles + gas; (BB) Reaction gas; (CC) Nano particles
Abstract:
실리콘계 나노입자 박막 증착방법, 실리콘계 나노입자 박막 및 이를 위한 실리콘계 나노입자 박막 증착장치가 제공된다. 본 발명에 따른 실리콘계 나노입자 박막 증착방법은 실리콘계 나노입자를 합성하는 합성단계; 및 상기 실리콘계 나노입자를 기판에 제 1 증착시키는 증착단계를 포함하는 것을 특징으로 하며, 본 발명에 따른 실리콘계 나노입자 증착 방법 및 장치는, 합성된 실리콘계 나노입자를 또 다른 공정에서 전처리하지 않고, 합성과 동시에 기판에 증착시키므로, 나노입자 오염에 따른 전지효율 저하의 문제를 방지할 수 있다. 또한, 단일 시스템에서 합성과 증착이 진행되므로 경제성이 우수하며, 더 나아가, 나노입자의 속도 및 기판 높이를 조절함으로써 대면적 기판에서 원하는 형태의 나노입자 박막의 증착이 가능하다.