제초성 및 식물성장 조절성 트리아졸 유도체와 그 제조방법
    23.
    发明授权
    제초성 및 식물성장 조절성 트리아졸 유도체와 그 제조방법 失效
    除草剂和植物生长控制三唑衍生物及其制备方法

    公开(公告)号:KR1019950004703B1

    公开(公告)日:1995-05-04

    申请号:KR1019920010223

    申请日:1992-06-12

    Abstract: The new compound as 5-alkoxy-1-alkyl-3-aryl -1,2,4-triazole (I) and its derivatives is prepared by (1) reacting benzaldehyde and semicarbazide to get benzaldehyde 2-alkylsemicarbazone (II), (2) cycling (II) with bromide to get 1-alkyl-3-aryl -1,2,4-triazole-5-on (III), (3) reacting (III) with methyl 2-bromo propionate to get (I). (I) is useful for soybean to multiply the branches.

    Abstract translation: (I)及其衍生物的新化合物是通过(1)使苯甲醛和氨基脲反应得到苯甲醛2-烷基缩氨基脲(II),( 2)用溴化物循环(II)得到1-烷基-3-芳基-1,2,4-三唑-5-基(III),(3)使(III)与2-溴丙酸甲酯反应得到(I )。 (I)可用于大豆繁殖分支。

    N,N'-비스[(히드록시알킬)아미노메틸]포스핀산 화합물 유도체 및 그 용도
    27.
    发明授权
    N,N'-비스[(히드록시알킬)아미노메틸]포스핀산 화합물 유도체 및 그 용도 有权
    N,N'-BIS [(羟基烷基)氨基甲酸]磷酸化合物衍生物及其用途

    公开(公告)号:KR101555007B1

    公开(公告)日:2015-09-22

    申请号:KR1020140067110

    申请日:2014-06-02

    Inventor: 김경만 장정규

    CPC classification number: C07F9/36 C07F9/12 C07F9/30 C07F9/32 D03D15/12

    Abstract: 본 발명은 N,N'-비스[(히드록시알킬)아미노메틸]포스핀산 화합물 유도체 및 그 용도에 관한 것으로서, 더욱 상세하게는 포스핀산 화합물에 아민 유도체 및 히드록시기를 도입하고 이를 질소계 염기로 중화함으로써, 환경 친화적이며 우수한 난연성을 가지는 N,N'-비스[(히드록시알킬)아미노메틸]포스핀산 화합물 유도체에 관한 것이다.

    Abstract translation: 本发明涉及N,N'-双[(羟基烷基)氨基甲基]次膦酸化合物的衍生物及其用途,更具体地涉及N,N'-双[(羟烷基)氨基甲基]次膦酸 化合物,其中将胺衍生物和羟基引入次膦酸化合物中,然后将混合物用含氮碱中和,从而提供环保且优异的阻燃性。

    점착제 조성물 및 이의 제조방법
    28.
    发明公开
    점착제 조성물 및 이의 제조방법 有权
    胶粘组合物及其制造方法

    公开(公告)号:KR1020120042073A

    公开(公告)日:2012-05-03

    申请号:KR1020100103556

    申请日:2010-10-22

    Abstract: PURPOSE: An adhesive composition is provided to have excellent wettability, thereby constantly maintaining initial adhesion, without bubbles or residue remaining on an adherend as time passes, and to have excelled adhesion and re-detaching ability. CONSTITUTION: An adhesive composition comprises a step of polymerizing a (meth)acrylate based monomer having a C1-C14 alkyl group, a (meth)acrylate based monomer having a hydroxy group, and a (meth)acrylate based monomer having carboxy group; and a step of graft-polymerization by putting a C8-12 alkyl glycidyl ether into the polymer. The polymer comprises 70-90 weight% of a (meth)acrylate based monomer having a C1-14 alkyl group.

    Abstract translation: 目的:提供粘合剂组合物以具有优异的润湿性,从而不断保持初始粘合,随着时间的流逝,没有气泡或残留在被粘物上,并且具有优异的粘合和再分离能力。 构成:粘合剂组合物包括聚合具有C1-C14烷基的(甲基)丙烯酸酯单体,具有羟基的(甲基)丙烯酸酯类单体和具有羧基的(甲基)丙烯酸酯类单体)的步骤。 和通过将C8-12烷基缩水甘油醚加入聚合物中的接枝聚合步骤。 聚合物包含70-90重量%的具有C 1-14烷基的(甲基)丙烯酸酯基单体。

    방사선 박리형 점착제 조성물 및 반도체 웨이퍼 가공용 점착시트
    29.
    发明公开
    방사선 박리형 점착제 조성물 및 반도체 웨이퍼 가공용 점착시트 有权
    辐射固化型胶粘剂组合物和粘合片用于半导体陶瓷回磨

    公开(公告)号:KR1020120019254A

    公开(公告)日:2012-03-06

    申请号:KR1020100082572

    申请日:2010-08-25

    Inventor: 김경만 이호연

    Abstract: PURPOSE: A radiation-releasable adhesive composition is provided to have enough decompressed adhesion and initial adhesion, and to be easily delaminated because adhesion is rapidly decreased when irradiating with radiation. CONSTITUTION: A radiation-releasable adhesive composition comprises: an adhesive resin polymerized of one or more acrylic monomers in chemical formula 1, and an acrylic monomer containing a hydroxy group, a diisocyanate compound; and an acrylic monomer containing hydroxy group. In the chemical formula 1, R1 is hydrogen or methyl, and R2 is C4-12 alkyl. The adhesive resin comprises 70-95 weight% of one or more acrylic monomers in chemical formula 1, and 5-30 weight% of the acrylic monomer containing the hydroxy group.

    Abstract translation: 目的:提供放射线可释放的粘合剂组合物以具有足够的减压粘合和初始粘合,并且由于在用辐射照射时粘附迅速降低,容易分层。 构成:放射线可剥离的粘合剂组合物包括:由化学式1中的一种或多种丙烯酸类单体聚合的粘合剂树脂和含有羟基的丙烯酸单体,二异氰酸酯化合物; 和含有羟基的丙烯酸类单体。 在化学式1中,R1是氢或甲基,R2是C4-12烷基。 粘合剂树脂包含70-95重量%的一种或多种化学式1中的丙烯酸单体和5-30重量%的含有羟基的丙烯酸单体。

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