公开(公告)号：US20160004171A1

公开(公告)日：2016-01-07

申请号：US14839633

申请日：2015-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US20150323876A1

公开(公告)日：2015-11-12

申请号：US14806395

申请日：2015-07-22

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie COX ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Joost Jeroen OTTENS ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martinus Cornelis Maria VERHAGEN ,  Marco POLIZZI ,  Edwin Augustinus Matheus VAN GOMPEL ,  Johannes Petrus Maria SMEULERS ,  Stefan Philip Christiaan BELFROID ,  Herman VOGEL

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20150109593A1

公开(公告)日：2015-04-23

申请号：US14586518

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria MERTENS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Antonius Johannus VAN DER NET ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Edwin VAN GOMPEL

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

Abstract translation: 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。

公开(公告)号：US20140375972A1

公开(公告)日：2014-12-25

申请号：US14481740

申请日：2014-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract translation: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US20200225590A1

公开(公告)日：2020-07-16

申请号：US16707525

申请日：2019-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Erik Theodorus Maria BIJLAART ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Helmar VAN SANTEN ,  Antonius Theodorus Anna Maria DERKSEN ,  Hans JANSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US20180129143A1

公开(公告)日：2018-05-10

申请号：US15862604

申请日：2018-01-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Antonius Theodorus Anna Maria DERKSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joeri LOF ,  Erik Roelof LOOPSTRA ,  Johannes Catharinus Hubertus MULKENS ,  Hans JANSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Alexander STRAAIJER ,  Bob STREEFKERK

IPC: G03F7/20

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US20180017879A1

公开(公告)日：2018-01-18

申请号：US15547713

申请日：2016-01-26

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Maurice Willem Jozef Etiënne WIJCKMANS ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Christiaan Alexander HOOGENDAM ,  Bernardus Antonius Johannes LUTTIKHUIS

IPC: G03F7/20

CPC classification number: G03F7/70833 ,  G03F7/70725 ,  G03F7/709

Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.

公开(公告)号：US20170102621A1

公开(公告)日：2017-04-13

申请号：US15385584

申请日：2016-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Johannes Catherinus Hubertus MULKENS ,  Roelof Aeilko Siebranc RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Erik Theodorus Maria BIJLAART ,  Christiaan Alexander HOOGENDAM ,  Helmar VAN SANTEN ,  Marcus Adrianus VAN DE KERKHOF ,  Mark KROON ,  Arie Jeffrey DEN BOEF ,  Joost Jeroen OTTENS ,  Jeroen Johannes Sophia Maria MERTENS

IPC: G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20170045830A1

公开(公告)日：2017-02-16

申请号：US15338116

申请日：2016-10-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Bob STREEFKERK ,  Johannes Catharinus Hubertus MULKENS ,  Erik Theodorus Maria BIJLAART ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Bernardus Antonius SLAGHEKKE ,  Patricius Aloysius Jacobus TINNEMANS ,  Helmar VAN SANTEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract translation: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US20170003605A1

公开(公告)日：2017-01-05

申请号：US15266453

申请日：2016-09-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Sergei SHULEPOV

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  H01L21/67034

Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

Abstract translation: 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。