公开(公告)号：WO2011080019A1

公开(公告)日：2011-07-07

申请号：PCT/EP2010/068395

申请日：2010-11-29

Applicant: ASML NETHERLANDS B.V. ,  DE BOEIJ, Wilhelmus ,  LOOPSTRA, Erik ,  MICKAN, Uwe ,  VAN SCHOOT, Jan ,  DE VRIES, Gosse

Inventor： DE BOEIJ, Wilhelmus ,  LOOPSTRA, Erik ,  MICKAN, Uwe ,  VAN SCHOOT, Jan ,  DE VRIES, Gosse

IPC: G03F7/20 ,  G02B5/09

CPC classification number: G03F7/70116 ,  G03F7/70075

Abstract: An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.

Abstract translation: 照明系统包括场分面镜装置和配置成调节入射在场面镜装置上的辐射束的光瞳镜。 场面反射镜装置包括相对于入射光束在第一和第二取向之间移动的反射场面。 其第一取向中的场小面有效地将入射辐射反射到各个反射光瞳面，以便形成从瞳孔面反射镜装置反射的条件光束的一部分。 其第二取向中的场面有效地将入射的辐射反射到被指定为光束聚集区域的瞳孔面反射镜装置的相应区域上。 这些区域被布置成防止入射到区域上的辐射形成调节梁的一部分，并且被布置在瞳孔面反射镜装置上的环形区域的极限之间，有效地限定条件束的内部和外部区域从 瞳孔面反射镜。

公开(公告)号：WO2014154433A1

公开(公告)日：2014-10-02

申请号：PCT/EP2014/053753

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT GMBH

Inventor： LOOPSTRA, Erik ,  BEERENS, Ruud ,  BIELING, Stig ,  CADEE, Theodorus ,  DONDERS, Sjoerd ,  FRIJNS, Olav ,  KEMPEN, Antonius ,  SCHEEPERS, Marcus ,  STRUYCKEN, Alexander ,  TEN KATE, Nicolaas ,  VANDERHALLEN, ivo ,  VAN LIESHOUT, Richard

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B5/0891 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Abstract translation: 一种辐射收集器，包括第一收集器段，该第一收集器段包括多个掠入射反射器壳体，所述多个入射反射器壳体被配置为引导辐射在离辐射收集器一定距离处的第一位置会聚;第二收集器部分，其包括多个入射入射反射器壳体， 以在距离辐射收集器的所述距离处会聚在第二位置，其中第一位置和第二位置彼此分离。

公开(公告)号：WO2014114405A2

公开(公告)日：2014-07-31

申请号：PCT/EP2013/076310

申请日：2013-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE KERKHOF, Marcus ,  VAN OOSTEN, Anton ,  BUTLER, Hans ,  LOOPSTRA, Erik ,  VAN DER WIJST, Marc ,  ZAAL, Koen

IPC: G03F7/20

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投影到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜的致动器和/或配置反射镜的形状的致动器的反射镜，致动器还向反射镜提供主动阻尼，以及用于产生用于控制所述致动器的致动器控制信号的控制器。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系统来控制所述致动器。

公开(公告)号：WO2013174646A1

公开(公告)日：2013-11-28

申请号：PCT/EP2013/059434

申请日：2013-05-07

Applicant: ASML NETHERLANDS B.V.

Inventor： BASELMANS, Johannes ,  LOOPSTRA, Erik

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70266 ,  G03F7/70308 ,  G03F9/7026

Abstract: A field manipulator to provide high resolution control of position in the XY plane and/or focus control. The field manipulator includes a plate located between the patterning device and the substrate. Control of the XY position is provided by tilting of the plate, while control of the focus position may be provided by localized deformation of the plate. Both adjustments may be performed by one or more actuators that act upon one or more edges of the plate. In an embodiment, two substantially parallel plates are provided and focus control can be provided by changing the spacing between them. A liquid may be provided between the plates which may be temperature controlled to adjust the focus by changing the refractive index of the liquid.

Abstract translation: 场操纵器，用于提供XY平面和/或聚焦控制中位置的高分辨率控制。 场操纵器包括位于图案形成装置和基板之间的板。 通过板的倾斜来提供XY位置的控制，同时可以通过板的局部变形来提供对焦位置的控制。 两个调整可以由作用于板的一个或多个边缘的一个或多个致动器执行。 在一个实施例中，提供了两个基本上平行的板，并且可以通过改变它们之间的间距来提供焦点控制。 可以在板之间设置液体，其可以被温度控制，以通过改变液体的折射率来调节焦点。

公开(公告)号：WO2013124114A1

公开(公告)日：2013-08-29

申请号：PCT/EP2013/051355

申请日：2013-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： KOEK, Wouter ,  BLEEKER, Arno ,  LOOPSTRA, Erik ,  MULDER, Heine ,  VAN ZWET, Erwin ,  SMEETS, Dries ,  EBELING, Robert

IPC: G03F7/20 ,  G02B6/12

CPC classification number: G03F7/70891 ,  G02B6/4296 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  Y10T29/49

Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

Abstract translation: 一种具有波导形成的波导的器件，所述波导由穿过所述波导的辐射透明的材料的连续体形成，其中所述主体具有输入表面和输出表面，以及冷却器，被配置为冷却所述输入表面和/或输出表面 。 一种具有可编程图案形成装置的曝光装置，包括多个辐射发射器，被配置为提供多个辐射束; 以及投影系统，包括固定部分和移动部分，其被配置为将所述多个辐射束投影到基于图案被选择的目标上的位置上，其中所述辐射发射器中的至少一个包括波导，所述波导被配置为输出 包括非偏振和/或圆偏振辐射的辐射束。

公开(公告)号：WO2013029898A1

公开(公告)日：2013-03-07

申请号：PCT/EP2012/064793

申请日：2012-07-27

Applicant: ASML Netherlands B.V. ,  KEMPEN, Antonius ,  LOOPSTRA, Erik ,  RENTROP, Corne ,  DE GRAAF, Dennis ,  GUBBELS, Frits ,  HAYES, Gregory, Richard ,  VAN DE WIEL, Hubertus, Johannes

Inventor： KEMPEN, Antonius ,  LOOPSTRA, Erik ,  RENTROP, Corne ,  DE GRAAF, Dennis ,  GUBBELS, Frits ,  HAYES, Gregory, Richard ,  VAN DE WIEL, Hubertus, Johannes

IPC: H05G2/00 ,  G03F7/20 ,  B41J2/16

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/006

Abstract: A radiation source having a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location, a laser configured to direct laser radiation at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma. The nozzle has an internal surface that is configured to prevent contamination present in fuel used to form the fuel droplets from being deposited on that internal surface.

Abstract translation: 一种具有喷嘴的辐射源，所述喷嘴被配置为沿着轨迹朝向等离子体形成位置引导燃料液滴流;激光器，被配置为将等离子体形成位置处的燃料液滴处的激光辐射引导，以在使用中产生辐射产生等离子体。 喷嘴具有内表面，其被构造成防止存在于用于形成燃料液滴的燃料中的污染物沉积在该内表面上。

公开(公告)号：WO2013029895A1

公开(公告)日：2013-03-07

申请号：PCT/EP2012/064775

申请日：2012-07-27

Applicant: ASML NETHERLANDS B.V. ,  WAGNER, Christian ,  LOOPSTRA, Erik

Inventor： WAGNER, Christian ,  LOOPSTRA, Erik

IPC: H01S3/00 ,  G03F7/20 ,  H05G2/00

CPC classification number: H05G2/008 ,  G02B27/283 ,  G03F7/70025 ,  G03F7/70033 ,  G03F7/70983 ,  H01S3/0064 ,  H01S3/2316 ,  H01S3/2333 ,  H05G2/003 ,  H05G2/005

Abstract: According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam back toward the beam splitter.

Abstract translation: 根据本发明的第一方面，提供了一种辐射源，包括：喷嘴，被配置为沿着轨迹朝着等离子体形成位置引导燃料液滴流（70）; 激光器，被配置为在等离子体形成位置处的燃料液滴处引导激光辐射，以在使用中产生辐射产生等离子体; 其中所述激光器包括：种子激光器（50），用于提供种子激光束（52）; 用于从种子激光器接收种子激光束的分束器（54）; 用于从分束器接收种子激光束并进行光放大的光放大器（58） 位于所述光放大器下游的第一反射器（60），被配置为将所述种子激光束引导通过所述光放大器并且返回到所述分束器; 以及位于所述分束器的更下游的第二反射器（70），被配置为从所述分束器接收所述种子激光束并将所述种子激光束的至少一部分引导回所述分束器。

公开(公告)号：WO2011092020A2

公开(公告)日：2011-08-04

申请号：PCT/EP2011/000385

申请日：2011-01-28

Applicant: CARL ZEISS SMT GMBH ,  ASML NETHERLANDS B.V. ,  EHM, Dirk Heinrich ,  VAN KAMPEN, Maarten ,  SCHMIDT, Stefan-Wolfgang ,  BANINE, Vadim Yevgenyevich ,  LOOPSTRA, Erik

Inventor： EHM, Dirk Heinrich ,  VAN KAMPEN, Maarten ,  SCHMIDT, Stefan-Wolfgang ,  BANINE, Vadim Yevgenyevich ,  LOOPSTRA, Erik

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G01J1/58 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70558 ,  G03F7/7085 ,  G03F7/70958

Abstract: An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).

Abstract translation: 用于微光刻的投影曝光工具（100）中的布置包括反射光学元件（10; 110）和辐射检测器（30; 32; 130）。 反射光学元件（10; 110）包括保证光学元件（10; 110）的机械强度的载体元件（12）和设置在载体元件（12）上的反射涂层（18），用于反射使用辐射 20A）。 载体元件（12）由与使用辐射（20a）相互作用发射其波长与使用辐射（20a）的波长不同的次级辐射（24）和辐射探测器（30）的材料制成 ; 32; 130）被配置为检测所述次级辐射（24）。

公开(公告)号：WO2011036248A1

公开(公告)日：2011-03-31

申请号：PCT/EP2010/064140

申请日：2010-09-24

Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  BANINE, Vadim ,  SWINKELS, Gerardus ,  PEKELDER, Sven ,  LABETSKI, Dzmitry ,  STAMM, Uwe ,  CYMER, INC. ,  PARTLO, William N.

Inventor： LOOPSTRA, Erik ,  BANINE, Vadim ,  SWINKELS, Gerardus ,  PEKELDER, Sven ,  LABETSKI, Dzmitry ,  STAMM, Uwe ,  PARTLO, William N.

IPC: G03F7/20 ,  C01B3/50 ,  G21K1/06

CPC classification number: G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

Abstract: An EUV lithographic apparatus (100) comprises a source collector apparatus (SO) in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma (210) emitting the radiation. The source collector apparatus (SO) includes a chamber (310) in fluid communication with a guide way (320) external to the chamber (310). A pump (BPS) for circulating buffer gas is part of the guide way (320), and provides a closed loop buffer gas flow (222). The gas flowing through the guide way (302) traverses a gas decomposer (TD1) wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path (222).

Abstract translation: EUV光刻设备（100）包括源极收集器（SO），其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体（210）。 源收集器装置（SO）包括与室（310）外部的引导方式（320）流体连通的室（310）。 用于循环缓冲气体的泵（BPS）是引导方式（320）的一部分，并且提供闭环缓冲气体流（222）。 流过引导方式（302）的气体穿过其中分解燃料和缓冲气体材料的化合物的气体分解器（TD1），使得分解的缓冲气体材料可以反馈回闭环流动路径（222）。

公开(公告)号：WO2010028899A1

公开(公告)日：2010-03-18

申请号：PCT/EP2009/059337

申请日：2009-07-21

Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  IVANOV, Vladimir ,  LOOPSTRA, Erik ,  KRIVTSUN, Vladimir ,  SWINKELS, Gerardus ,  LABETSKI, Dzmitry

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  IVANOV, Vladimir ,  LOOPSTRA, Erik ,  KRIVTSUN, Vladimir ,  SWINKELS, Gerardus ,  LABETSKI, Dzmitry

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70033 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003

Abstract: A radiation source (SO) is configured to generate extreme ultraviolet radiation. The radiation source (SO) includes a plasma formation site (2) located at a position in which a fuel will be contacted by a beam of radiation (5) to form a plasma, an outlet (16) configured to allow gas to exit the radiation source (SO), and a contamination trap (23) at least partially- located inside the outlet (16). The contamination trap is configured to trap (23) debris particles that are generated with the formation of the plasma.

Abstract translation: 辐射源（SO）被配置为产生极紫外辐射。 辐射源（SO）包括位于燃料将被辐射束（5）接触以形成等离子体的位置的等离子体形成位置（2），被配置为允许气体离开 辐射源（SO）和至少部分地位于出口（16）内部的污染物捕集器（23）。 污染阱被配置成捕获（23）形成等离子体时产生的碎屑颗粒。