公开(公告)号：WO2013098053A1

公开(公告)日：2013-07-04

申请号：PCT/EP2012/074507

申请日：2012-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  BLEEKER, Arno ,  HENNUS, Pieter ,  HOEKS, Martinus ,  HOL, Sven, Antoin, Johan ,  VAN DER SCHOOT, Harmen ,  SLAGHEKKE, Bernardus ,  TINNEMANS, Patricius ,  VAN DER WIJST, Marc ,  ZAAL, Koen ,  CADEE, Theodorus, Petrus, Maria ,  BEERENS, Ruud ,  FISCHER, Olof ,  AANGENENT, Wouter ,  BOSCH, Niels, Johannes, Maria

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus (1) including a projection system (12, 14) configured to project a plurality of radiation beams onto a target; a movable frame (8) that is at least rotatable around an axis (10); and an actuator system (11) configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置（1），包括被配置为将多个辐射束投影到目标上的投影系统（12,14） 至少可绕轴线（10）旋转的可移动框架（8）; 以及致动器系统（11），其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。

公开(公告)号：WO2014114405A2

公开(公告)日：2014-07-31

申请号：PCT/EP2013/076310

申请日：2013-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE KERKHOF, Marcus ,  VAN OOSTEN, Anton ,  BUTLER, Hans ,  LOOPSTRA, Erik ,  VAN DER WIJST, Marc ,  ZAAL, Koen

IPC: G03F7/20

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投影到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜的致动器和/或配置反射镜的形状的致动器的反射镜，致动器还向反射镜提供主动阻尼，以及用于产生用于控制所述致动器的致动器控制信号的控制器。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系统来控制所述致动器。

公开(公告)号：WO2013160016A1

公开(公告)日：2013-10-31

申请号：PCT/EP2013/055537

申请日：2013-03-18

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  VAN DER WIJST, Marc

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G01D5/347 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/709 ,  G03F9/7015 ,  G03F9/7096

Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage (16), and a measurement system (12-14) including a sensor part (13) and a reference part (12, 14), the measurement system being configured to determine the position and/or orientation of the support stage (16), or of a component mounted on the support stage, relative to a reference frame (6, 8, 10) by using the sensor part (13) to interact with the reference part (12, 14), wherein: the reference frame (6, 8, 10) comprises N sub-frames (6, 8) coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.

Abstract translation: 公开了一种光刻设备和设备的制造方法。 光刻设备包括支撑台（16）和包括传感器部件（13）和参考部件（12,14）的测量系统（12-14），该测量系统被配置为确定位置和/或取向 通过使用传感器部分（13）与参考部件（12,14）相互作用而相对于参考框架（6,8,10）安装在支撑台上的部件或安装在支撑台上的部件， 其中：所述参考框架（6,8,10）包括N个子框架（6,8），所述N个子框架（6,8）相对于第一参考频率之下的振动而主要地作为单个刚体表现，主要以N体 系统相对于高于第二参考频率的振动，其中N是大于1的整数。

公开(公告)号：WO2010020481A1

公开(公告)日：2010-02-25

申请号：PCT/EP2009/058923

申请日：2009-07-13

Applicant: ASML NETHERLANDS B.V. ,  BUTLER, Hans ,  DE JONGH, Robertus ,  VAN DER WIJST, Marc ,  TOUSAIN, Rob ,  OUDE NIJHUIS, Marco ,  KOEVOETS, Adrianus

Inventor： BUTLER, Hans ,  DE JONGH, Robertus ,  VAN DER WIJST, Marc ,  TOUSAIN, Rob ,  OUDE NIJHUIS, Marco ,  KOEVOETS, Adrianus

IPC: G03F7/20

CPC classification number: G03F7/70833 ,  G03F7/70258 ,  G03F7/70483

Abstract: A projection system (PS) is provided that includes a sensor system (20) that measures at least one parameter that relates to the physical deformation of a frame (10) that supports the optical elements (11) within the projection system (PS), and a control system (30) that, based on the measurements from the sensor system (20.), determines an expected deviation of.the position of the beam of radiation projected by the projection system (PS) that is caused by the physical deformation of the frame (10).

Abstract translation: 提供了一种投影系统（PS），其包括测量与投影系统（PS）内的支撑光学元件（11）的框架（10）的物理变形有关的至少一个参数的传感器系统（20） 以及基于来自传感器系统（20）的测量值的控制系统（30），确定由物理变形引起的由投影系统（PS）投射的辐射束的位置的预期偏差 （10）。