公开(公告)号：NL2007940A

公开(公告)日：2012-06-27

申请号：NL2007940

申请日：2011-12-09

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KOOLE ROELOF ,  HEESCH CHRIS

IPC: G03F7/20

Abstract: A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.