公开(公告)号：NL2009555A

公开(公告)日：2013-04-08

申请号：NL2009555

申请日：2012-10-02

Applicant: ASML NETHERLANDS BV

Inventor： NGUYEN THANH ,  FINDERS JOZEF ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  HEIJDEN EDDY ,  MEESSEN HIERONYMUS ,  KOOLE ROELOF ,  PEETERS EMIEL ,  HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  DRUZHININA TAMARA ,  RUITER JESSICA

IPC: G03F7/20

公开(公告)号：NL2008952A

公开(公告)日：2013-01-02

申请号：NL2008952

申请日：2012-06-07

Applicant: ASML NETHERLANDS BV

Inventor： BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

IPC: G03F7/20

公开(公告)号：NL2010131A

公开(公告)日：2013-07-23

申请号：NL2010131

申请日：2013-01-15

Applicant: ASML NETHERLANDS BV

Inventor： HEESCH CHRIS ,  MEESSEN HIERONYMUS

IPC: G03F7/20

公开(公告)号：NL2011228A

公开(公告)日：2014-02-10

申请号：NL2011228

申请日：2013-07-26

Applicant: ASML NETHERLANDS BV

Inventor： FINDERS JOZEF ,  WUISTER SANDER ,  PEETERS EMIEL ,  BOOTS HENRI ,  DRUZHININA TAMARA ,  HEESCH CHRIS ,  HEIJDEN EDDY

IPC: G03F7/20

公开(公告)号：NL2007160A

公开(公告)日：2012-02-28

申请号：NL2007160

申请日：2011-07-21

Applicant: ASML NETHERLANDS BV

Inventor： MARK MARTINUS ,  MAUCZOK RUEDIGER ,  GIESBERS JACOBUS ,  BANINE VADIM ,  JEUNINK ANDRE ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KLOOTWIJK JOHAN ,  KOOLE ROELOF ,  PEETERS EMIEL ,  HEESCH CHRIS

IPC: G03F7/00

公开(公告)号：NL2010254A

公开(公告)日：2013-09-09

申请号：NL2010254

申请日：2013-02-06

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  NGUYEN THANH ,  YILDIRIM OKTAY

IPC: G03F7/20

公开(公告)号：NL2007940A

公开(公告)日：2012-06-27

申请号：NL2007940

申请日：2011-12-09

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KOOLE ROELOF ,  HEESCH CHRIS

IPC: G03F7/20

Abstract: A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.