公开(公告)号：WO2013127608A3

公开(公告)日：2013-10-24

申请号：PCT/EP2013052306

申请日：2013-02-06

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  VAN HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  NGUYEN THANH ,  YILDIRIM OKTAY

IPC: G03F7/00

CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/038 ,  G03F7/2002

Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer comprising first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition comprising a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.

Abstract translation: 一种形成图案化的化学外延模板的方法，用于在基材的表面上包含第一和第二聚合物嵌段的自组装嵌段共聚物的取向，该方法包括将底漆组合物的底漆层施加到表面，引物 组合物，其包含与第一聚合物嵌段具有化学亲合力的第一聚合物部分和与第二聚合物嵌段具有化学亲合力的第二聚合物部分，选择性地将表面，底漆层和任何上覆层暴露于光化辐射以提供曝光和未曝光 使得暴露区域中的第一聚合物部分不稳定，以及从暴露区域除去不稳定的第一聚合物部分，以消除第一聚合物部分的暴露区域中的底漆层表面，以形成图案化的化学外延模板。

公开(公告)号：WO2012175342A3

公开(公告)日：2013-02-28

申请号：PCT/EP2012060783

申请日：2012-06-07

Applicant: ASML NETHERLANDS BV ,  BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  VAN HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

Inventor： BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  VAN HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08F299/02 ,  C08F299/04 ,  H01L51/0043

Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T0D, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.

Abstract translation: BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于T0D的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键 相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。 包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段 当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

公开(公告)号：NL2009555A

公开(公告)日：2013-04-08

申请号：NL2009555

申请日：2012-10-02

Applicant: ASML NETHERLANDS BV

Inventor： NGUYEN THANH ,  FINDERS JOZEF ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  HEIJDEN EDDY ,  MEESSEN HIERONYMUS ,  KOOLE ROELOF ,  PEETERS EMIEL ,  HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  DRUZHININA TAMARA ,  RUITER JESSICA

IPC: G03F7/20

公开(公告)号：NL2008952A

公开(公告)日：2013-01-02

申请号：NL2008952

申请日：2012-06-07

Applicant: ASML NETHERLANDS BV

Inventor： BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

IPC: G03F7/20

公开(公告)号：NL2010254A

公开(公告)日：2013-09-09

申请号：NL2010254

申请日：2013-02-06

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  NGUYEN THANH ,  YILDIRIM OKTAY

IPC: G03F7/20

公开(公告)号：NL2007940A

公开(公告)日：2012-06-27

申请号：NL2007940

申请日：2011-12-09

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KOOLE ROELOF ,  HEESCH CHRIS

IPC: G03F7/20

Abstract: A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.