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    METHODS OF PROVIDING PATTERNED CHEMICAL EPITAXY TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY
    1.
    发明申请
    METHODS OF PROVIDING PATTERNED CHEMICAL EPITAXY TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY 审中-公开
    提供用于自组装嵌段共聚物的图案化学外延模板用于器件平台的方法

    公开(公告)号：WO2013127608A3

    公开(公告)日：2013-10-24

    申请号：PCT/EP2013052306

    申请日：2013-02-06

    Applicant: ASML NETHERLANDS BV

    Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  VAN HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  NGUYEN THANH ,  YILDIRIM OKTAY

    IPC: G03F7/00

    CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/038 ,  G03F7/2002

    Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer comprising first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition comprising a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.

    Abstract translation: 一种形成图案化的化学外延模板的方法，用于在基材的表面上包含第一和第二聚合物嵌段的自组装嵌段共聚物的取向，该方法包括将底漆组合物的底漆层施加到表面，引物 组合物，其包含与第一聚合物嵌段具有化学亲合力的第一聚合物部分和与第二聚合物嵌段具有化学亲合力的第二聚合物部分，选择性地将表面，底漆层和任何上覆层暴露于光化辐射以提供曝光和未曝光 使得暴露区域中的第一聚合物部分不稳定，以及从暴露区域除去不稳定的第一聚合物部分，以消除第一聚合物部分的暴露区域中的底漆层表面，以形成图案化的化学外延模板。

    SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY
    2.
    发明申请
    SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY 审中-公开
    自组装聚合物和方法用于光刻

    公开(公告)号：WO2012175342A3

    公开(公告)日：2013-02-28

    申请号：PCT/EP2012060783

    申请日：2012-06-07

    Applicant: ASML NETHERLANDS BV ,  BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  VAN HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

    Inventor： BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  VAN HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

    IPC: G03F7/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08F299/02 ,  C08F299/04 ,  H01L51/0043

    Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T0D, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.

    Abstract translation: BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于T0D的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键 相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。 包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段 当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

    METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
    3.
    发明申请
    METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
    通过嵌段共聚物自组装提供基板上的刻蚀特征的方法

    公开(公告)号：WO2015180966A3

    公开(公告)日：2016-01-28

    申请号：PCT/EP2015060620

    申请日：2015-05-13

    Applicant: ASML NETHERLANDS BV

    Inventor： WUISTER SANDER FREDERIK ,  JEUNINK ANDRE BERNARDUS ,  PEETERS EMIEL

    IPC: G03F7/00

    CPC classification number: H01L21/76816 ,  B81C1/00031 ,  B81C1/00396 ,  B81C2201/0149 ,  C09K13/00 ,  C30B1/04 ,  C30B29/58 ,  G03F7/0002 ,  G03F7/0041 ,  G03F7/2004 ,  G03F7/3021 ,  G03F7/70375 ,  H01L21/0271 ,  H01L21/3083 ,  H01L21/76829

    Abstract: A method of forming at least one lithography feature, the method comprising: providing at least one lithography recess on a substrate, the or each lithography recess comprising side-walls and a base, with the side-walls having a width therebetween; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer comprising at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features comprised of the second domain within the or each lithography recess.

    Abstract translation: 一种形成至少一个光刻特征的方法，所述方法包括：在基底上提供至少一个光刻凹槽，所述或每个光刻凹槽包括侧壁和底座，其中所述侧壁之间具有宽度; 提供在所述或每个光刻凹槽中具有第一和第二块的自组装嵌段共聚物; 使得所述可自组装嵌段共聚物自组装成所述或每个光刻凹槽内的有序层，所述有序层包含至少第一区域的第一区域和第二区域的第二区域; 导致自组装嵌段共聚物以定向方式交联; 并且选择性地移除第一区域以形成由该光刻凹槽或每个光刻凹槽内的第二区域组成的光刻特征。

    LITHOGRAPHY USING SELF-ASSEMBLED POLYMERS
    4.
    发明申请
    LITHOGRAPHY USING SELF-ASSEMBLED POLYMERS 审中-公开
    使用自组装聚合物的光刻

    公开(公告)号：WO2012031818A2

    公开(公告)日：2012-03-15

    申请号：PCT/EP2011062554

    申请日：2011-07-21

    Applicant: ASML NETHERLANDS BV ,  KOOLE ROELOF ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  PEETERS EMIEL

    Inventor： KOOLE ROELOF ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  PEETERS EMIEL

    IPC: B81C1/00

    CPC classification number: B44C1/227 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  G03F7/0002 ,  H01L21/0337

    Abstract: A method of lithography on a substrate uses a self-assembled polymer (SAP) layer deposited on the substrate, with first and second domains arranged in a pattern across the layer. A planarization layer is formed over the SAP and a development etch applied to substantially remove a portion of the planarization layer over the second domain leaving a cap of the planarization layer substantially covering the first domain. The uncapped second domain is then removed from the surface by a breakthrough etch leaving the capped first domain as a pattern feature on the surface. A transfer etch may then be used to transfer the pattern feature to the substrate using the capped first domain. The capping allows the second domain to be removed, e.g., without excessive loss of lateral feature width for the remaining first domain, even when the difference in etch resistance between the first and second domains is small.

    Abstract translation: 衬底上的光刻方法使用沉积在衬底上的自组装聚合物（SAP）层，其中第一和第二畴以整个层的图案排列。 平坦化层形成在SAP之上，并且显影蚀刻被施加以在第二域上基本上去除平坦化层的一部分，留下平坦化层的盖基本覆盖第一域。 然后通过穿透蚀刻从表面除去未封端的第二结构域，留下封盖的第一结构域作为表面上的图案特征。 然后可以使用转移蚀刻来使用封盖的第一结构域将图案特征转移到衬底。 封盖允许除去第二区域，例如，即使当第一和第二区域之间的耐蚀刻性差异小时，也不会对剩余的第一区域造成横向特征宽度的过度损失。

    SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY.
    8.
    发明专利
    SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY. 未知

    公开(公告)号：NL2010004A

    公开(公告)日：2013-07-16

    申请号：NL2010004

    申请日：2012-12-18

    Applicant: ASML NETHERLANDS BV

    Inventor： BRIZARD AURELIE ,  KOOLE ROELOF ,  PEETERS EMIEL

    IPC: G03F7/20

    Abstract: A method of forming a self-assembled block polymer layer, oriented to form an ordered array of alternating domains, is disclosed. The method involves providing a layer of the self-assemblable block copolymer on the substrate and depositing a first surfactant onto the external surface of the layer prior to inducing self-assembly of the layer to form the ordered array of domains. The first surfactant has a hydrophobic tail and a hydrophilic head group and acts to reduce the interfacial energy at the external surface of the block copolymer layer in order to promote formation of assembly of the block copolymer polymer into an ordered array having the alternating domains.

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